DE3878349D1 - Substituierte acridin-derivate und deren verwendung. - Google Patents

Substituierte acridin-derivate und deren verwendung.

Info

Publication number
DE3878349D1
DE3878349D1 DE8888902557T DE3878349T DE3878349D1 DE 3878349 D1 DE3878349 D1 DE 3878349D1 DE 8888902557 T DE8888902557 T DE 8888902557T DE 3878349 T DE3878349 T DE 3878349T DE 3878349 D1 DE3878349 D1 DE 3878349D1
Authority
DE
Germany
Prior art keywords
acridine derivatives
substituted acridine
substituted
derivatives
acridine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888902557T
Other languages
English (en)
Other versions
DE3878349T2 (de
Inventor
Hajime Yamasaki Kojo Kakumaru
Yoshitaka Yamasaki Kojo Minami
Naohiro Kaihatsu Kenkyu Kubota
Shinya Kaihatsu Kenkyu Mashimo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6220987A external-priority patent/JPH0676402B2/ja
Priority claimed from JP9172587A external-priority patent/JPH07103165B2/ja
Application filed by Hitachi Chemical Co Ltd, Asahi Denka Kogyo KK filed Critical Hitachi Chemical Co Ltd
Publication of DE3878349D1 publication Critical patent/DE3878349D1/de
Application granted granted Critical
Publication of DE3878349T2 publication Critical patent/DE3878349T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/58—Polymerisation initiated by direct application of electric current
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8888902557T 1987-03-17 1988-03-17 Substituierte acridin-derivate und deren verwendung. Expired - Fee Related DE3878349T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6220987A JPH0676402B2 (ja) 1987-03-17 1987-03-17 ９−ピリジルアクリジン化合物
JP9172587A JPH07103165B2 (ja) 1987-04-14 1987-04-14 光重合性組成物
PCT/JP1988/000275 WO1988007042A1 (en) 1987-03-17 1988-03-17 Substituted acridine derivatives and their use

Publications (2)

Publication Number Publication Date
DE3878349D1 true DE3878349D1 (de) 1993-03-25
DE3878349T2 DE3878349T2 (de) 1993-05-27

Family

ID=26403269

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888902557T Expired - Fee Related DE3878349T2 (de) 1987-03-17 1988-03-17 Substituierte acridin-derivate und deren verwendung.

Country Status (4)

Country Link
US (1) US5045433A (de)
EP (1) EP0305545B1 (de)
DE (1) DE3878349T2 (de)
WO (1) WO1988007042A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0305545B1 (de) * 1987-03-17 1993-02-10 Hitachi Chemical Co., Ltd. Substituierte acridin-derivate und deren verwendung
JP2505637B2 (ja) * 1990-09-28 1996-06-12 日立化成工業株式会社 光重合性組成物および光重合性エレメント
JPH04170546A (ja) * 1990-11-01 1992-06-18 Fuji Photo Film Co Ltd 光重合性組成物
DE4132466A1 (de) * 1991-09-30 1993-04-01 Bayer Ag Photochemisch verknuepfbare polymere
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
TWI306546B (de) * 2000-05-29 2009-02-21 Hitachi Chemical Co Ltd
JP2009096991A (ja) * 2007-09-27 2009-05-07 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
CN102998903B (zh) * 2012-12-05 2015-04-08 北京化工大学常州先进材料研究院 一种含有吖啶双官能光引发剂的感光性组合物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649632A (en) * 1970-01-27 1972-03-14 American Home Prod 3 4-dihydroacridin-2-(1h)-one derivatives
DE2027467C3 (de) * 1970-06-04 1974-08-15 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerisierbare Kopiermasse
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE3232620A1 (de) * 1982-09-02 1984-03-08 Hoechst Ag, 6230 Frankfurt 10-phenyl1-1,3,9-triazaanthracene und diese enthaltendes photopolymerisierbares gemisch
SU1168561A1 (ru) * 1983-02-14 1985-07-23 Предприятие П/Я А-3374 Реагент дл колориметрического определени ангидридов и галоидангидридов карбоновых кислот
JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPS60164739A (ja) * 1984-02-07 1985-08-27 Fuji Photo Film Co Ltd 光重合性組成物
DE3427519A1 (de) * 1984-07-26 1986-02-06 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch, darin enthaltenes mischpolymerisat und verfahren zur herstellung des mischpolymerisats
EP0305545B1 (de) * 1987-03-17 1993-02-10 Hitachi Chemical Co., Ltd. Substituierte acridin-derivate und deren verwendung

Also Published As

Publication number Publication date
US5045433A (en) 1991-09-03
DE3878349T2 (de) 1993-05-27
EP0305545A1 (de) 1989-03-08
WO1988007042A1 (en) 1988-09-22
EP0305545B1 (de) 1993-02-10
EP0305545A4 (de) 1989-07-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee