DE60001201D1 - Vorrichtung zur Planarisierung - Google Patents

Vorrichtung zur Planarisierung

Info

Publication number
DE60001201D1
DE60001201D1 DE60001201T DE60001201T DE60001201D1 DE 60001201 D1 DE60001201 D1 DE 60001201D1 DE 60001201 T DE60001201 T DE 60001201T DE 60001201 T DE60001201 T DE 60001201T DE 60001201 D1 DE60001201 D1 DE 60001201D1
Authority
DE
Germany
Prior art keywords
planarization device
planarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60001201T
Other languages
English (en)
Other versions
DE60001201T2 (de
Inventor
Toshihiko Ishikawa
Yasushi Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Publication of DE60001201D1 publication Critical patent/DE60001201D1/de
Application granted granted Critical
Publication of DE60001201T2 publication Critical patent/DE60001201T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
DE60001201T 1999-07-09 2000-07-04 Vorrichtung zur Planarisierung Expired - Lifetime DE60001201T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19594399A JP3675237B2 (ja) 1999-07-09 1999-07-09 平面加工装置

Publications (2)

Publication Number Publication Date
DE60001201D1 true DE60001201D1 (de) 2003-02-20
DE60001201T2 DE60001201T2 (de) 2003-05-15

Family

ID=16349561

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60001201T Expired - Lifetime DE60001201T2 (de) 1999-07-09 2000-07-04 Vorrichtung zur Planarisierung

Country Status (4)

Country Link
US (1) US6431949B1 (de)
EP (1) EP1066921B1 (de)
JP (1) JP3675237B2 (de)
DE (1) DE60001201T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3170627B2 (ja) * 1999-06-23 2001-05-28 信和興産株式会社 溶接方法および溶接装置
US20020023715A1 (en) * 2000-05-26 2002-02-28 Norio Kimura Substrate polishing apparatus and substrate polishing mehod
US6608495B2 (en) 2001-03-19 2003-08-19 Applied Materials, Inc. Eddy-optic sensor for object inspection
SG131737A1 (en) * 2001-03-28 2007-05-28 Disco Corp Polishing tool and polishing method and apparatus using same
US6966816B2 (en) * 2001-05-02 2005-11-22 Applied Materials, Inc. Integrated endpoint detection system with optical and eddy current monitoring
JP2002343756A (ja) * 2001-05-21 2002-11-29 Tokyo Seimitsu Co Ltd ウェーハ平面加工装置
US6811466B1 (en) * 2001-12-28 2004-11-02 Applied Materials, Inc. System and method for in-line metal profile measurement
US7131889B1 (en) * 2002-03-04 2006-11-07 Micron Technology, Inc. Method for planarizing microelectronic workpieces
US7011567B2 (en) * 2004-02-05 2006-03-14 Robert Gerber Semiconductor wafer grinder
US7163441B2 (en) * 2004-02-05 2007-01-16 Robert Gerber Semiconductor wafer grinder
JP4642532B2 (ja) * 2005-04-01 2011-03-02 不二越機械工業株式会社 研磨装置
JP5095159B2 (ja) * 2006-08-31 2012-12-12 富士重工業株式会社 電解ドレッシング研削装置
US8337278B2 (en) * 2007-09-24 2012-12-25 Applied Materials, Inc. Wafer edge characterization by successive radius measurements
CN101861653B (zh) * 2008-01-24 2012-07-18 应用材料公司 太阳能电池板清边模块
CL2009000560A1 (es) 2008-03-11 2010-02-19 Univ Duke Un metodo para endurecer un medio endurecible por radiacion que comprende colocar una composicion dentro de un objeto para ser endurecido, la aplicacion de al menos uno elegido entre rayos x, rayos gama o haz de electrones a traves del objeto y dentro de la composicion.
JP5356837B2 (ja) * 2009-01-14 2013-12-04 株式会社ディスコ 研磨パッドの処理方法
JP2011224697A (ja) * 2010-04-19 2011-11-10 Disco Corp 研磨パッドの修正方法
KR101292228B1 (ko) 2012-01-04 2013-08-02 주식회사 엘지실트론 웨이퍼 연마 방법
JP6329728B2 (ja) * 2013-03-21 2018-05-23 株式会社ディスコ 研削装置
KR20160125585A (ko) * 2015-04-21 2016-11-01 삼성전자주식회사 기판 처리 장치 및 기판 처리 방법
JP6379232B2 (ja) * 2017-01-30 2018-08-22 株式会社東京精密 研削装置
JP6832738B2 (ja) * 2017-02-20 2021-02-24 株式会社ディスコ ウエーハの研磨方法、研磨パッド及び研磨装置
JP6909598B2 (ja) * 2017-03-13 2021-07-28 光洋機械工業株式会社 平面研削方法及び平面研削装置
JP7536398B2 (ja) * 2020-08-07 2024-08-20 株式会社ディスコ 切削装置
JP7526611B2 (ja) 2020-08-14 2024-08-01 東京エレクトロン株式会社 加工システム及び加工方法
CN115870868A (zh) * 2022-12-27 2023-03-31 西安奕斯伟材料科技有限公司 装卸装置、方法及硅片双面抛光设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456627A (en) * 1993-12-20 1995-10-10 Westech Systems, Inc. Conditioner for a polishing pad and method therefor
JP3850924B2 (ja) * 1996-02-15 2006-11-29 財団法人国際科学振興財団 化学機械研磨装置及び化学機械研磨方法
US5890951A (en) * 1996-04-15 1999-04-06 Lsi Logic Corporation Utility wafer for chemical-mechanical planarization
US5948203A (en) * 1996-07-29 1999-09-07 Taiwan Semiconductor Manufacturing Company, Ltd. Optical dielectric thickness monitor for chemical-mechanical polishing process monitoring
JP3231659B2 (ja) * 1997-04-28 2001-11-26 日本電気株式会社 自動研磨装置

Also Published As

Publication number Publication date
US6431949B1 (en) 2002-08-13
EP1066921B1 (de) 2003-01-15
DE60001201T2 (de) 2003-05-15
JP3675237B2 (ja) 2005-07-27
EP1066921A1 (de) 2001-01-10
JP2001018162A (ja) 2001-01-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)