DE3787580D1 - Lichtempfindliches material mit silberhalogenid, reduktionsmittel und photopolymerisierbare verbindungen. - Google Patents

Lichtempfindliches material mit silberhalogenid, reduktionsmittel und photopolymerisierbare verbindungen.

Info

Publication number
DE3787580D1
DE3787580D1 DE87109852T DE3787580T DE3787580D1 DE 3787580 D1 DE3787580 D1 DE 3787580D1 DE 87109852 T DE87109852 T DE 87109852T DE 3787580 T DE3787580 T DE 3787580T DE 3787580 D1 DE3787580 D1 DE 3787580D1
Authority
DE
Germany
Prior art keywords
reducing agent
sensitive material
light sensitive
photopolymerizable compounds
silver halogenide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87109852T
Other languages
English (en)
Other versions
DE3787580T2 (de
Inventor
Soichiro Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3787580D1 publication Critical patent/DE3787580D1/de
Application granted granted Critical
Publication of DE3787580T2 publication Critical patent/DE3787580T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285—Silver salts, e.g. a latent silver salt image

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE87109852T 1986-07-08 1987-07-08 Lichtempfindliches Material mit Silberhalogenid, Reduktionsmittel und photopolymerisierbare Verbindungen. Expired - Fee Related DE3787580T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61160592A JPH0627947B2 (ja) 1986-07-08 1986-07-08 熱現像用感光材料

Publications (2)

Publication Number Publication Date
DE3787580D1 true DE3787580D1 (de) 1993-11-04
DE3787580T2 DE3787580T2 (de) 1994-03-17

Family

ID=15718283

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87109852T Expired - Fee Related DE3787580T2 (de) 1986-07-08 1987-07-08 Lichtempfindliches Material mit Silberhalogenid, Reduktionsmittel und photopolymerisierbare Verbindungen.

Country Status (4)

Country Link
US (1) US4767690A (de)
EP (1) EP0252498B1 (de)
JP (1) JPH0627947B2 (de)
DE (1) DE3787580T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0721631B2 (ja) * 1987-03-06 1995-03-08 富士写真フイルム株式会社 感光材料
JPH0734111B2 (ja) * 1988-08-31 1995-04-12 富士写真フイルム株式会社 感光材料

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933783B1 (de) * 1968-10-04 1974-09-10
JPS60249146A (ja) * 1984-05-25 1985-12-09 Fuji Photo Film Co Ltd 画像記録方法
EP0174634B1 (de) * 1984-09-12 1987-12-09 Fuji Photo Film Co., Ltd. Bilderzeugungsverfahren
JPS6175342A (ja) * 1984-09-21 1986-04-17 Fuji Photo Film Co Ltd 画像記録方法
EP0203613B1 (de) * 1985-05-30 1989-10-25 Fuji Photo Film Co., Ltd. Mikrokapseln enthaltendes lichtempfindliches Material und dieses benutzendes Bildaufzeichnungsverfahren
JPS61275742A (ja) * 1985-05-30 1986-12-05 Fuji Photo Film Co Ltd 感光材料
JPS61278849A (ja) * 1985-06-04 1986-12-09 Fuji Photo Film Co Ltd 画像記録方法
JPS6278552A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光材料
JPS6281635A (ja) * 1985-10-07 1987-04-15 Fuji Photo Film Co Ltd 感光材料

Also Published As

Publication number Publication date
US4767690A (en) 1988-08-30
EP0252498A3 (en) 1989-08-02
JPH0627947B2 (ja) 1994-04-13
JPS6315239A (ja) 1988-01-22
EP0252498A2 (de) 1988-01-13
EP0252498B1 (de) 1993-09-29
DE3787580T2 (de) 1994-03-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee