DE4004468C2 - Verwendung eines SiO¶2¶-Mattierungsmittels zur Herstellung von thixotropen, auf polyamid-modifizierten Alkydharzen basierenden Farben und Lacken - Google Patents
Verwendung eines SiO¶2¶-Mattierungsmittels zur Herstellung von thixotropen, auf polyamid-modifizierten Alkydharzen basierenden Farben und LackenInfo
- Publication number
- DE4004468C2 DE4004468C2 DE4004468A DE4004468A DE4004468C2 DE 4004468 C2 DE4004468 C2 DE 4004468C2 DE 4004468 A DE4004468 A DE 4004468A DE 4004468 A DE4004468 A DE 4004468A DE 4004468 C2 DE4004468 C2 DE 4004468C2
- Authority
- DE
- Germany
- Prior art keywords
- sio2
- polyol
- matting agent
- use according
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 107
- 239000000377 silicon dioxide Substances 0.000 claims description 53
- 229910052681 coesite Inorganic materials 0.000 claims description 51
- 229910052906 cristobalite Inorganic materials 0.000 claims description 51
- 235000012239 silicon dioxide Nutrition 0.000 claims description 51
- 229910052682 stishovite Inorganic materials 0.000 claims description 51
- 229910052905 tridymite Inorganic materials 0.000 claims description 51
- 229920005862 polyol Polymers 0.000 claims description 36
- 150000003077 polyols Chemical class 0.000 claims description 35
- 239000006224 matting agent Substances 0.000 claims description 31
- 239000003973 paint Substances 0.000 claims description 20
- 230000009974 thixotropic effect Effects 0.000 claims description 14
- 229920000180 alkyd Polymers 0.000 claims description 11
- 239000002966 varnish Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000017 hydrogel Substances 0.000 claims description 4
- 239000003086 colorant Substances 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 2
- 239000007791 liquid phase Substances 0.000 claims description 2
- 239000000741 silica gel Substances 0.000 claims description 2
- 229910002027 silica gel Inorganic materials 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000000725 suspension Substances 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- -1 SiO2 polyol Chemical class 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 9
- 150000001298 alcohols Chemical class 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- 235000011187 glycerol Nutrition 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- AIOLRLMFOWGSPL-UHFFFAOYSA-N chembl1337820 Chemical compound C1=CC=C2C(N=NC3=C4C=CC(=CC4=CC(=C3O)S(O)(=O)=O)S(O)(=O)=O)=CC=CC2=C1 AIOLRLMFOWGSPL-UHFFFAOYSA-N 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001595 flow curve Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001698 pyrogenic effect Effects 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000012549 training Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3063—Treatment with low-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
- C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
- C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
Priority Applications (15)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4004468A DE4004468C2 (de) | 1990-02-14 | 1990-02-14 | Verwendung eines SiO¶2¶-Mattierungsmittels zur Herstellung von thixotropen, auf polyamid-modifizierten Alkydharzen basierenden Farben und Lacken |
| ZA91565A ZA91565B (en) | 1990-02-14 | 1991-01-25 | Sio2-flatting agent,process for the production and its use |
| AT91101257T ATE119929T1 (de) | 1990-02-14 | 1991-01-31 | Si02-mattierungsmittel, verfahren zu seiner herstellung und seine verwendung. |
| DE69108071T DE69108071T3 (de) | 1990-02-14 | 1991-01-31 | Si02-Mattierungsmittel, Verfahren zu seiner Herstellung und seine Verwendung. |
| EP91101257A EP0442325B2 (en) | 1990-02-14 | 1991-01-31 | Si02-Flatting agent, process for its production and its use |
| CA002035675A CA2035675A1 (en) | 1990-02-14 | 1991-02-05 | Sio2-flatting agent, process for its production and its use |
| BR919100472A BR9100472A (pt) | 1990-02-14 | 1991-02-05 | Agente nivelador de si02,processo para sua producao e seu uso |
| AU70936/91A AU638544B2 (en) | 1990-02-14 | 1991-02-11 | SiO2-flatting agent, process for its production and its use |
| YU26291A YU26291A (sh) | 1990-02-14 | 1991-02-13 | SREDSTVO ZA MATIRANJE NA BAZI SiO2, POSTUPAK ZA DOBIJANJE I PRIMENA |
| NO91910580A NO910580L (no) | 1990-02-14 | 1991-02-13 | Matteringsmiddel samt fremstilling derav. |
| FI910696A FI910696A7 (fi) | 1990-02-14 | 1991-02-13 | SiO2-himmennysaine, menetelmä sen valmistamiseksi ja sen käyttö |
| CS91382A CS38291A2 (en) | 1990-02-14 | 1991-02-14 | Matting agent on base of silicon dioxide, method of this agent preparation and method of this agent application |
| PL28906391A PL289063A1 (en) | 1990-02-14 | 1991-02-14 | Sio<v>2<d> based matting agent and method of obtaining same |
| TW080106399A TW203090B (enrdf_load_stackoverflow) | 1990-02-14 | 1991-08-13 | |
| US07/785,900 US5221337A (en) | 1990-02-14 | 1991-11-01 | SiO2 flatting agent, process for its production and its use |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4004468A DE4004468C2 (de) | 1990-02-14 | 1990-02-14 | Verwendung eines SiO¶2¶-Mattierungsmittels zur Herstellung von thixotropen, auf polyamid-modifizierten Alkydharzen basierenden Farben und Lacken |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE4004468C1 DE4004468C1 (enrdf_load_stackoverflow) | 1991-08-22 |
| DE4004468C2 true DE4004468C2 (de) | 1997-10-09 |
Family
ID=6400078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4004468A Expired - Fee Related DE4004468C2 (de) | 1990-02-14 | 1990-02-14 | Verwendung eines SiO¶2¶-Mattierungsmittels zur Herstellung von thixotropen, auf polyamid-modifizierten Alkydharzen basierenden Farben und Lacken |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE4004468C2 (enrdf_load_stackoverflow) |
| ZA (1) | ZA91565B (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3704084A1 (de) * | 1987-02-10 | 1988-08-18 | Huettenes Albertus | Verdickungsmittel |
| DE3724824A1 (de) * | 1987-07-27 | 1989-02-09 | Huettenes Albertus | Beschichtungsmasse auf basis einer wasserhaltigen emulsion |
-
1990
- 1990-02-14 DE DE4004468A patent/DE4004468C2/de not_active Expired - Fee Related
-
1991
- 1991-01-25 ZA ZA91565A patent/ZA91565B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE4004468C1 (enrdf_load_stackoverflow) | 1991-08-22 |
| ZA91565B (en) | 1991-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8100 | Publication of the examined application without publication of unexamined application | ||
| D1 | Grant (no unexamined application published) patent law 81 | ||
| 8363 | Opposition against the patent | ||
| 8366 | Restricted maintained after opposition proceedings | ||
| 8305 | Restricted maintenance of patent after opposition | ||
| D3 | Patent maintained restricted (no unexamined application published) | ||
| 8339 | Ceased/non-payment of the annual fee |