DE4105317C2 - - Google Patents
Info
- Publication number
- DE4105317C2 DE4105317C2 DE19914105317 DE4105317A DE4105317C2 DE 4105317 C2 DE4105317 C2 DE 4105317C2 DE 19914105317 DE19914105317 DE 19914105317 DE 4105317 A DE4105317 A DE 4105317A DE 4105317 C2 DE4105317 C2 DE 4105317C2
- Authority
- DE
- Germany
- Prior art keywords
- tower
- film receiving
- films
- area
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011888 foil Substances 0.000 claims description 10
- 125000006850 spacer group Chemical group 0.000 claims description 7
- 230000000717 retained effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 6
- 238000012549 training Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19914105317 DE4105317A1 (de) | 1991-02-20 | 1991-02-20 | Vorrichtung zur herstellung von druckplatten |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19914105317 DE4105317A1 (de) | 1991-02-20 | 1991-02-20 | Vorrichtung zur herstellung von druckplatten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE4105317A1 DE4105317A1 (de) | 1992-08-27 |
| DE4105317C2 true DE4105317C2 (enExample) | 1992-12-17 |
Family
ID=6425502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19914105317 Granted DE4105317A1 (de) | 1991-02-20 | 1991-02-20 | Vorrichtung zur herstellung von druckplatten |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE4105317A1 (enExample) |
-
1991
- 1991-02-20 DE DE19914105317 patent/DE4105317A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE4105317A1 (de) | 1992-08-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |