DE3885243D1 - Vorrichtung und ihre Verwendung zur Herstellung von Halbleitern. - Google Patents

Vorrichtung und ihre Verwendung zur Herstellung von Halbleitern.

Info

Publication number
DE3885243D1
DE3885243D1 DE88307330T DE3885243T DE3885243D1 DE 3885243 D1 DE3885243 D1 DE 3885243D1 DE 88307330 T DE88307330 T DE 88307330T DE 3885243 T DE3885243 T DE 3885243T DE 3885243 D1 DE3885243 D1 DE 3885243D1
Authority
DE
Germany
Prior art keywords
semiconductors
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE88307330T
Other languages
English (en)
Other versions
DE3885243T2 (de
Inventor
Akira Yoshino
Kenji Okumura
Toshiharu Ohnishi
Shigeru Kuromiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Water Inc
Original Assignee
Daido Sanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Sanso Co Ltd filed Critical Daido Sanso Co Ltd
Publication of DE3885243D1 publication Critical patent/DE3885243D1/de
Application granted granted Critical
Publication of DE3885243T2 publication Critical patent/DE3885243T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
DE19883885243 1987-11-30 1988-08-08 Vorrichtung und ihre Verwendung zur Herstellung von Halbleitern. Expired - Lifetime DE3885243T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP30420687 1987-11-30
JP30420987 1987-11-30

Publications (2)

Publication Number Publication Date
DE3885243D1 true DE3885243D1 (de) 1993-12-02
DE3885243T2 DE3885243T2 (de) 1994-05-11

Family

ID=26563819

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883885243 Expired - Lifetime DE3885243T2 (de) 1987-11-30 1988-08-08 Vorrichtung und ihre Verwendung zur Herstellung von Halbleitern.

Country Status (2)

Country Link
EP (1) EP0319122B1 (de)
DE (1) DE3885243T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5284521A (en) * 1990-09-21 1994-02-08 Anelva Corporation Vacuum film forming apparatus
US5759263A (en) * 1996-12-05 1998-06-02 Abb Research Ltd. Device and a method for epitaxially growing objects by cvd

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916822A (en) * 1974-04-26 1975-11-04 Bell Telephone Labor Inc Chemical vapor deposition reactor
DE3427057A1 (de) * 1984-07-23 1986-01-23 Standard Elektrik Lorenz Ag, 7000 Stuttgart Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum
JPS6235513A (ja) * 1985-08-09 1987-02-16 Hitachi Ltd 分子線エピタキシ装置
DE3868875D1 (de) * 1987-11-30 1992-04-09 Daido Oxygen Apparat zur produktion von halbleitern.

Also Published As

Publication number Publication date
EP0319122A1 (de) 1989-06-07
DE3885243T2 (de) 1994-05-11
EP0319122B1 (de) 1993-10-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DAIDO HOXAN INC., SAPPORO, JP

8327 Change in the person/name/address of the patent owner

Owner name: AIR WATER INC., SAPPORO, HOKKAIDO, JP