DE3786563T2 - Photopolymerisierbare schichten mit silika-weichmacher-kombination. - Google Patents

Photopolymerisierbare schichten mit silika-weichmacher-kombination.

Info

Publication number
DE3786563T2
DE3786563T2 DE87102148T DE3786563T DE3786563T2 DE 3786563 T2 DE3786563 T2 DE 3786563T2 DE 87102148 T DE87102148 T DE 87102148T DE 3786563 T DE3786563 T DE 3786563T DE 3786563 T2 DE3786563 T2 DE 3786563T2
Authority
DE
Germany
Prior art keywords
silica
photopolymerizable layers
softener combination
softener
combination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE87102148T
Other languages
English (en)
Other versions
DE3786563D1 (de
Inventor
Charles Calhoun Dr Fifield
Richard Thomas Dr Mayes
Marilyn Tate
Daniel Felix Dr Varnell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Application granted granted Critical
Publication of DE3786563D1 publication Critical patent/DE3786563D1/de
Publication of DE3786563T2 publication Critical patent/DE3786563T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE87102148T 1986-02-14 1987-02-16 Photopolymerisierbare schichten mit silika-weichmacher-kombination. Expired - Lifetime DE3786563T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/830,024 US4686171A (en) 1986-02-14 1986-02-14 Photopolymerizable films containing plasticizer silica combinations

Publications (2)

Publication Number Publication Date
DE3786563D1 DE3786563D1 (de) 1993-08-26
DE3786563T2 true DE3786563T2 (de) 1993-11-04

Family

ID=25256133

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87102148T Expired - Lifetime DE3786563T2 (de) 1986-02-14 1987-02-16 Photopolymerisierbare schichten mit silika-weichmacher-kombination.

Country Status (6)

Country Link
US (1) US4686171A (de)
EP (1) EP0233623B1 (de)
JP (1) JPS62253139A (de)
DE (1) DE3786563T2 (de)
FR (1) FR2596535B1 (de)
GB (1) GB2186584B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR8900132A (pt) * 1988-01-15 1989-09-12 Du Pont Processo para a formacao de um halograma de reflexao;processo para a formacao e a intensificacao de um halograma de reflexao em um meio de registro fotopolimerizavel substancialmente solido;e projecao de um feixe do objeto com a mesma radiacao actinica coerente aproximadamente na direcao oposta a do feixe de referencia
JPH01263645A (ja) * 1988-04-15 1989-10-20 Tokyo Ohka Kogyo Co Ltd 光重合性組成物
CA2025198A1 (en) * 1989-10-25 1991-04-26 Daniel F. Varnell Liquid solder mask composition
US5217847A (en) * 1989-10-25 1993-06-08 Hercules Incorporated Liquid solder mask composition
US5183763A (en) * 1990-06-06 1993-02-02 Southwest Research Institute Composition and method for detecting vapor and liquid reactants
DE69124169T2 (de) * 1990-09-04 1997-05-22 Dow Corning Verfahren zur Maskierung von elektronischen Anordnungen während der Verarbeitung und durch Ultraviolettstrahlung härtbare Maskierungszusammensetzung dazu
DE4107390A1 (de) * 1991-03-08 1992-09-10 Hoechst Ag Gefaerbtes, positiv arbeitendes, lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung sowohl positiver als auch negativer farbpruefbilder unter verwendung dieses materials
CA2076727A1 (en) * 1991-08-30 1993-03-01 Richard T. Mayes Alkaline-etch resistant dry film photoresist
DE69221072T2 (de) * 1991-11-01 1997-11-13 Macdermid Imaging Technology Erhöhung der Haftung von photopolymerisierbaren Trockenfilmzusammensetzungen auf Trägern
DE69227982T2 (de) * 1991-11-01 1999-05-12 Macdermid Imaging Technology Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
AU6097796A (en) * 1995-07-03 1997-02-05 Ppg Industries, Inc. Electrodepositable photoimageable compositions with improved edge coverage
JP6343439B2 (ja) * 2013-09-30 2018-06-13 太陽インキ製造株式会社 プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE625542A (de) * 1961-12-01
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
US3615448A (en) * 1969-01-14 1971-10-26 Grace W R & Co Lithographic printing plate and method of preparation
JPS5034966B2 (de) * 1972-07-24 1975-11-12
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5337972A (en) * 1976-09-21 1978-04-07 Toyoda Mach Works Ltd Tool shifting apparatus for use in automatic tool changer
US4264708A (en) * 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer
DE3067937D1 (en) * 1979-07-16 1984-06-28 Minnesota Mining & Mfg Plating resist with improved resistance to extraneous plating
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
JPS5695902A (en) * 1979-12-29 1981-08-03 Toyobo Co Ltd Uv-curable resin composition
US4511646A (en) * 1983-03-03 1985-04-16 Minnesota Mining And Manufacturing Company Ethylenically-unsaturated dextrin composition for preparing a durable hydrophilic photopolymer
DE3327523A1 (de) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial
DE3514768C1 (de) * 1985-04-24 1986-07-24 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial

Also Published As

Publication number Publication date
GB2186584B (en) 1990-03-21
US4686171A (en) 1987-08-11
DE3786563D1 (de) 1993-08-26
FR2596535A1 (fr) 1987-10-02
FR2596535B1 (fr) 1994-07-08
EP0233623B1 (de) 1993-07-21
EP0233623A3 (en) 1988-10-05
GB8703381D0 (en) 1987-03-18
JPS62253139A (ja) 1987-11-04
GB2186584A (en) 1987-08-19
EP0233623A2 (de) 1987-08-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MACDERMID IMAGING TECHNOLOGY INC., WATERBURY, CONN

8328 Change in the person/name/address of the agent

Free format text: KUHNEN, WACKER & PARTNER, PATENT- UND RECHTSANWAELTE, 85354 FREISING