DE3851815D1 - Feldeffekttransistor und dessen Herstellungsmethode. - Google Patents
Feldeffekttransistor und dessen Herstellungsmethode.Info
- Publication number
- DE3851815D1 DE3851815D1 DE3851815T DE3851815T DE3851815D1 DE 3851815 D1 DE3851815 D1 DE 3851815D1 DE 3851815 T DE3851815 T DE 3851815T DE 3851815 T DE3851815 T DE 3851815T DE 3851815 D1 DE3851815 D1 DE 3851815D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- field effect
- effect transistor
- transistor
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005669 field effect Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0873—Drain regions
- H01L29/0878—Impurity concentration or distribution
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62241841A JPH0734471B2 (ja) | 1987-09-24 | 1987-09-24 | 電界効果型半導体装置 |
JP62241839A JPH0734470B2 (ja) | 1987-09-24 | 1987-09-24 | 電界効果型半導体装置 |
JP62241840A JPS6482566A (en) | 1987-09-24 | 1987-09-24 | Field-effect semiconductor device |
JP62241838A JPS6482564A (en) | 1987-09-24 | 1987-09-24 | Field-effect semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3851815D1 true DE3851815D1 (de) | 1994-11-17 |
DE3851815T2 DE3851815T2 (de) | 1995-05-24 |
Family
ID=27477858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3851815T Expired - Fee Related DE3851815T2 (de) | 1987-09-24 | 1988-07-20 | Feldeffekttransistor und dessen Herstellungsmethode. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0308612B1 (de) |
DE (1) | DE3851815T2 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2573736B2 (ja) * | 1990-09-18 | 1997-01-22 | 三菱電機株式会社 | 高耐圧低抵抗半導体装置及びその製造方法 |
JP2799252B2 (ja) * | 1991-04-23 | 1998-09-17 | 三菱電機株式会社 | Mos型半導体装置およびその製造方法 |
US5674766A (en) * | 1994-12-30 | 1997-10-07 | Siliconix Incorporated | Method of making a trench MOSFET with multi-resistivity drain to provide low on-resistance by varying dopant concentration in epitaxial layer |
JP2001352070A (ja) | 2000-04-07 | 2001-12-21 | Denso Corp | 半導体装置およびその製造方法 |
EP1267415A3 (de) * | 2001-06-11 | 2009-04-15 | Kabushiki Kaisha Toshiba | Leistungshalbleiterbauelement mit RESURF-Schicht |
US7786533B2 (en) | 2001-09-07 | 2010-08-31 | Power Integrations, Inc. | High-voltage vertical transistor with edge termination structure |
US6635544B2 (en) | 2001-09-07 | 2003-10-21 | Power Intergrations, Inc. | Method of fabricating a high-voltage transistor with a multi-layered extended drain structure |
ITTO20060785A1 (it) * | 2006-11-02 | 2008-05-03 | St Microelectronics Srl | Dispositivo mos resistente alla radiazione ionizzante |
CN112599600A (zh) * | 2020-12-03 | 2021-04-02 | 杰华特微电子(杭州)有限公司 | 垂直双扩散晶体管及其制造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5658267A (en) * | 1979-10-17 | 1981-05-21 | Nippon Telegr & Teleph Corp <Ntt> | Insulated gate type field-effect transistor |
WO1982002981A1 (en) * | 1981-02-23 | 1982-09-02 | Inc Motorola | Mos power transistor |
JPS57153469A (en) * | 1981-03-18 | 1982-09-22 | Toshiba Corp | Insulated gate type field effect transistor |
JPS5984474A (ja) * | 1982-11-05 | 1984-05-16 | Nec Corp | 電力用縦型電界効果トランジスタ |
JPS59167066A (ja) * | 1983-03-14 | 1984-09-20 | Nissan Motor Co Ltd | 縦形mosfet |
-
1988
- 1988-07-20 EP EP88111722A patent/EP0308612B1/de not_active Expired - Lifetime
- 1988-07-20 DE DE3851815T patent/DE3851815T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3851815T2 (de) | 1995-05-24 |
EP0308612A2 (de) | 1989-03-29 |
EP0308612A3 (en) | 1990-07-18 |
EP0308612B1 (de) | 1994-10-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |