DE50100613D1 - Verfahren zur regelung von reaktiven sputterprozessen - Google Patents
Verfahren zur regelung von reaktiven sputterprozessenInfo
- Publication number
- DE50100613D1 DE50100613D1 DE50100613T DE50100613T DE50100613D1 DE 50100613 D1 DE50100613 D1 DE 50100613D1 DE 50100613 T DE50100613 T DE 50100613T DE 50100613 T DE50100613 T DE 50100613T DE 50100613 D1 DE50100613 D1 DE 50100613D1
- Authority
- DE
- Germany
- Prior art keywords
- reactive sputter
- controlling reactive
- sputter processes
- processes
- controlling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0094—Reactive sputtering in transition mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE50100613T DE50100613D1 (de) | 2000-03-27 | 2001-03-27 | Verfahren zur regelung von reaktiven sputterprozessen |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10015150 | 2000-03-27 | ||
PCT/EP2001/003443 WO2001073151A1 (de) | 2000-03-27 | 2001-03-27 | Verfahren zur regelung von reaktiven sputterprozessen |
DE50100613T DE50100613D1 (de) | 2000-03-27 | 2001-03-27 | Verfahren zur regelung von reaktiven sputterprozessen |
Publications (1)
Publication Number | Publication Date |
---|---|
DE50100613D1 true DE50100613D1 (de) | 2003-10-16 |
Family
ID=7636548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE50100613T Expired - Lifetime DE50100613D1 (de) | 2000-03-27 | 2001-03-27 | Verfahren zur regelung von reaktiven sputterprozessen |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1268872B2 (3Den) |
AU (1) | AU2001263815A1 (3Den) |
DE (1) | DE50100613D1 (3Den) |
WO (1) | WO2001073151A1 (3Den) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10347521A1 (de) | 2002-12-04 | 2004-06-24 | Leybold Optics Gmbh | Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens |
DE102005015587B4 (de) * | 2005-04-05 | 2009-12-24 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Anordnung zur Stabilisierung eines Arbeitspunktes von reaktiven, plasmagestützten Vakuumbeschichtungsprozessen |
CN102725433B (zh) * | 2010-01-21 | 2014-07-02 | Oc欧瑞康巴尔斯公司 | 用以沉积防反射层于基材上的方法 |
CN107532290B (zh) | 2015-03-31 | 2022-04-01 | 布勒阿尔策瑙股份有限公司 | 用于生产涂覆的基板的方法 |
DE102020122547B4 (de) | 2020-08-28 | 2024-02-22 | VON ARDENNE Asset GmbH & Co. KG | Verfahren, Steuervorrichtung und nichtflüchtiger Datenspeicher |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4428811A (en) * | 1983-04-04 | 1984-01-31 | Borg-Warner Corporation | Rapid rate reactive sputtering of a group IVb metal |
JPH01268859A (ja) * | 1988-04-20 | 1989-10-26 | Casio Comput Co Ltd | 透明導電膜の形成方法および形成装置 |
US5040559A (en) † | 1989-02-06 | 1991-08-20 | Mks Instruments, Inc. | Modulating positive shutoff mechanism |
ATE144004T1 (de) * | 1991-04-12 | 1996-10-15 | Balzers Hochvakuum | Verfahren und anlage zur beschichtung mindestens eines gegenstandes |
DE19609970A1 (de) * | 1996-03-14 | 1997-09-18 | Leybold Systems Gmbh | Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat |
-
2001
- 2001-03-27 AU AU2001263815A patent/AU2001263815A1/en not_active Abandoned
- 2001-03-27 DE DE50100613T patent/DE50100613D1/de not_active Expired - Lifetime
- 2001-03-27 EP EP01938052A patent/EP1268872B2/de not_active Expired - Lifetime
- 2001-03-27 WO PCT/EP2001/003443 patent/WO2001073151A1/de active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP1268872B1 (de) | 2003-09-10 |
EP1268872B2 (de) | 2010-01-20 |
WO2001073151A1 (de) | 2001-10-04 |
AU2001263815A1 (en) | 2001-10-08 |
EP1268872A1 (de) | 2003-01-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60143690D1 (de) | Verfahren zur unterstützung von leistungsregelung | |
DE60110775D1 (de) | Verfahren zur Reparaturbeschichtung | |
DE60136755D1 (de) | Verfahren zur effizienten reaktiven Überwachung | |
DE60221699D1 (de) | Verfahren zur färbung von formkörpern | |
DE50107437D1 (de) | Verfahren zur herstellung von polyacrylaten | |
DE50004677D1 (de) | Verfahren zur nutzeridentitätskontrolle | |
DE60001257D1 (de) | Verfahren zur bekämpfung von nachtfalterlarven | |
DE50111701D1 (de) | Verfahren zur steuerung des zugriffs | |
DE60141586D1 (de) | Verfahren zur fertigungssteuerung | |
DE60125906D1 (de) | Verfahren zur Verbesserung von Leistung | |
ATE384436T1 (de) | Verfahren zur unkrautbekämpfung | |
DE69921439D1 (de) | Verfahren zur Steuerung | |
DE60207013D1 (de) | Verfahren zur Konservierung von Pflanzenblätter | |
DE50104426D1 (de) | Verfahren zur vernetzung von polyacrylaten | |
DE69919148D1 (de) | Verfahren zur verzögerungssteuerung | |
DE50000893D1 (de) | Verfahren zur veredelung | |
DE50113263D1 (de) | Verfahren zur Anpassung von Aromamischungen | |
DE50015146D1 (de) | Verfahren zur fahrzeugregelung | |
DE60137401D1 (de) | Verfahren zur Selektion von Quartzglassubstraten | |
DE50014461D1 (de) | Verfahren zur Ansteuerung von Rückhaltemitteln | |
ATE301626T1 (de) | Verfahren zur disproportionierung von isopentan | |
DE50100613D1 (de) | Verfahren zur regelung von reaktiven sputterprozessen | |
DE50001116D1 (de) | Verfahren zur justage von parabolantennen | |
DE59901667D1 (de) | Verfahren zur steuerung von aufeinanderfolgenden maschinenprozessen | |
ATE206392T1 (de) | Verfahren zur alkylierug von gehinderten sulfonamiden |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8366 | Restricted maintained after opposition proceedings |