DE50203296D1 - Bipolar-transistor und verfahren zum herstellen desselben - Google Patents

Bipolar-transistor und verfahren zum herstellen desselben

Info

Publication number
DE50203296D1
DE50203296D1 DE50203296T DE50203296T DE50203296D1 DE 50203296 D1 DE50203296 D1 DE 50203296D1 DE 50203296 T DE50203296 T DE 50203296T DE 50203296 T DE50203296 T DE 50203296T DE 50203296 D1 DE50203296 D1 DE 50203296D1
Authority
DE
Germany
Prior art keywords
manufacturing
bipolar transistor
bipolar
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50203296T
Other languages
English (en)
Inventor
Rudolf Lachner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to DE50203296T priority Critical patent/DE50203296D1/de
Application granted granted Critical
Publication of DE50203296D1 publication Critical patent/DE50203296D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234Bipolar junction transistors [BJT]
    • H01L29/66272Silicon vertical transistors
    • H01L29/66287Silicon vertical transistors with a single crystalline emitter, collector or base including extrinsic, link or graft base formed on the silicon substrate, e.g. by epitaxy, recrystallisation, after insulating device isolation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234Bipolar junction transistors [BJT]
    • H01L29/66242Heterojunction transistors [HBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/7317Bipolar thin film transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/732Vertical transistors
DE50203296T 2001-12-04 2002-10-11 Bipolar-transistor und verfahren zum herstellen desselben Expired - Lifetime DE50203296D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50203296T DE50203296D1 (de) 2001-12-04 2002-10-11 Bipolar-transistor und verfahren zum herstellen desselben

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10159414A DE10159414A1 (de) 2001-12-04 2001-12-04 Bipolar-Transistor und Verfahren zum Herstellen desselben
DE50203296T DE50203296D1 (de) 2001-12-04 2002-10-11 Bipolar-transistor und verfahren zum herstellen desselben
PCT/EP2002/011427 WO2003049192A1 (de) 2001-12-04 2002-10-11 Bipolar-transistor und verfahren zum herstellen desselben

Publications (1)

Publication Number Publication Date
DE50203296D1 true DE50203296D1 (de) 2005-07-07

Family

ID=7707913

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10159414A Withdrawn DE10159414A1 (de) 2001-12-04 2001-12-04 Bipolar-Transistor und Verfahren zum Herstellen desselben
DE50203296T Expired - Lifetime DE50203296D1 (de) 2001-12-04 2002-10-11 Bipolar-transistor und verfahren zum herstellen desselben

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10159414A Withdrawn DE10159414A1 (de) 2001-12-04 2001-12-04 Bipolar-Transistor und Verfahren zum Herstellen desselben

Country Status (5)

Country Link
US (1) US7141479B2 (de)
EP (1) EP1436842B1 (de)
AU (1) AU2002340557A1 (de)
DE (2) DE10159414A1 (de)
WO (1) WO2003049192A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2868203B1 (fr) * 2004-03-29 2006-06-09 St Microelectronics Sa Procede de fabrication d'un transistor bipolaire a base extrinseque monocristalline
FR2868206A1 (fr) * 2004-03-29 2005-09-30 St Microelectronics Sa Transistor bipolaire a base extrinseque monocristalline isolee du collecteur
US20070102789A1 (en) * 2005-11-09 2007-05-10 International Business Machines Corporation Bipolar transistor and back-gated transistor structure and method
KR100832716B1 (ko) * 2006-12-27 2008-05-28 동부일렉트로닉스 주식회사 바이폴라 트랜지스터 및 그 제조방법
KR100879886B1 (ko) 2007-08-24 2009-01-22 주식회사 동부하이텍 반도체소자 및 그 제조방법
CN101925364B (zh) 2007-11-27 2014-04-30 不列颠哥伦比亚大学 用于预防和治疗关节炎的14-3-3拮抗剂
FR2989514A1 (fr) 2012-04-11 2013-10-18 St Microelectronics Sa Procede de fabrication d'un transistor bipolaire
US9343569B2 (en) * 2014-05-21 2016-05-17 International Business Machines Corporation Vertical compound semiconductor field effect transistor on a group IV semiconductor substrate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3600651A (en) * 1969-12-08 1971-08-17 Fairchild Camera Instr Co Bipolar and field-effect transistor using polycrystalline epitaxial deposited silicon
EP0287318B1 (de) * 1987-04-14 1995-03-15 Fairchild Semiconductor Corporation Integrierter Transistor und sein Herstellungsverfahren
US5134454A (en) * 1990-09-26 1992-07-28 Purdue Research Foundation Self-aligned integrated circuit bipolar transistor having monocrystalline contacts
US5273921A (en) * 1991-12-27 1993-12-28 Purdue Research Foundation Methods for fabricating a dual-gated semiconductor-on-insulator field effect transistor
JP2582519B2 (ja) * 1992-07-13 1997-02-19 インターナショナル・ビジネス・マシーンズ・コーポレイション バイポーラ・トランジスタおよびその製造方法
JP2630237B2 (ja) * 1993-12-22 1997-07-16 日本電気株式会社 半導体装置及びその製造方法
KR100275544B1 (ko) * 1995-12-20 2001-01-15 이계철 선택적 컬렉터 박막 성장을 이용한 초자기정렬 바이폴러 트랜지스터의 제조방법
FR2756100B1 (fr) * 1996-11-19 1999-02-12 Sgs Thomson Microelectronics Transistor bipolaire a emetteur inhomogene dans un circuit integre bicmos
KR100307183B1 (ko) * 1999-09-07 2001-11-05 염병렬 바이폴라 소자 및 그 제조 방법
EP1152462A1 (de) * 2000-05-05 2001-11-07 Infineon Technologies AG Verfahren zur Herstellung eines Bipolartransistors

Also Published As

Publication number Publication date
EP1436842B1 (de) 2005-06-01
US7141479B2 (en) 2006-11-28
DE10159414A1 (de) 2003-06-18
US20050020023A1 (en) 2005-01-27
WO2003049192A1 (de) 2003-06-12
AU2002340557A1 (en) 2003-06-17
EP1436842A1 (de) 2004-07-14

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