DE519584C - Procedure for covering objects - Google Patents
Procedure for covering objectsInfo
- Publication number
- DE519584C DE519584C DEA56459D DEA0056459D DE519584C DE 519584 C DE519584 C DE 519584C DE A56459 D DEA56459 D DE A56459D DE A0056459 D DEA0056459 D DE A0056459D DE 519584 C DE519584 C DE 519584C
- Authority
- DE
- Germany
- Prior art keywords
- procedure
- objects
- particles
- field
- covering objects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
Description
Es ist bekannt, i. daß Elektrizitätsteilchen durch ein elektrisches Feld in Richtung desselben in Bewegung gesetzt werden, wobei die Geschwindigkeit der Teilchen von der Stärke des Feldes und der Größe der Luftleere des Raumes, in dem die Bewegung stattfindet, abhängig ist, 2. daß Elektrizitätsteilchen, sobald sie hierbei auf ein im Winkel zu ihnen stehendes genügend starkes magneto tisches Kraftfeld stoßen, durch dieses in Richtung der magnetischen Kraftlinien abgelenkt werden.It is known i. that particles of electricity are set in motion by an electric field in the direction of the same, whereby the speed of the particles on the strength of the field and the size of the air void depends on the space in which the movement takes place, 2. that particles of electricity, as soon as you click on a sufficiently strong magneto at an angle to you pushing a table force field, deflected by this in the direction of the magnetic lines of force will.
Zweck der Erfindung ist, dies Verhalten elektrischer Teilchen auf elektrisch aufgeladene Staubteilchen irgendeiner Materie auszudehnen, die Staubteilchen also, soweit sie noch nicht geladen sind, in einem elektrostatischen Feld aufzuladen, sie in Richtung des Feldes in Bewegung zu setzen und durch ao ein schief zu der Bewegungsrichtung stehendes magnetisches Feld in Richtung der magnetischen Kraftlinien abzulenken, so daß sie sich in diesem ansammeln und sich auf in ihm befindliche Gegenstände niederschlagen. Um die Ablenkung in der gewünschten Weise zu ermöglichen und um eine genügend große Geschwindigkeit der Staubteilchen herbeizuführen, müssen die Vorgänge in mehr oder weniger großer Luftleere vor sich gehen. Auch ist es nötig, daß die Staubteilchen möglichst klein sind. Das Verfahren eignet sich also besonders für kathoden- oder im Lichtbogen zerstäubtes Metall, aber auch für genügend verkleinerte Staubteilchen anderer Materie.The purpose of the invention is to show this behavior of electrical particles on electrically charged ones To expand dust particles of any matter, so the dust particles as far as they can not yet charged, in an electrostatic field to charge them towards of the field in motion and by ao an oblique to the direction of movement divert magnetic field in the direction of the magnetic lines of force so that they accumulate in this and are reflected on objects located in it. In order to allow the distraction in the desired way and in order to be sufficient To bring about great speed of the dust particles, the processes must go in more or less of a great evacuation. It is also necessary that the dust particles as possible are small. The process is therefore particularly suitable for cathode or electric arcs atomized metal, but also for sufficiently reduced dust particles of other matter.
Der Erfindungsgedanke und die Vorgänge sind durch die Abb. 1 und 2 näher gekennzeichnet. The concept of the invention and the processes are characterized in more detail by FIGS. 1 and 2.
In Abb. ι ist A ein Behälter, in dem das Metall zerstäubt wird, B ein Behälter, der mit einem genügend starken elektrischen Feld durchsetzt ist, C ein magnetisches Feld, d eine Luftpumpe zum Evakuieren, b und c entgegengesetzte Magnetpole, e und f Hochspannungselektroden, g zu überziehende Gegenstände. In Fig. Ι A is a container in which the metal is atomized, B a container with a sufficiently strong electric field, C a magnetic field, d an air pump for evacuation, b and c opposite magnetic poles, e and f High voltage electrodes, g objects to be coated.
In Abb. 2 stellt C die ungefähre Gestalt des magnetischen Feldes dar, die ihm gegeben werden muß.In Fig. 2, C represents the approximate shape of the magnetic field that must be given to it.
Die im Behälter^ zerstäubten Metalleilchen dringen in den Raum B ein, werden hier, soweit nötig, durch die von e nach / gehenden Elektroden aufgeladen, gehen ebenfalls in Richtung nach / und werden, sobald sie in das schief zu ihrer Richtung stehende magnetische Feld eintreten, von diesem in Richtung nach dem Magnetpol b mit gleicher Geschwindigkeit abgelenkt, wobei sie auf die mit ihnen zu überziehenden Gegenstände auftreffen. Diese Gegenstände können mit der Elektrode / leitend verbunden sein.The metal particles atomized in the container penetrate into space B , are charged here, as far as necessary, by the electrodes going from e to /, also go in the direction to / and will, as soon as they enter the magnetic field which is at an angle to their direction , deflected by this in the direction of the magnetic pole b at the same speed, impinging on the objects to be covered with them. These objects can be connected to the electrode / conductively.
Das magnetische Feld muß den Behälter B und einen zur Unterbringung größerer Gegenstände etwa nötigen Aufbau desselben in ihrer ganzen Ausdehnung durchsetzen, und es wird so gestaltet, daß es nur einen beschränkten Raum des Behälters ausfüllt, damit die Dichte der Staubteilchen möglichst groß wird (Abb. 2).The magnetic field must penetrate container B and any structure necessary to accommodate larger objects in its entire extent, and it is designed in such a way that it only fills a limited space of the container so that the density of the dust particles is as high as possible (Fig. 2).
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEA56459D DE519584C (en) | Procedure for covering objects |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEA56459D DE519584C (en) | Procedure for covering objects |
Publications (1)
Publication Number | Publication Date |
---|---|
DE519584C true DE519584C (en) | 1931-03-02 |
Family
ID=6940550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEA56459D Expired DE519584C (en) | Procedure for covering objects |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE519584C (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE744328C (en) * | 1940-08-23 | 1944-06-02 | Voegele Ag J | Process for enamelling metallic objects |
DE752049C (en) * | 1942-04-09 | 1954-03-08 | Bosch Gmbh Robert | Process for the production of patterned metallizations by vapor deposition in a vacuum |
DE970666C (en) * | 1942-05-22 | 1958-10-16 | Aeg | Device for powdering surfaces |
US2976174A (en) * | 1955-03-22 | 1961-03-21 | Burroughs Corp | Oriented magnetic cores |
US2996418A (en) * | 1957-06-05 | 1961-08-15 | Gen Motors Corp | Method and apparatus for vapor depositing thin films |
US3036549A (en) * | 1957-05-08 | 1962-05-29 | Sumitomo Electric Industries | Apparatus for vacuum evaporation of metals |
US3092510A (en) * | 1959-03-02 | 1963-06-04 | Sperry Rand Corp | Magnetic devices and preparation thereof |
-
0
- DE DEA56459D patent/DE519584C/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE744328C (en) * | 1940-08-23 | 1944-06-02 | Voegele Ag J | Process for enamelling metallic objects |
DE752049C (en) * | 1942-04-09 | 1954-03-08 | Bosch Gmbh Robert | Process for the production of patterned metallizations by vapor deposition in a vacuum |
DE970666C (en) * | 1942-05-22 | 1958-10-16 | Aeg | Device for powdering surfaces |
US2976174A (en) * | 1955-03-22 | 1961-03-21 | Burroughs Corp | Oriented magnetic cores |
US3036549A (en) * | 1957-05-08 | 1962-05-29 | Sumitomo Electric Industries | Apparatus for vacuum evaporation of metals |
US2996418A (en) * | 1957-06-05 | 1961-08-15 | Gen Motors Corp | Method and apparatus for vapor depositing thin films |
US3092510A (en) * | 1959-03-02 | 1963-06-04 | Sperry Rand Corp | Magnetic devices and preparation thereof |
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