DE60000716D1 - Elektronstrahl-pvd-vorrichtung - Google Patents

Elektronstrahl-pvd-vorrichtung

Info

Publication number
DE60000716D1
DE60000716D1 DE60000716T DE60000716T DE60000716D1 DE 60000716 D1 DE60000716 D1 DE 60000716D1 DE 60000716 T DE60000716 T DE 60000716T DE 60000716 T DE60000716 T DE 60000716T DE 60000716 D1 DE60000716 D1 DE 60000716D1
Authority
DE
Germany
Prior art keywords
pvd device
electric ray
ray
electric
pvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60000716T
Other languages
English (en)
Other versions
DE60000716T2 (de
Inventor
William Bruce
Douglas Evans
H Betscher
Frank Maricocchi
John Wortman
Allen Bowlin
Phillips Dillon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE60000716D1 publication Critical patent/DE60000716D1/de
Application granted granted Critical
Publication of DE60000716T2 publication Critical patent/DE60000716T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE60000716T 1999-08-04 2000-08-02 Elektronstrahl-pvd-vorrichtung Expired - Lifetime DE60000716T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14723099P 1999-08-04 1999-08-04
US62175800A 2000-07-24 2000-07-24
PCT/US2000/021087 WO2001011109A1 (en) 1999-08-04 2000-08-02 Electron beam physical vapor deposition apparatus

Publications (2)

Publication Number Publication Date
DE60000716D1 true DE60000716D1 (de) 2002-12-12
DE60000716T2 DE60000716T2 (de) 2003-10-02

Family

ID=26844714

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60000716T Expired - Lifetime DE60000716T2 (de) 1999-08-04 2000-08-02 Elektronstrahl-pvd-vorrichtung

Country Status (5)

Country Link
EP (1) EP1117853B1 (de)
JP (1) JP4780884B2 (de)
DE (1) DE60000716T2 (de)
UA (1) UA70336C2 (de)
WO (1) WO2001011109A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104630737B (zh) * 2013-11-13 2017-02-08 中国科学院沈阳科学仪器股份有限公司 一种在五腔体全自动电子束沉积系统中使用的传输系统

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB869397A (en) * 1958-07-02 1961-05-31 Libbey Owens Ford Glass Co Method and apparatus for filming articles by vacuum deposition
US3656454A (en) * 1970-11-23 1972-04-18 Air Reduction Vacuum coating apparatus
FR2502643B1 (fr) * 1981-03-27 1986-05-02 Western Electric Co Appareil et procede de depot par jet moleculaire sur plusieurs substrats
JP3175333B2 (ja) * 1992-06-15 2001-06-11 日新電機株式会社 基板処理装置
DE19537092C1 (de) * 1995-10-05 1996-07-11 Ardenne Anlagentech Gmbh Elektronenstrahl-Bedampfungsanlage im Durchlaufbetrieb für thermisch hoch belastete Substrate
JP3909888B2 (ja) * 1996-04-17 2007-04-25 キヤノンアネルバ株式会社 トレイ搬送式インライン成膜装置
JPH10140351A (ja) * 1996-11-05 1998-05-26 Kobe Steel Ltd インライン式真空成膜装置

Also Published As

Publication number Publication date
UA70336C2 (uk) 2004-10-15
JP2003522295A (ja) 2003-07-22
EP1117853A1 (de) 2001-07-25
DE60000716T2 (de) 2003-10-02
JP4780884B2 (ja) 2011-09-28
EP1117853B1 (de) 2002-11-06
WO2001011109A1 (en) 2001-02-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: ROEGER UND KOLLEGEN, 73728 ESSLINGEN