DE452006T1 - Verbundfilm und verfahren zu seiner herstellung. - Google Patents

Verbundfilm und verfahren zu seiner herstellung.

Info

Publication number
DE452006T1
DE452006T1 DE199191302786T DE91302786T DE452006T1 DE 452006 T1 DE452006 T1 DE 452006T1 DE 199191302786 T DE199191302786 T DE 199191302786T DE 91302786 T DE91302786 T DE 91302786T DE 452006 T1 DE452006 T1 DE 452006T1
Authority
DE
Germany
Prior art keywords
production
composite film
composite
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE199191302786T
Other languages
English (en)
Inventor
Atsushi Kamakura Kanagawa Jp Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE452006T1 publication Critical patent/DE452006T1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
DE199191302786T 1990-03-30 1991-03-28 Verbundfilm und verfahren zu seiner herstellung. Pending DE452006T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8069190 1990-03-30
JP2320689A JPH03285063A (ja) 1990-03-30 1990-11-27 複合蒸着膜体およびその製造方法

Publications (1)

Publication Number Publication Date
DE452006T1 true DE452006T1 (de) 1992-05-21

Family

ID=26421662

Family Applications (1)

Application Number Title Priority Date Filing Date
DE199191302786T Pending DE452006T1 (de) 1990-03-30 1991-03-28 Verbundfilm und verfahren zu seiner herstellung.

Country Status (4)

Country Link
US (1) US5340604A (de)
EP (1) EP0452006A3 (de)
JP (1) JPH03285063A (de)
DE (1) DE452006T1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03285063A (ja) * 1990-03-30 1991-12-16 Atsushi Ogura 複合蒸着膜体およびその製造方法
US5286534A (en) * 1991-12-23 1994-02-15 Minnesota Mining And Manufacturing Company Process for plasma deposition of a carbon rich coating
KR960026090A (ko) * 1994-12-22 1996-07-22 김주용 포토레지스트 도포방법 및 장치
US6116184A (en) 1996-05-21 2000-09-12 Symetrix Corporation Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
US5997642A (en) * 1996-05-21 1999-12-07 Symetrix Corporation Method and apparatus for misted deposition of integrated circuit quality thin films
DE29609637U1 (de) * 1996-05-30 1997-10-02 Siemens Ag Vorrichtung zur Plasma-Kurzzeitverdampfung von Substanzen
JPH1171676A (ja) * 1997-06-26 1999-03-16 General Electric Co <Ge> プラズマ活性形蒸発法による二酸化珪素の付着法
DE19742691C1 (de) * 1997-09-26 1999-01-28 Siemens Ag Verfahren und Vorrichtung zur Beschichtung von Substraten
JP2963993B1 (ja) * 1998-07-24 1999-10-18 工業技術院長 超微粒子成膜法
DE19947258A1 (de) * 1999-09-30 2001-04-19 Siemens Ag Verfahren und Vorrichtung zur Herstellung einer Wärmedämmschicht auf einem Bauteil sowie zugehöriges Wärmedämmschichtsystem
AU2001290650A1 (en) * 2000-09-05 2002-03-22 Altair Nanomaterials Inc Method for producing mixed metal oxides and metal oxide compounds
JP2002244127A (ja) * 2001-01-31 2002-08-28 Internatl Business Mach Corp <Ibm> 液晶表示装置、サイドライト型バックライト・ユニット、ランプ・リフレクタおよび反射部材
KR100805776B1 (ko) 2006-08-31 2008-02-21 한국기초과학지원연구원 Ｉｃｐ를 이용한 나노 분말 양산용 자유 낙하 출발 물질공급 장치
JP5171679B2 (ja) * 2009-02-10 2013-03-27 株式会社アルバック 成膜方法、パネル製造装置、アニール装置
DE102010000479A1 (de) 2010-02-19 2011-08-25 Aixtron Ag, 52134 Vorrichtung zur Homogenisierung eines verdampften Aerosols sowie Vorrichtung zum Abscheiden einer organischen Schicht auf einem Substrat mit einer derartigen Homogenisierungseinrichtung
DE102010043949B4 (de) * 2010-11-16 2013-06-20 Innovent E.V. Vorrichtung und Verfahren zum Beschichten von Oberflächen
DE102012106078A1 (de) * 2012-07-06 2014-05-08 Reinhausen Plasma Gmbh Beschichtungsvorrichtung und Verfahren zur Beschichtung eines Substrats

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121917A (ja) * 1982-12-28 1984-07-14 Nec Corp 気相成長装置
JPS6142377A (ja) * 1984-08-02 1986-02-28 Mitsubishi Motors Corp 金属薄板構造物の塗装方法
EP0209972A1 (de) * 1985-06-05 1987-01-28 Plessey Overseas Limited Verfahren zum Niederschlagen von Germaniumwasserstoffcarbid
JPS62105929A (ja) * 1985-10-29 1987-05-16 Atsushi Ogura フエライト・セラミツク複合粒子及びその製造方法
US4689212A (en) * 1986-05-14 1987-08-25 Polaroid Corporation Method for forming doped optical preforms
JPS6342377A (ja) * 1986-08-06 1988-02-23 Sharp Corp 超微粒子分散膜の製造方法
JPH01249625A (ja) * 1988-03-31 1989-10-04 Oki Electric Ind Co Ltd 超電導厚膜の形成方法
JPH03285063A (ja) * 1990-03-30 1991-12-16 Atsushi Ogura 複合蒸着膜体およびその製造方法

Also Published As

Publication number Publication date
JPH03285063A (ja) 1991-12-16
EP0452006A3 (en) 1992-05-20
EP0452006A2 (de) 1991-10-16
US5340604A (en) 1994-08-23

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