DE3751328D1 - Rastergeräte mit geladenen Teilchenstrahlen. - Google Patents

Rastergeräte mit geladenen Teilchenstrahlen.

Info

Publication number
DE3751328D1
DE3751328D1 DE3751328T DE3751328T DE3751328D1 DE 3751328 D1 DE3751328 D1 DE 3751328D1 DE 3751328 T DE3751328 T DE 3751328T DE 3751328 T DE3751328 T DE 3751328T DE 3751328 D1 DE3751328 D1 DE 3751328D1
Authority
DE
Germany
Prior art keywords
charged particle
particle beams
raster devices
raster
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3751328T
Other languages
English (en)
Other versions
DE3751328T2 (de
Inventor
Bernard Cyril Breton
John Thiam Leong Thong
William Charles Nixon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
THONG
Original Assignee
THONG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by THONG filed Critical THONG
Publication of DE3751328D1 publication Critical patent/DE3751328D1/de
Application granted granted Critical
Publication of DE3751328T2 publication Critical patent/DE3751328T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1504—Associated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
DE3751328T 1986-09-24 1987-09-16 Rastergeräte mit geladenen Teilchenstrahlen. Expired - Fee Related DE3751328T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868622976A GB8622976D0 (en) 1986-09-24 1986-09-24 Scanning electron microscopes

Publications (2)

Publication Number Publication Date
DE3751328D1 true DE3751328D1 (de) 1995-07-06
DE3751328T2 DE3751328T2 (de) 1995-10-26

Family

ID=10604714

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3751328T Expired - Fee Related DE3751328T2 (de) 1986-09-24 1987-09-16 Rastergeräte mit geladenen Teilchenstrahlen.
DE3752154T Expired - Fee Related DE3752154T2 (de) 1986-09-24 1987-09-16 Rastergeräte mit geladenen Teilchenstrahlen

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE3752154T Expired - Fee Related DE3752154T2 (de) 1986-09-24 1987-09-16 Rastergeräte mit geladenen Teilchenstrahlen

Country Status (5)

Country Link
US (1) US4943722A (de)
EP (2) EP0564008B1 (de)
JP (1) JPS63164153A (de)
DE (2) DE3751328T2 (de)
GB (2) GB8622976D0 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212383A (en) * 1991-07-29 1993-05-18 David Scharf Color synthesizing scanning electron microscope
EP0720216B1 (de) * 1994-12-29 2001-10-17 AT&T Corp. Linienbreitenmessung an integrierten Schaltungsstrukturen
JPH1097836A (ja) * 1996-09-24 1998-04-14 Hitachi Keisokki Service Kk 走査形電子顕微鏡
US6055054A (en) * 1997-05-05 2000-04-25 Beaty; Elwin M. Three dimensional inspection system
US5909285A (en) * 1997-05-05 1999-06-01 Beaty; Elwin M. Three dimensional inspection system
US6915007B2 (en) 1998-01-16 2005-07-05 Elwin M. Beaty Method and apparatus for three dimensional inspection of electronic components
US6072898A (en) * 1998-01-16 2000-06-06 Beaty; Elwin M. Method and apparatus for three dimensional inspection of electronic components
US6915006B2 (en) * 1998-01-16 2005-07-05 Elwin M. Beaty Method and apparatus for three dimensional inspection of electronic components
DE19814205C1 (de) * 1998-03-31 1999-09-16 Kuehnert & Traenkner Messystem Verfahren und Anordnung zur räumlichen Visualisierung oberflächendeterminierter Eigenschaften von Mikroobjekten
US6787772B2 (en) * 2000-01-25 2004-09-07 Hitachi, Ltd. Scanning electron microscope
US6852974B2 (en) * 2001-03-06 2005-02-08 Topcon Corporation Electron beam device and method for stereoscopic measurements
JP3984019B2 (ja) * 2001-10-15 2007-09-26 パイオニア株式会社 電子ビーム装置及び電子ビーム調整方法
US6770879B1 (en) * 2003-03-12 2004-08-03 Kla-Tencor Technologies Corporation Motion picture output from electron microscope
US7067807B2 (en) * 2004-09-08 2006-06-27 Applied Materials, Israel, Ltd. Charged particle beam column and method of its operation
JP4567487B2 (ja) * 2005-02-25 2010-10-20 エスアイアイ・ナノテクノロジー株式会社 試料観察方法、試料加工方法および荷電粒子ビーム装置
JP2007218711A (ja) * 2006-02-16 2007-08-30 Hitachi High-Technologies Corp 電子顕微鏡装置を用いた計測対象パターンの計測方法
JP4857101B2 (ja) * 2006-12-21 2012-01-18 株式会社日立ハイテクノロジーズ プローブ評価方法
US11953316B2 (en) * 2020-09-17 2024-04-09 Applied Materials Israel Ltd. Geometry based three dimensional reconstruction of a semiconductor specimen by solving an optimization problem, using at least two SEM images acquired at different illumination angles

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4912269B1 (de) * 1969-04-09 1974-03-23
GB1443562A (en) * 1973-08-14 1976-07-21 Ontario Research Foundation Method and apparatus for displaying images stereoscopically and for deriving signals from a scanning electron microscope for producing steroscopic images
JPS51134558A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Measuring unit
JPS5289459A (en) * 1976-01-21 1977-07-27 Jeol Ltd Stereo scan electron microscope
JPS5750756A (en) * 1980-09-12 1982-03-25 Jeol Ltd Objective lens current control method for scan type electron microscope
JPS59171445A (ja) * 1983-03-18 1984-09-27 Hitachi Ltd 立体走査型電子顕微鏡
NL8304217A (nl) * 1983-12-07 1985-07-01 Philips Nv Automatisch instelbare electronenmicroscoop.

Also Published As

Publication number Publication date
GB2195860B (en) 1991-06-19
EP0564008A3 (en) 1993-12-29
GB2195860A (en) 1988-04-13
GB8721738D0 (en) 1987-10-21
DE3751328T2 (de) 1995-10-26
EP0564008A2 (de) 1993-10-06
EP0261866A2 (de) 1988-03-30
EP0564008B1 (de) 1997-12-29
GB8622976D0 (en) 1986-10-29
EP0261866A3 (en) 1990-05-16
EP0261866B1 (de) 1995-05-31
DE3752154D1 (de) 1998-02-05
JPS63164153A (ja) 1988-07-07
US4943722A (en) 1990-07-24
DE3752154T2 (de) 1998-04-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee