DE373100C - Exposure set - Google Patents
Exposure setInfo
- Publication number
- DE373100C DE373100C DEH87394D DEH0087394D DE373100C DE 373100 C DE373100 C DE 373100C DE H87394 D DEH87394 D DE H87394D DE H0087394 D DEH0087394 D DE H0087394D DE 373100 C DE373100 C DE 373100C
- Authority
- DE
- Germany
- Prior art keywords
- antimony
- exposure set
- acid salts
- exposure
- friction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K5/00—Light sources using charges of combustible material, e.g. illuminating flash devices
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
Belichtungssatz. Von den Antimonverbindungen wurde bisher zu photographischen Belichtungssätzen das Dreifach-Schwefelantimon verwendet, und zwar als die Entzündlichkeit förderndes Mittel, in Mischung mit Kaliumchlorat. Diese Mischung ist sehr reibungsempfindlich. Verwendet man jedoch statt des Schwefelantimons die antimonsauren Salze der Alkalien und alkalischen Erden, so ist die Wirkung als zündungförderndes Mittel eine ebenso gute, aber die Sätze können weit weniger reibungsempfindlich gemacht werden, da das Chlorat teilweise oder auch ganz durch salpetersaure Salze ersetzt werden kann, ohne daß Nachteile bezüglich Dauer des Blitzes einträten; in letzterem Falle ist Reibungsempfindlichkeit praktisch überhaupt nicht mehr vorhanden. Aber auch noch ein weiterer, sehr großer Vorteil entsteht durch- die Anwendung von antimonsauren Salzen in Belichtungssätzen, nämlich der, daß die ortho- resp. panchromatische Wirkung sehr günstig beeinflußt werden kann, da hier die Basen der antimonsauren Salze ihre charakteristischen Strahlungen zur Geltung bringen.Exposure set. The antimony compounds have hitherto become photographic ones Exposure sets used the triple sulfur antimony as the flammability promoting agent, mixed with potassium chlorate. This mixture is very sensitive to friction. If, however, the antimony salts of alkalis are used instead of sulfur antimony and alkaline earths, the effect as an ignition-promoting agent is also one good, but the sentences can be made far less sensitive to friction since some or all of the chlorate can be replaced by nitric acid salts, without incurring disadvantages with regard to the duration of the flash; in the latter case is Sensitivity to friction is practically no longer present at all. But also still Another very big advantage arises from the use of antimonic acid Salts in exposure sets, namely that the ortho- resp. panchromatic effect can be influenced very favorably, since this is where the bases of the antimonic acid salts are bring out characteristic radiations.
Beispiel: Chlorsaures Kali i Teil, salpetersaures Baryum 3 Teile, antimonsaures Natron i Teil, antimonsaures Strontium i Teil, Magnesium 6 Teile.Example: Potash chlorate 1 part, barium nitric acid 3 parts, Soda antimony 1 part, strontium antimony 1 part, magnesium 6 parts.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEH87394D DE373100C (en) | 1921-10-16 | 1921-10-16 | Exposure set |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEH87394D DE373100C (en) | 1921-10-16 | 1921-10-16 | Exposure set |
Publications (1)
Publication Number | Publication Date |
---|---|
DE373100C true DE373100C (en) | 1923-04-03 |
Family
ID=7164961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEH87394D Expired DE373100C (en) | 1921-10-16 | 1921-10-16 | Exposure set |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE373100C (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6674100B2 (en) | 1996-09-17 | 2004-01-06 | Matsushita Electric Industrial Co., Ltd. | SiGeC-based CMOSFET with separate heterojunctions |
-
1921
- 1921-10-16 DE DEH87394D patent/DE373100C/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6674100B2 (en) | 1996-09-17 | 2004-01-06 | Matsushita Electric Industrial Co., Ltd. | SiGeC-based CMOSFET with separate heterojunctions |
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