DE4122802C1 - - Google Patents

Info

Publication number
DE4122802C1
DE4122802C1 DE4122802A DE4122802A DE4122802C1 DE 4122802 C1 DE4122802 C1 DE 4122802C1 DE 4122802 A DE4122802 A DE 4122802A DE 4122802 A DE4122802 A DE 4122802A DE 4122802 C1 DE4122802 C1 DE 4122802C1
Authority
DE
Germany
Prior art keywords
arrangement according
reaction chamber
conductor
microwave
coaxial conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE4122802A
Other languages
German (de)
English (en)
Inventor
Harald 6500 Mainz De Kruemmel
Ewald 6507 Ingelheim De Moersen
Helge 6506 Nackenheim De Vogt
Guenter 6509 Armsheim De Weidmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Priority to DE4122802A priority Critical patent/DE4122802C1/de
Priority to EP19920109776 priority patent/EP0522300A3/de
Priority to CA002073391A priority patent/CA2073391A1/en
Priority to US07/910,879 priority patent/US5300901A/en
Priority to CN92109190.7A priority patent/CN1028064C/zh
Priority to JP4206209A priority patent/JPH05190103A/ja
Application granted granted Critical
Publication of DE4122802C1 publication Critical patent/DE4122802C1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/02—Coupling devices of the waveguide type with invariable factor of coupling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/08—Coupling devices of the waveguide type for linking dissimilar lines or devices
    • H01P5/10—Coupling devices of the waveguide type for linking dissimilar lines or devices for coupling balanced lines or devices with unbalanced lines or devices
    • H01P5/103—Hollow-waveguide/coaxial-line transitions

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Non-Reversible Transmitting Devices (AREA)
  • Waveguides (AREA)
  • Chemical Vapour Deposition (AREA)
DE4122802A 1991-07-10 1991-07-10 Expired - Lifetime DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE4122802A DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-07-10 1991-07-10
EP19920109776 EP0522300A3 (en) 1991-07-10 1992-06-10 Arrangement for coupling microwave energy
CA002073391A CA2073391A1 (en) 1991-07-10 1992-07-09 Arrangement for coupling in of microwave energy
US07/910,879 US5300901A (en) 1991-07-10 1992-07-10 Arrangement for coupling in of microwave energy
CN92109190.7A CN1028064C (zh) 1991-07-10 1992-07-10 耦合微波能的装置
JP4206209A JPH05190103A (ja) 1991-07-10 1992-07-10 マイクロ波エネルギーを結合するための装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4122802A DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-07-10 1991-07-10

Publications (1)

Publication Number Publication Date
DE4122802C1 true DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-12-17

Family

ID=6435818

Family Applications (1)

Application Number Title Priority Date Filing Date
DE4122802A Expired - Lifetime DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-07-10 1991-07-10

Country Status (6)

Country Link
US (1) US5300901A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0522300A3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPH05190103A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN1028064C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA2073391A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19710157A1 (de) * 1997-03-12 1998-10-01 Nukem Nuklear Gmbh Verfahren und Vorrichtung zum Eindampfen sulfathaltiger Lösungen
DE102004030344A1 (de) * 2004-06-18 2006-01-12 Carl Zeiss Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD)
CN113966062A (zh) * 2021-10-28 2022-01-21 重庆川仪自动化股份有限公司 等离子体产生装置及方法

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1037388C (zh) * 1993-12-24 1998-02-11 电子科技大学 一种功率合成电路
FR2727244B1 (fr) * 1994-11-18 1996-12-13 Thomson Tubes Electroniques Cavite resonante a couplage facilite
US5916259A (en) 1995-09-20 1999-06-29 Sun Microsystems, Inc. Coaxial waveguide applicator for an electromagnetic wave-activated sorption system
US5873258A (en) 1995-09-20 1999-02-23 Sun Microsystems, Inc Sorption refrigeration appliance
US6244056B1 (en) 1995-09-20 2001-06-12 Sun Microsystems, Inc. Controlled production of ammonia and other gases
AU707643B2 (en) * 1995-09-20 1999-07-15 Sun Microsystems, Inc. Absorbent pair refrigeration system
US5855119A (en) 1995-09-20 1999-01-05 Sun Microsystems, Inc. Method and apparatus for cooling electrical components
US5842356A (en) * 1995-09-20 1998-12-01 Sun Microsystems, Inc. Electromagnetic wave-activated sorption refrigeration system
JP3813741B2 (ja) * 1998-06-04 2006-08-23 尚久 後藤 プラズマ処理装置
TW492040B (en) 2000-02-14 2002-06-21 Tokyo Electron Ltd Device and method for coupling two circuit components which have different impedances
US7003979B1 (en) 2000-03-13 2006-02-28 Sun Microsystems, Inc. Method and apparatus for making a sorber
CN100352793C (zh) * 2006-01-20 2007-12-05 杨鸿生 用于以天然气制乙烯的槽波导微波化学反应设备及制备方法
EP2251454B1 (en) 2009-05-13 2014-07-23 SiO2 Medical Products, Inc. Vessel coating and inspection
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
JP5631088B2 (ja) * 2010-07-15 2014-11-26 国立大学法人東北大学 プラズマ処理装置及びプラズマ処理方法
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2677838B1 (en) * 2012-06-18 2017-12-06 Whirlpool Corporation Microwave heating apparatus
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US20160015898A1 (en) 2013-03-01 2016-01-21 Sio2 Medical Products, Inc. Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
JP6453841B2 (ja) 2013-03-11 2019-01-16 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 被覆包装
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US20160017490A1 (en) 2013-03-15 2016-01-21 Sio2 Medical Products, Inc. Coating method
JP5819448B2 (ja) * 2014-01-06 2015-11-24 東京エレクトロン株式会社 プラズマ処理装置、異常判定方法及びマイクロ波発生器
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
DE102020134320A1 (de) * 2020-12-18 2022-06-23 Endress+Hauser Flowtec Ag Antenne zur Dielektrizitätswert-Messung
CN119275517B (zh) * 2024-11-07 2025-09-02 中国科学院上海天文台 波导同轴滤波器及其设计方法和低温接收机

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475092A (en) * 1982-12-20 1984-10-02 Motorola, Inc. Absorptive resonant cavity filter
DE3905303A1 (de) * 1988-02-24 1989-08-31 Hitachi Ltd Vorrichtung zur erzeugung eines plasmas durch mikrowellen
US4886346A (en) * 1988-02-16 1989-12-12 Westinghouse Electric Corp. Method and apparatus for improving the angular aperture of an aodlf
US4971651A (en) * 1990-02-05 1990-11-20 Hitachi, Ltd. Microwave plasma processing method and apparatus
DE4028525A1 (de) * 1989-09-08 1991-03-21 Hitachi Ltd Mikrowellen-plasmaquellenvorrichtung

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2527549A (en) * 1943-02-04 1950-10-31 Jr Robert A Herring Concentric line construction
US2453759A (en) * 1943-12-20 1948-11-16 Bell Telephone Labor Inc Tapered union for concentric conductor lines
US2751499A (en) * 1944-05-22 1956-06-19 Bell Telephone Labor Inc Tuning and frequency stabilizing arrangement
US2646470A (en) * 1950-03-25 1953-07-21 Machlett Lab Inc Ultrahigh-frequency tetrode
NL245452A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1958-11-19
IT8622037V0 (it) * 1986-05-30 1986-05-30 Sebastiano Nicotra Oscillatore a microonde a risuonatore dielettrico.
US4866346A (en) * 1987-06-22 1989-09-12 Applied Science & Technology, Inc. Microwave plasma generator
US4794354A (en) * 1987-09-25 1988-12-27 Honeywell Incorporated Apparatus and method for modifying microwave
US5024716A (en) * 1988-01-20 1991-06-18 Canon Kabushiki Kaisha Plasma processing apparatus for etching, ashing and film-formation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475092A (en) * 1982-12-20 1984-10-02 Motorola, Inc. Absorptive resonant cavity filter
US4886346A (en) * 1988-02-16 1989-12-12 Westinghouse Electric Corp. Method and apparatus for improving the angular aperture of an aodlf
DE3905303A1 (de) * 1988-02-24 1989-08-31 Hitachi Ltd Vorrichtung zur erzeugung eines plasmas durch mikrowellen
DE4028525A1 (de) * 1989-09-08 1991-03-21 Hitachi Ltd Mikrowellen-plasmaquellenvorrichtung
US4971651A (en) * 1990-02-05 1990-11-20 Hitachi, Ltd. Microwave plasma processing method and apparatus

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GROLL, Horst: MIKROWELLENMESTECHNIK, Vieweg & Sohn, Braunschweig 1969, S. 99 *
MEINKE, Hans H. und GUNDLACH, Friedrich W.: Taschenbuch der Hochfrequenztechnik, 3. Aufl., 1968, Springer-Verlag, Abschn. F 6, S. 530, 531 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19710157A1 (de) * 1997-03-12 1998-10-01 Nukem Nuklear Gmbh Verfahren und Vorrichtung zum Eindampfen sulfathaltiger Lösungen
DE102004030344A1 (de) * 2004-06-18 2006-01-12 Carl Zeiss Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD)
DE102004030344B4 (de) * 2004-06-18 2012-12-06 Carl Zeiss Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD)
CN113966062A (zh) * 2021-10-28 2022-01-21 重庆川仪自动化股份有限公司 等离子体产生装置及方法

Also Published As

Publication number Publication date
CN1028064C (zh) 1995-03-29
EP0522300A3 (en) 1993-09-22
CA2073391A1 (en) 1993-01-11
EP0522300A2 (de) 1993-01-13
JPH05190103A (ja) 1993-07-30
CN1075827A (zh) 1993-09-01
US5300901A (en) 1994-04-05

Similar Documents

Publication Publication Date Title
DE4122802C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE2548220C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE19628954B4 (de) Vorrichtung zur Erzeugung von Plasma
DE69510576T2 (de) Plasma-Entschichtungsvorrichtung mit Mikrowellenfalle
DE4028525A1 (de) Mikrowellen-plasmaquellenvorrichtung
EP0916153B1 (de) Vorrichtung zur erzeugung von plasma
DE3101641A1 (de) "dielektrische erhitzungsvorrichtung"
DE2711278A1 (de) Einrichtung zum wirksamen ankoppeln von mikrowellenenergie an eine last
EP0961528B1 (de) Vorrichtung zur Erzeugung von Plasma
DE3781146T2 (de) Hf-entladungsangeregter laser.
EP1183709A1 (de) Linear ausgedehnte anordnung zur grossflächigen mikrowellenbehandlung und zur grossflächigen plasmaerzeugung
DE3622614A1 (de) Verfahren zur herstellung von elektrisch leitenden formkoerpern durch plasmaaktivierte chemische abscheidung aus der gasphase
DE68913331T2 (de) Magnetron.
EP1864377B1 (de) Mikrowellengenerator
DE3688086T2 (de) Trichterstrahler fuer zirkular polarisierte wellen.
DE8610137U1 (de) Mikrowellenkalorimeter
DE69025486T2 (de) TEM-Koaxialresonator
EP0242658A1 (de) Gaslaser mit einem in Axialrichtung vom Gas durchströmten Entladungsrohr
DE69130094T2 (de) Einrichtung zum Erzeugen eines Plasmas
DE3044379C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE19844549A1 (de) Vorrichtung und Verfahren zum Erwärmen von Bauteilen aus mikrowellenabsorbierendem Kunststoff
EP0520249A1 (de) Hochfrequenzangeregter Laser für hohe Eingangsleistungen, insbesondere CO2-Bandleiterlaser
EP0963141A2 (de) Vorrichtung zur Erzeugung von Plasma
DE3343747A1 (de) Gyrotron-oszillator
EP0590343B1 (de) Hochfrequenzangeregter Laser für hohe Eingangsleistungen, insbesondere CO2-Bandleiterlaser

Legal Events

Date Code Title Description
8100 Publication of patent without earlier publication of application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee