DE3788554D1 - Antistatischer Photolack. - Google Patents
Antistatischer Photolack.Info
- Publication number
- DE3788554D1 DE3788554D1 DE87308997T DE3788554T DE3788554D1 DE 3788554 D1 DE3788554 D1 DE 3788554D1 DE 87308997 T DE87308997 T DE 87308997T DE 3788554 T DE3788554 T DE 3788554T DE 3788554 D1 DE3788554 D1 DE 3788554D1
- Authority
- DE
- Germany
- Prior art keywords
- antistatic
- photoresist
- antistatic photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61242793A JPH083628B2 (ja) | 1986-10-13 | 1986-10-13 | 非帯電性レジスト |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3788554D1 true DE3788554D1 (de) | 1994-02-03 |
DE3788554T2 DE3788554T2 (de) | 1994-04-21 |
Family
ID=17094373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE87308997T Expired - Fee Related DE3788554T2 (de) | 1986-10-13 | 1987-10-12 | Antistatischer Photolack. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4933257A (de) |
EP (1) | EP0265135B1 (de) |
JP (1) | JPH083628B2 (de) |
DE (1) | DE3788554T2 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02278723A (ja) * | 1989-04-19 | 1990-11-15 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA933791A (en) * | 1969-06-13 | 1973-09-18 | Broyde Barret | Additives to positive photoresists which increase the sensitivity thereof |
US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
DE2626419C2 (de) * | 1976-06-12 | 1982-10-21 | Ibm Deutschland Gmbh, 7000 Stuttgart | Lichtempfindliches Gemisch |
US4338392A (en) * | 1979-08-09 | 1982-07-06 | International Business Machines Corporation | Class of E-beam resists based on conducting organic charge transfer salts |
NL183425C (nl) * | 1980-01-17 | 1988-10-17 | Inst Chimii Akademii Nauk Sssr | Positieve foto- en elektronenresist en werkwijze voor het vervaardigen van een beeld op een drager. |
JPS57211145A (en) * | 1981-06-23 | 1982-12-24 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
JPS5882519A (ja) * | 1981-11-12 | 1983-05-18 | Toshiba Corp | 半導体のイオン注入方法 |
GB2122765B (en) * | 1981-12-21 | 1986-03-26 | Inst Chimii Akademii Nauk Sssr | Photo-and electron resist |
JPS5951564A (ja) * | 1982-09-17 | 1984-03-26 | Seiko Epson Corp | 半導体製造方法 |
JPS5952814A (ja) * | 1982-09-20 | 1984-03-27 | Toshiba Corp | 水冷式冷却器 |
JPS5993441A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | レジスト |
JPS59107347A (ja) * | 1982-12-13 | 1984-06-21 | Fujitsu Ltd | パタ−ン形成材料 |
JPS6088941A (ja) * | 1983-10-21 | 1985-05-18 | Nagase Kasei Kogyo Kk | フオトレジスト組成物 |
JPS61125019A (ja) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体 |
US4613553A (en) * | 1985-05-31 | 1986-09-23 | Brown University Research Foundation | Processing of metallic charge-transfer salts |
JPS62113136A (ja) * | 1985-11-13 | 1987-05-25 | Fujitsu Ltd | レジスト組成物 |
JPS62113139A (ja) * | 1985-11-13 | 1987-05-25 | Fujitsu Ltd | ネガ型レジスト組成物 |
US4780371A (en) * | 1986-02-24 | 1988-10-25 | International Business Machines Corporation | Electrically conductive composition and use thereof |
EP0259855A3 (de) * | 1986-09-10 | 1990-04-18 | Fuji Photo Film Co., Ltd. | Verfahren zur Entwicklung photographischer Silberhalogenidmaterialien |
-
1986
- 1986-10-13 JP JP61242793A patent/JPH083628B2/ja not_active Expired - Fee Related
-
1987
- 1987-10-12 DE DE87308997T patent/DE3788554T2/de not_active Expired - Fee Related
- 1987-10-12 EP EP87308997A patent/EP0265135B1/de not_active Expired - Lifetime
-
1989
- 1989-09-18 US US07/408,956 patent/US4933257A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3788554T2 (de) | 1994-04-21 |
US4933257A (en) | 1990-06-12 |
EP0265135A3 (en) | 1989-07-12 |
EP0265135B1 (de) | 1993-12-22 |
EP0265135A2 (de) | 1988-04-27 |
JPS63100442A (ja) | 1988-05-02 |
JPH083628B2 (ja) | 1996-01-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |