DE3904034A1 - Strahlungsheizvorrichtung - Google Patents
StrahlungsheizvorrichtungInfo
- Publication number
- DE3904034A1 DE3904034A1 DE19893904034 DE3904034A DE3904034A1 DE 3904034 A1 DE3904034 A1 DE 3904034A1 DE 19893904034 DE19893904034 DE 19893904034 DE 3904034 A DE3904034 A DE 3904034A DE 3904034 A1 DE3904034 A1 DE 3904034A1
- Authority
- DE
- Germany
- Prior art keywords
- radiation
- temperature
- control device
- beam path
- heated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 105
- 238000010438 heat treatment Methods 0.000 title abstract description 22
- 238000001816 cooling Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 description 8
- 238000000137 annealing Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 101100115778 Caenorhabditis elegans dac-1 gene Proteins 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000012809 cooling fluid Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000004151 rapid thermal annealing Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001073 sample cooling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- -1 tungsten halogen Chemical class 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1919—Control of temperature characterised by the use of electric means characterised by the type of controller
- G05D23/192—Control of temperature characterised by the use of electric means characterised by the type of controller using a modification of the thermal impedance between a source and the load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Control Of Resistance Heating (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19893904034 DE3904034A1 (de) | 1989-02-10 | 1989-02-10 | Strahlungsheizvorrichtung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19893904034 DE3904034A1 (de) | 1989-02-10 | 1989-02-10 | Strahlungsheizvorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3904034A1 true DE3904034A1 (de) | 1990-08-16 |
DE3904034C2 DE3904034C2 (enrdf_load_stackoverflow) | 1993-07-15 |
Family
ID=6373838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19893904034 Granted DE3904034A1 (de) | 1989-02-10 | 1989-02-10 | Strahlungsheizvorrichtung |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE3904034A1 (enrdf_load_stackoverflow) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2611855A (en) * | 1947-05-02 | 1952-09-23 | Proctor Electric Co | Electric blanket control |
DE2210022A1 (de) * | 1971-03-15 | 1972-10-12 | Matsushita Electric Ind Co Ltd | Stromregelungsgerät |
-
1989
- 1989-02-10 DE DE19893904034 patent/DE3904034A1/de active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2611855A (en) * | 1947-05-02 | 1952-09-23 | Proctor Electric Co | Electric blanket control |
DE2210022A1 (de) * | 1971-03-15 | 1972-10-12 | Matsushita Electric Ind Co Ltd | Stromregelungsgerät |
Non-Patent Citations (2)
Title |
---|
G. Pensl et al. "Electronic Defects in silicon After Transient Isothermal Annealing" aus Mat. Res. Soc. Symp. Proc. Bd. 23(1984) S. 347-358 * |
Katsuhiro Yokota et.al. "Halogen and Mercury Lamp Annealing of Arsenic Implanted into Silicon" aus Japanese Journal of Applied Physics Vol. 26 Nr. 2 February 1987 S. L87-L90 * |
Also Published As
Publication number | Publication date |
---|---|
DE3904034C2 (enrdf_load_stackoverflow) | 1993-07-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0345443B1 (de) | Verfahren zum Kurzzeittempern einer Halbleiterscheibe durch Bestrahlung | |
DE69220868T2 (de) | System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen | |
US2968723A (en) | Means for controlling crystal structure of materials | |
DE102004029102B4 (de) | Substratbearbeitungseinrichtung und Substratbearbeitungsverfahren | |
EP0325575B1 (de) | Anordnung zur Stabilisierung einer bestrahlten Maske | |
DE69937255T2 (de) | Schnell-aufheiz- und -kühlvorrichtung für halbleiterwafer | |
WO2002054057A1 (de) | Analyseverfahren zur detektion von räumlichen spurenelement-verteilungsmustern und vorrichtung zur verfahrensdurchführung | |
DE69633511T2 (de) | Vorrichtung und verfahren zur laser-oberflächenbehandlung | |
DE112012005189B4 (de) | Ladungsteilchenbestrahlungsvorrichtung | |
DE102008037663A1 (de) | Aufbau eines Impulslaser-Ausheilsystems | |
DE1544211A1 (de) | Verfahren zum Herstellen von Halbleitervorrichtungen | |
DE112021006914T5 (de) | Sondensysteme, die zum testen einer zu testenden vorrichtung konfiguriert sind, und verfahren zum betreiben der sondensysteme | |
EP1297398B1 (de) | Verfahren und vorrichtung zum thermischen behandeln von objekten | |
EP0309973B1 (de) | Verfahren zum thermischen Bearbeiten von Bauteilen in festem Zustand mit einem Laserstrahl | |
DE102020214130A1 (de) | Verfahren zur Temperierung eines optischen Elementes und optische Baugruppe | |
DE10159170B4 (de) | Polarisierungsvorrichtung und -verfahren | |
DE3904034C2 (enrdf_load_stackoverflow) | ||
DE2412729B2 (de) | Verfahren und Anordnung zur Regelung der Verdampfungsrate und des Schichtaufbaus bei der Erzeugung optisch wirksamer Dünnschichten | |
LU87192A1 (de) | Vorrichtung zum herstellen amorpher keramikstoffe oder metallegierungen | |
DE19934561C2 (de) | Analyseverfahren zur Detektion von räumlichen Spurenelement-Verteilungsmustern in einer Feststoffprobe und Anordnung zu seiner Druchführung | |
DE3712049A1 (de) | Roentgenbelichtungsgeraet | |
DE112005001387B4 (de) | Anwendung einer vom waferemissionsvermögen unabhängigen aktiven wafertemperaturregeleinrichtung, verfahren, vorrichtung und maschinenlesbares medium | |
WO2004059695A2 (de) | Ultraschallevitation in einer schnellheizanlage für wafer | |
DE102019111373A1 (de) | Laserbearbeitungsvorrichtung, sowie Verfahren zur Regelung eines Spatial Light Modulators | |
DE10036177C2 (de) | Verfahren zum Testen von Halbleitereinrichtungen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: HORVATH, JENOE, DR., 70182 STUTTGART, DE |
|
8339 | Ceased/non-payment of the annual fee |