DE3851471T2 - Gerät mit differentiell gepumpter Abdichtung. - Google Patents

Gerät mit differentiell gepumpter Abdichtung.

Info

Publication number
DE3851471T2
DE3851471T2 DE3851471T DE3851471T DE3851471T2 DE 3851471 T2 DE3851471 T2 DE 3851471T2 DE 3851471 T DE3851471 T DE 3851471T DE 3851471 T DE3851471 T DE 3851471T DE 3851471 T2 DE3851471 T2 DE 3851471T2
Authority
DE
Germany
Prior art keywords
differential pumped
pumped seal
seal
differential
pumped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3851471T
Other languages
English (en)
Other versions
DE3851471D1 (de
Inventor
Lydia J Young
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of DE3851471D1 publication Critical patent/DE3851471D1/de
Application granted granted Critical
Publication of DE3851471T2 publication Critical patent/DE3851471T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
DE3851471T 1987-06-15 1988-06-13 Gerät mit differentiell gepumpter Abdichtung. Expired - Fee Related DE3851471T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/062,038 US4792688A (en) 1987-06-15 1987-06-15 Differentially pumped seal apparatus

Publications (2)

Publication Number Publication Date
DE3851471D1 DE3851471D1 (de) 1994-10-20
DE3851471T2 true DE3851471T2 (de) 1995-02-09

Family

ID=22039825

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3851471T Expired - Fee Related DE3851471T2 (de) 1987-06-15 1988-06-13 Gerät mit differentiell gepumpter Abdichtung.

Country Status (5)

Country Link
US (1) US4792688A (de)
EP (1) EP0295616B1 (de)
JP (1) JP2815365B2 (de)
CA (1) CA1279130C (de)
DE (1) DE3851471T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5181088A (en) * 1988-09-14 1993-01-19 Kabushiki Kaisha Toshiba Vertical field effect transistor with an extended polysilicon channel region
GB9720350D0 (en) * 1997-09-24 1997-11-26 Welding Inst Improvements relating to charged particle beams
US5951886A (en) * 1997-12-23 1999-09-14 Ptr Precision Technologies Apparatus for electron beam welding at atmospheric pressure
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
EP1491954A1 (de) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Dichtungsanordnung, lithographischer Projektionsapparat, und Verfahren zur Herstellung einer Vorrichtung
US7425118B2 (en) * 2005-10-27 2008-09-16 Honeywell International Inc. Mask for shielding impellers and blisks during automated welding
WO2008032725A1 (fr) * 2006-09-13 2008-03-20 Hiraide Precision Co., Ltd. Appareil d'usinage par faisceau et appareil d'observation par faisceau
DE102007010068A1 (de) 2007-02-28 2008-09-04 Thermo Fisher Scientific (Bremen) Gmbh Vakuumpumpe oder Vakuumapparatur mit Vakuumpumpe
JP7469803B2 (ja) * 2020-10-20 2024-04-17 株式会社ブイ・テクノロジー 集束エネルギービーム装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus

Also Published As

Publication number Publication date
JPS6419662A (en) 1989-01-23
US4792688A (en) 1988-12-20
DE3851471D1 (de) 1994-10-20
EP0295616A3 (en) 1990-03-07
CA1279130C (en) 1991-01-15
JP2815365B2 (ja) 1998-10-27
EP0295616B1 (de) 1994-09-14
EP0295616A2 (de) 1988-12-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8327 Change in the person/name/address of the patent owner

Owner name: APPLIED MATERIALS, INC. (N.D.GES.D. STAATES DELAWA