DE4028376A1 - Verfahren zur herstellung von duennschicht-dehnmessstreifenanordnungen - Google Patents
Verfahren zur herstellung von duennschicht-dehnmessstreifenanordnungenInfo
- Publication number
- DE4028376A1 DE4028376A1 DE19904028376 DE4028376A DE4028376A1 DE 4028376 A1 DE4028376 A1 DE 4028376A1 DE 19904028376 DE19904028376 DE 19904028376 DE 4028376 A DE4028376 A DE 4028376A DE 4028376 A1 DE4028376 A1 DE 4028376A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- resistance
- film
- glass substrate
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 title claims abstract description 12
- 239000010409 thin film Substances 0.000 title claims abstract description 9
- 239000010408 film Substances 0.000 title claims description 8
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000005259 measurement Methods 0.000 claims abstract description 7
- 230000001133 acceleration Effects 0.000 claims abstract 2
- 238000006073 displacement reaction Methods 0.000 claims abstract 2
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 229910001006 Constantan Inorganic materials 0.000 claims description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 2
- 238000004026 adhesive bonding Methods 0.000 claims description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 238000006748 scratching Methods 0.000 claims description 2
- 230000002393 scratching effect Effects 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims 1
- 238000003698 laser cutting Methods 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 239000011888 foil Substances 0.000 abstract description 2
- 230000001419 dependent effect Effects 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 39
- 238000012360 testing method Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000009413 insulation Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Force In General (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19904028376 DE4028376A1 (de) | 1990-09-07 | 1990-09-07 | Verfahren zur herstellung von duennschicht-dehnmessstreifenanordnungen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19904028376 DE4028376A1 (de) | 1990-09-07 | 1990-09-07 | Verfahren zur herstellung von duennschicht-dehnmessstreifenanordnungen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE4028376A1 true DE4028376A1 (de) | 1992-03-12 |
| DE4028376C2 DE4028376C2 (enrdf_load_stackoverflow) | 1992-06-11 |
Family
ID=6413773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19904028376 Granted DE4028376A1 (de) | 1990-09-07 | 1990-09-07 | Verfahren zur herstellung von duennschicht-dehnmessstreifenanordnungen |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE4028376A1 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998009145A1 (de) * | 1996-08-27 | 1998-03-05 | Robert Bosch Gmbh | Verfahren zur herstellung von drucksensoren |
| US6062088A (en) * | 1996-04-13 | 2000-05-16 | Robert Bosch Gmbh | Pressure sensor |
| US6725724B2 (en) * | 2000-07-26 | 2004-04-27 | Robert Bosch Gmbh | Manufacturing method for a thin-film high-pressure sensor |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19936856C1 (de) * | 1999-08-05 | 2000-09-28 | Siemens Ag | Verfahren zum Herstellen eines Bauelements, insbesondere Foliendehnungsmeßstreifenelements, sowie Foliendehnungsmeßstreifenelement |
| DE10230711B4 (de) * | 2002-07-08 | 2007-06-06 | Siemens Ag | Elektrisch leitende Verbindung |
| DE102006023724B4 (de) * | 2006-05-19 | 2008-08-07 | Trafag Ag | Messzellenanordnung für einen Drucksensor mit Kraftmesselement aus Glas |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1067475A (en) * | 1963-11-29 | 1967-05-03 | Ultra Electronics Ltd | Tantalum film resistors |
| EP0087419B1 (de) * | 1981-04-04 | 1986-06-11 | Robert Bosch Gmbh | Dünnschicht-dehnungsmessstreifen und verfahren zu seiner herstellung |
-
1990
- 1990-09-07 DE DE19904028376 patent/DE4028376A1/de active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1067475A (en) * | 1963-11-29 | 1967-05-03 | Ultra Electronics Ltd | Tantalum film resistors |
| EP0087419B1 (de) * | 1981-04-04 | 1986-06-11 | Robert Bosch Gmbh | Dünnschicht-dehnungsmessstreifen und verfahren zu seiner herstellung |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6062088A (en) * | 1996-04-13 | 2000-05-16 | Robert Bosch Gmbh | Pressure sensor |
| DE19714703B4 (de) * | 1996-04-13 | 2014-02-13 | Robert Bosch Gmbh | Drucksensor |
| WO1998009145A1 (de) * | 1996-08-27 | 1998-03-05 | Robert Bosch Gmbh | Verfahren zur herstellung von drucksensoren |
| US6189205B1 (en) | 1996-08-27 | 2001-02-20 | Robert Bosch Gmbh | Process for producing pressure sensors |
| US6725724B2 (en) * | 2000-07-26 | 2004-04-27 | Robert Bosch Gmbh | Manufacturing method for a thin-film high-pressure sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| DE4028376C2 (enrdf_load_stackoverflow) | 1992-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8363 | Opposition against the patent | ||
| 8331 | Complete revocation |