DE3873568T2 - Anlage zur kontinuierlichen vakuumverdampfung eines metalls. - Google Patents

Anlage zur kontinuierlichen vakuumverdampfung eines metalls.

Info

Publication number
DE3873568T2
DE3873568T2 DE8888400522T DE3873568T DE3873568T2 DE 3873568 T2 DE3873568 T2 DE 3873568T2 DE 8888400522 T DE8888400522 T DE 8888400522T DE 3873568 T DE3873568 T DE 3873568T DE 3873568 T2 DE3873568 T2 DE 3873568T2
Authority
DE
Germany
Prior art keywords
plate
valve
crucible
deposition material
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888400522T
Other languages
English (en)
Other versions
DE3873568D1 (de
Inventor
Olivier Remondiere
Patrick Bourquin
Rene Pailler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National dEtudes Spatiales CNES
Original Assignee
Centre National dEtudes Spatiales CNES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National dEtudes Spatiales CNES filed Critical Centre National dEtudes Spatiales CNES
Application granted granted Critical
Publication of DE3873568D1 publication Critical patent/DE3873568D1/de
Publication of DE3873568T2 publication Critical patent/DE3873568T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
DE8888400522T 1987-03-06 1988-03-04 Anlage zur kontinuierlichen vakuumverdampfung eines metalls. Expired - Fee Related DE3873568T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8703092A FR2611746B1 (fr) 1987-03-06 1987-03-06 Dispositif d'evaporation sous vide d'un metal en continu

Publications (2)

Publication Number Publication Date
DE3873568D1 DE3873568D1 (de) 1992-09-17
DE3873568T2 true DE3873568T2 (de) 1993-03-11

Family

ID=9348693

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888400522T Expired - Fee Related DE3873568T2 (de) 1987-03-06 1988-03-04 Anlage zur kontinuierlichen vakuumverdampfung eines metalls.

Country Status (6)

Country Link
US (1) US4880960A (de)
EP (1) EP0283374B1 (de)
AT (1) ATE79417T1 (de)
DE (1) DE3873568T2 (de)
ES (1) ES2034288T3 (de)
FR (1) FR2611746B1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021100060A1 (de) 2021-01-05 2022-07-07 Thyssenkrupp Steel Europe Ag Beschichtungsanordnung

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
DE102004041854B4 (de) * 2004-04-27 2008-11-13 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung
US20080128094A1 (en) * 2004-10-21 2008-06-05 Tatsuo Fukuda Evaporation Source Device
PL1752554T3 (pl) * 2005-07-28 2008-03-31 Applied Mat Gmbh & Co Kg Urządzenie do naparowywania
EP1752555A1 (de) 2005-07-28 2007-02-14 Applied Materials GmbH & Co. KG Verdampfervorrichtung
ITMI20060444A1 (it) * 2006-03-13 2007-09-14 Getters Spa Uso di composizioni magnesio-rame per l'evaporazione di magnesio e dispensatori di magnesio
US20090020070A1 (en) * 2007-07-19 2009-01-22 Michael Schafer Vacuum evaporation apparatus for solid materials
TWI564427B (zh) * 2009-12-18 2017-01-01 財團法人工業技術研究院 聚對二甲苯薄膜的形成方法
EP2369034B1 (de) 2010-03-26 2013-01-30 Saint-Gobain Glass France Verfahren zum Nachfüllen einer Selenverdampferkammer
EP2371991B1 (de) 2010-03-26 2013-01-30 Saint-Gobain Glass France Verfahren zum diskontinuierlichen Nachfüllen einer Selenverdampferkammer
EP2369033A1 (de) 2010-03-26 2011-09-28 Saint-Gobain Glass France Verfahren zum Nachfüllen einer Verdampferkammer
US10184168B2 (en) * 2015-01-20 2019-01-22 Kennametal Inc. IMC evaporator boat-thermal insulation cartridge assembly
KR102098455B1 (ko) * 2017-12-26 2020-04-07 주식회사 포스코 연속 증착 장치 및 연속 증착 방법
WO2020114580A1 (en) * 2018-12-04 2020-06-11 Applied Materials, Inc. Evaporation apparatus for evaporating a material and method for evaporating a material with an evaporation apparatus
WO2020194631A1 (ja) * 2019-03-27 2020-10-01 シャープ株式会社 蒸着装置
DE102019110950A1 (de) 2019-04-29 2020-10-29 Kennametal Inc. Hartmetallzusammensetzungen und deren Anwendungen
WO2024000569A1 (en) * 2022-07-01 2024-01-04 China Triumph International Engineering Co., Ltd. Device for evaporating of a coating material and use of it

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78611C (de) * 1951-11-10
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
GB900205A (en) * 1957-07-15 1962-07-04 Richard John Fletcher Improvements in and relating to sources for the evaporation of metals and other materials under vacuum
GB1052595A (de) * 1964-06-30
US3563202A (en) * 1969-06-25 1971-02-16 Pennwalt Corp Mobile vbaporative firing source
US4395179A (en) * 1976-03-10 1983-07-26 Davy Inc. Apparatus and method for charging material into a receptacle
DE2916080C2 (de) * 1979-04-20 1984-12-06 Kišinevskij Gosudarstvennyj universitet imeni V.I. Lenina, Kišinev Verfahren zum Molekular-Aufdampfen von Halbleiterschichten und Vorrichtung zur Durchführung dieses Verfahrens

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021100060A1 (de) 2021-01-05 2022-07-07 Thyssenkrupp Steel Europe Ag Beschichtungsanordnung

Also Published As

Publication number Publication date
ES2034288T3 (es) 1993-04-01
ATE79417T1 (de) 1992-08-15
EP0283374B1 (de) 1992-08-12
US4880960A (en) 1989-11-14
EP0283374A1 (de) 1988-09-21
FR2611746B1 (fr) 1989-06-30
DE3873568D1 (de) 1992-09-17
FR2611746A1 (fr) 1988-09-09

Similar Documents

Publication Publication Date Title
DE3873568T2 (de) Anlage zur kontinuierlichen vakuumverdampfung eines metalls.
TWI264473B (en) Vacuum deposition device and vacuum deposition method
DE4439920A1 (de) Umweltschonende Verfahren und umweltschonende Vorrichtung zur Abscheidung und/oder Rückgewinnung von Metall oder Halbleitermetall unter Verwendung der Sublimation
KR100791142B1 (ko) 기판 코팅 장치
ES2050790T3 (es) Recipiente.
GB1095822A (en) Manufacture of thin film patterns
DE69030369T3 (de) Bandförmiges Verpackungsmaterial mit Barriereeigenschaften
SE302914B (de)
Remindiere et al. Apparatus for the Continuous Vacuum Evaporation of a Metal
GB1482316A (en) Application of metal oxide coatings to glass surfaces
Mattox Vacuum Deposition, Reactive Evaporation, and Gas Evaporation
JPH07172982A (ja) パルス状原料導入セル
CN214830625U (zh) 一种蒸镀真空腔室加热装置
JPH0874039A (ja) 真空蒸着用材料供給装置
KR960029482A (ko) 진공증착용 대용량 저항가열 증발원 및 이 증발원을 이용하여 제조되는 증착두께 분포가 균일한 아연 진공증착 강판의 제조방법
JPS57169082A (en) Continuous vacuum vapor-depositing method
JPS5620162A (en) Vapor depositing method
JPS5765324A (en) Method and apparatus for preparing ultrafine particle membrane
KR101348095B1 (ko) 유기물 피딩 장치 및 방법
JPS55145168A (en) Method and apparatus for controlling vacuum evaporation speed
JPH0550479B2 (de)
ES8206237A1 (es) Perfeccionamientos en los alimentadores de metal fundido
GB821062A (en) Dry lubricant
JPS5550463A (en) Electron beam vapor deposition apparatus
Crisler et al. Chemical vapor deposition of uranium and plutonium

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee