DE3751658T2 - Siebdruckpaste zur Anwendung als Barriereschicht auf einem Substrat während der maskenlosen Bekleidung - Google Patents
Siebdruckpaste zur Anwendung als Barriereschicht auf einem Substrat während der maskenlosen BekleidungInfo
- Publication number
- DE3751658T2 DE3751658T2 DE3751658T DE3751658T DE3751658T2 DE 3751658 T2 DE3751658 T2 DE 3751658T2 DE 3751658 T DE3751658 T DE 3751658T DE 3751658 T DE3751658 T DE 3751658T DE 3751658 T2 DE3751658 T2 DE 3751658T2
- Authority
- DE
- Germany
- Prior art keywords
- paste
- substrate
- weight percent
- conductive material
- metal surfaces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- H10W70/098—
-
- H10W70/666—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/855,263 US4663186A (en) | 1986-04-24 | 1986-04-24 | Screenable paste for use as a barrier layer on a substrate during maskless cladding |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3751658D1 DE3751658D1 (de) | 1996-02-15 |
| DE3751658T2 true DE3751658T2 (de) | 1996-07-04 |
Family
ID=25320789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3751658T Expired - Lifetime DE3751658T2 (de) | 1986-04-24 | 1987-03-10 | Siebdruckpaste zur Anwendung als Barriereschicht auf einem Substrat während der maskenlosen Bekleidung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4663186A (Direct) |
| EP (1) | EP0242558B1 (Direct) |
| JP (1) | JPS62256493A (Direct) |
| CA (1) | CA1279753C (Direct) |
| DE (1) | DE3751658T2 (Direct) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL80039A0 (en) * | 1986-09-16 | 1986-12-31 | Saul Sterman | Method and system for tinting contact lenses |
| US5275689A (en) * | 1991-11-14 | 1994-01-04 | E. I. Du Pont De Nemours And Company | Method and compositions for diffusion patterning |
| US5654354A (en) * | 1991-11-14 | 1997-08-05 | E. I. Du Pont De Nemours And Company | Compositions for diffusion patterning |
| JPH08148787A (ja) * | 1994-11-21 | 1996-06-07 | Sumitomo Kinzoku Ceramics:Kk | 厚膜ペースト |
| JP4780844B2 (ja) * | 2001-03-05 | 2011-09-28 | Okiセミコンダクタ株式会社 | 半導体装置 |
| US6650016B1 (en) * | 2002-10-01 | 2003-11-18 | International Business Machines Corporation | Selective C4 connection in IC packaging |
| JP4561307B2 (ja) * | 2004-10-20 | 2010-10-13 | ソニー株式会社 | 配線基板の製造方法および半導体装置の製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3726002A (en) * | 1971-08-27 | 1973-04-10 | Ibm | Process for forming a multi-layer glass-metal module adaptable for integral mounting to a dissimilar refractory substrate |
| JPS5938268B2 (ja) * | 1974-03-22 | 1984-09-14 | カンザキセイシ カブシキガイシヤ | 新規フタリド化合物の製造法 |
| US3957552A (en) * | 1975-03-05 | 1976-05-18 | International Business Machines Corporation | Method for making multilayer devices using only a single critical masking step |
| FR2451899A1 (fr) * | 1979-03-23 | 1980-10-17 | Labo Electronique Physique | Composition dielectrique, encre serigraphiable comportant une telle composition, et produits obtenus |
| US4221047A (en) * | 1979-03-23 | 1980-09-09 | International Business Machines Corporation | Multilayered glass-ceramic substrate for mounting of semiconductor device |
| US4493856A (en) * | 1982-03-18 | 1985-01-15 | International Business Machines Corporation | Selective coating of metallurgical features of a dielectric substrate with diverse metals |
| US4442137A (en) * | 1982-03-18 | 1984-04-10 | International Business Machines Corporation | Maskless coating of metallurgical features of a dielectric substrate |
| US4526859A (en) * | 1983-12-12 | 1985-07-02 | International Business Machines Corporation | Metallization of a ceramic substrate |
| US4582722A (en) * | 1984-10-30 | 1986-04-15 | International Business Machines Corporation | Diffusion isolation layer for maskless cladding process |
-
1986
- 1986-04-24 US US06/855,263 patent/US4663186A/en not_active Expired - Fee Related
-
1987
- 1987-03-05 JP JP62049018A patent/JPS62256493A/ja active Granted
- 1987-03-10 EP EP87103373A patent/EP0242558B1/en not_active Expired - Lifetime
- 1987-03-10 DE DE3751658T patent/DE3751658T2/de not_active Expired - Lifetime
- 1987-03-19 CA CA000532445A patent/CA1279753C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62256493A (ja) | 1987-11-09 |
| EP0242558A3 (en) | 1989-03-29 |
| JPH035076B2 (Direct) | 1991-01-24 |
| DE3751658D1 (de) | 1996-02-15 |
| EP0242558B1 (en) | 1996-01-03 |
| EP0242558A2 (en) | 1987-10-28 |
| US4663186A (en) | 1987-05-05 |
| CA1279753C (en) | 1991-02-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8330 | Complete renunciation |