DE3790317T - - Google Patents

Info

Publication number
DE3790317T
DE3790317T DE19873790317 DE3790317T DE3790317T DE 3790317 T DE3790317 T DE 3790317T DE 19873790317 DE19873790317 DE 19873790317 DE 3790317 T DE3790317 T DE 3790317T DE 3790317 T DE3790317 T DE 3790317T
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19873790317
Other languages
German (de)
Other versions
DE3790317C2 (US20030157025A1-20030821-C00031.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61142197A external-priority patent/JPH0765165B2/ja
Priority claimed from JP23273186A external-priority patent/JPS6386866A/ja
Priority claimed from JP2519787A external-priority patent/JPH0788572B2/ja
Priority claimed from JP2519687A external-priority patent/JPH0788571B2/ja
Application filed filed Critical
Publication of DE3790317T publication Critical patent/DE3790317T/de
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE19873790317 1986-06-18 1987-06-18 Pending DE3790317T (US20030157025A1-20030821-C00031.png)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP61142197A JPH0765165B2 (ja) 1986-06-18 1986-06-18 薄膜蒸着装置
JP23273186A JPS6386866A (ja) 1986-09-29 1986-09-29 薄膜形成装置
JP2519787A JPH0788572B2 (ja) 1987-02-05 1987-02-05 薄膜形成装置
JP2519687A JPH0788571B2 (ja) 1987-02-05 1987-02-05 薄膜形成装置

Publications (1)

Publication Number Publication Date
DE3790317T true DE3790317T (US20030157025A1-20030821-C00031.png) 1988-06-23

Family

ID=27458265

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19873790317 Pending DE3790317T (US20030157025A1-20030821-C00031.png) 1986-06-18 1987-06-18
DE3790317A Expired - Fee Related DE3790317C2 (US20030157025A1-20030821-C00031.png) 1986-06-18 1987-06-18

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE3790317A Expired - Fee Related DE3790317C2 (US20030157025A1-20030821-C00031.png) 1986-06-18 1987-06-18

Country Status (4)

Country Link
US (1) US4854265A (US20030157025A1-20030821-C00031.png)
DE (2) DE3790317T (US20030157025A1-20030821-C00031.png)
GB (1) GB2204596B (US20030157025A1-20030821-C00031.png)
WO (1) WO1987007916A1 (US20030157025A1-20030821-C00031.png)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film
US4960072A (en) * 1987-08-05 1990-10-02 Ricoh Company, Ltd. Apparatus for forming a thin film
JPH0250954A (ja) * 1988-08-15 1990-02-20 Ricoh Co Ltd 薄膜形成装置
DE3832693A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
US5114559A (en) * 1989-09-26 1992-05-19 Ricoh Company, Ltd. Thin film deposition system
JP2834797B2 (ja) * 1989-10-25 1998-12-14 株式会社リコー 薄膜形成装置
GB2261226B (en) * 1991-11-08 1994-10-26 Univ Hull Deposition of non-conductive material
US5415753A (en) * 1993-07-22 1995-05-16 Materials Research Corporation Stationary aperture plate for reactive sputter deposition
GB2346155B (en) 1999-01-06 2003-06-25 Trikon Holdings Ltd Sputtering apparatus
US7229675B1 (en) 2000-02-17 2007-06-12 Anatoly Nikolaevich Paderov Protective coating method for pieces made of heat resistant alloys
WO2001061067A1 (fr) * 2000-02-17 2001-08-23 Anatoly Nikolaevich Paderov Revetement de protection composite fait d'alliages refractaires
US6632325B2 (en) * 2002-02-07 2003-10-14 Applied Materials, Inc. Article for use in a semiconductor processing chamber and method of fabricating same
JP3908600B2 (ja) * 2002-05-30 2007-04-25 株式会社リコー 調光窓
FR3140097A1 (fr) * 2022-09-27 2024-03-29 Neyco Dépôt de couches de matière par évaporation et double activation

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3583361A (en) * 1969-12-18 1971-06-08 Atomic Energy Commission Ion beam deposition system
JPS5181791A (ja) * 1975-01-13 1976-07-17 Osaka Koon Denki Kk Ionkapureeteinguhoho
JPS5278777A (en) * 1975-12-26 1977-07-02 Hitachi Ltd Ion plating apparatus
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置
JPS58221271A (ja) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd イオンプレ−テイング法による被膜形成方法
US4440108A (en) * 1982-09-24 1984-04-03 Spire Corporation Ion beam coating apparatus
JPS5989763A (ja) * 1983-09-28 1984-05-24 Ricoh Co Ltd 薄膜蒸着装置
JPS59157279A (ja) * 1983-12-22 1984-09-06 Ricoh Co Ltd 薄膜蒸着装置
FR2596775B1 (fr) * 1986-04-07 1992-11-13 Univ Limoges Revetement dur multicouches elabore par depot ionique de nitrure de titane, carbonitrure de titane et i-carbone
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film

Also Published As

Publication number Publication date
DE3790317C2 (US20030157025A1-20030821-C00031.png) 1990-06-07
GB8803148D0 (en) 1988-03-09
US4854265A (en) 1989-08-08
GB2204596A (en) 1988-11-16
GB2204596B (en) 1991-04-03
WO1987007916A1 (en) 1987-12-30

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