DE3855617T2 - Beschichtungsflüssigkeit zur bildung einer elektroleitfähigen schicht - Google Patents

Beschichtungsflüssigkeit zur bildung einer elektroleitfähigen schicht

Info

Publication number
DE3855617T2
DE3855617T2 DE3855617T DE3855617T DE3855617T2 DE 3855617 T2 DE3855617 T2 DE 3855617T2 DE 3855617 T DE3855617 T DE 3855617T DE 3855617 T DE3855617 T DE 3855617T DE 3855617 T2 DE3855617 T2 DE 3855617T2
Authority
DE
Germany
Prior art keywords
forming
conductive layer
electrically conductive
coating liquid
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3855617T
Other languages
English (en)
Other versions
DE3855617D1 (de
Inventor
Goro Sato
Michio Komatsu
Toshiharu Hirai
Yoneji Abe
Kei-Ichi Mihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
JGC Catalysts and Chemicals Ltd
Original Assignee
Catalysts and Chemicals Industries Co Ltd
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62027289A external-priority patent/JPS63195686A/ja
Priority claimed from JP62211096A external-priority patent/JPS6454613A/ja
Application filed by Catalysts and Chemicals Industries Co Ltd, Asahi Glass Co Ltd filed Critical Catalysts and Chemicals Industries Co Ltd
Application granted granted Critical
Publication of DE3855617D1 publication Critical patent/DE3855617D1/de
Publication of DE3855617T2 publication Critical patent/DE3855617T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
DE3855617T 1987-02-10 1988-02-09 Beschichtungsflüssigkeit zur bildung einer elektroleitfähigen schicht Expired - Fee Related DE3855617T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62027289A JPS63195686A (ja) 1987-02-10 1987-02-10 表示装置及びその製造法
JP62211096A JPS6454613A (en) 1987-08-25 1987-08-25 Application liquid for forming transparent superconductive film and manufacture thereof
PCT/JP1988/000122 WO1988006331A1 (en) 1987-02-10 1988-02-09 Coating fluid for forming electroconductive coat

Publications (2)

Publication Number Publication Date
DE3855617D1 DE3855617D1 (de) 1996-11-21
DE3855617T2 true DE3855617T2 (de) 1997-03-20

Family

ID=26365193

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3855617T Expired - Fee Related DE3855617T2 (de) 1987-02-10 1988-02-09 Beschichtungsflüssigkeit zur bildung einer elektroleitfähigen schicht

Country Status (6)

Country Link
US (2) US5078915A (de)
EP (1) EP0301104B1 (de)
KR (1) KR920006597B1 (de)
DE (1) DE3855617T2 (de)
SG (1) SG40822A1 (de)
WO (1) WO1988006331A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY111868A (en) * 1989-09-20 2001-02-28 Samsung Electron Devices Co Ltd Non-glare coating composition and method for manufacturing color cathode ray tube using same.
KR0150944B1 (ko) * 1990-03-13 1998-10-01 김정배 대전방지 및 방현성 화상표시 스크린
US6231971B1 (en) * 1995-06-09 2001-05-15 Glaverbel Glazing panel having solar screening properties
JP2002080828A (ja) * 2000-09-11 2002-03-22 Toshiba Corp 帯電防止用分散液と帯電防止膜および画像表示装置
JP3876811B2 (ja) * 2001-11-02 2007-02-07 住友金属鉱山株式会社 透明導電層形成用塗液の製造方法
JP2004055298A (ja) * 2002-07-18 2004-02-19 Catalysts & Chem Ind Co Ltd 透明導電性被膜形成用塗布液、および透明導電性被膜付基材、表示装置
US7041365B2 (en) * 2003-05-12 2006-05-09 3M Innovative Properties Company Static dissipative optical construction
US7703456B2 (en) * 2003-12-18 2010-04-27 Kimberly-Clark Worldwide, Inc. Facemasks containing an anti-fog / anti-glare composition
DE102004030104A1 (de) * 2004-06-22 2006-01-12 Degussa Ag Wässerig/organische Metalloxid-Dispersion und mit damit hergestellte beschichtete Substrate und Formkörper
JP5239448B2 (ja) * 2007-06-04 2013-07-17 東レ株式会社 帯電防止性白色ポリエステルフィルム
CN102476911A (zh) * 2010-11-24 2012-05-30 天津天翔玻璃制品有限公司 一种防眩电子触摸屏玻璃的制造方法
US9663400B2 (en) 2013-11-08 2017-05-30 Corning Incorporated Scratch-resistant liquid based coatings for glass

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53103096A (en) * 1977-02-15 1978-09-07 Matsushita Electric Works Ltd Surface treating composition of inorganic fiber
JPS549792A (en) * 1977-06-24 1979-01-24 Sumitomo Metal Mining Co Paste for forming transparent conductive film
JPS57100943A (en) * 1980-12-10 1982-06-23 Asahi Glass Co Ltd Substrate coated with silicon oxide having excellent durability
DE3145583A1 (de) * 1981-11-17 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Paste zum bedrucken von substaten mittels eines elastisch verformbaren stempels
JPS5992916A (ja) * 1982-11-19 1984-05-29 Mitsubishi Metal Corp 4a族金属の透明酸化物膜形成用組成物
DE3300589A1 (de) * 1983-01-11 1984-07-12 Schott Glaswerke, 6500 Mainz Verfahren zur herstellung von indiumoxid-zinnoxid-schichten
JPS59168951U (ja) * 1983-04-26 1984-11-12 日本電気硝子株式会社 陰極線管
DE3324647A1 (de) * 1983-07-08 1985-01-17 Schott Glaswerke, 6500 Mainz Tauchverfahren zur herstellung transparenter, elektrisch leitfaehiger, dotierter indiumoxidschichten
JPS60129778A (ja) * 1983-12-16 1985-07-11 三菱電機株式会社 ノングレアデイスプレイ装置
EP0397292B1 (de) * 1985-01-22 1993-04-21 Saint-Gobain Vitrage International Verfahren zur Herstellung einer dünnen Metalloxidbeschichtung auf einem Substrat, insbesondere Glas und deren Verwendung als Verglasung
US4960618A (en) * 1987-01-07 1990-10-02 Tokyo Ohka Kogyo Co., Ltd. Process for formation of metal oxide film
US5013607A (en) * 1987-09-30 1991-05-07 Catalysts & Chemicals Industries Co., Ltd. Transparent conductive ceramic-coated substrate processes for preparing same and uses thereof

Also Published As

Publication number Publication date
SG40822A1 (en) 2001-01-16
US5273828A (en) 1993-12-28
WO1988006331A1 (en) 1988-08-25
EP0301104A4 (de) 1989-06-13
EP0301104A1 (de) 1989-02-01
KR920006597B1 (ko) 1992-08-10
EP0301104B1 (de) 1996-10-16
KR890700908A (ko) 1989-04-28
DE3855617D1 (de) 1996-11-21
US5078915A (en) 1992-01-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee