DE3703207C2 - - Google Patents

Info

Publication number
DE3703207C2
DE3703207C2 DE19873703207 DE3703207A DE3703207C2 DE 3703207 C2 DE3703207 C2 DE 3703207C2 DE 19873703207 DE19873703207 DE 19873703207 DE 3703207 A DE3703207 A DE 3703207A DE 3703207 C2 DE3703207 C2 DE 3703207C2
Authority
DE
Germany
Prior art keywords
plasma
frequency
discharge
ion source
discharge chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19873703207
Other languages
German (de)
English (en)
Other versions
DE3703207A1 (de
Inventor
Hartmut Dr.-Ing. 7300 Esslingen De Frey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lsg Loet- und Schweissgeraete 7307 Aichwald De GmbH
Original Assignee
Lsg Loet- und Schweissgeraete 7307 Aichwald De GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lsg Loet- und Schweissgeraete 7307 Aichwald De GmbH filed Critical Lsg Loet- und Schweissgeraete 7307 Aichwald De GmbH
Priority to DE19873703207 priority Critical patent/DE3703207A1/de
Priority to DE19883826432 priority patent/DE3826432A1/de
Publication of DE3703207A1 publication Critical patent/DE3703207A1/de
Application granted granted Critical
Publication of DE3703207C2 publication Critical patent/DE3703207C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE19873703207 1987-02-04 1987-02-04 Hochfrequenzionenquelle Granted DE3703207A1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE19873703207 DE3703207A1 (de) 1987-02-04 1987-02-04 Hochfrequenzionenquelle
DE19883826432 DE3826432A1 (de) 1987-02-04 1988-08-03 Hochfrequenzplasma- und ionenquelle fuer einen kontinuierlichen betrieb

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873703207 DE3703207A1 (de) 1987-02-04 1987-02-04 Hochfrequenzionenquelle

Publications (2)

Publication Number Publication Date
DE3703207A1 DE3703207A1 (de) 1988-08-18
DE3703207C2 true DE3703207C2 (ja) 1989-01-12

Family

ID=6320123

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873703207 Granted DE3703207A1 (de) 1987-02-04 1987-02-04 Hochfrequenzionenquelle

Country Status (1)

Country Link
DE (1) DE3703207A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3826432A1 (de) * 1987-02-04 1989-01-05 Lsg Loet Und Schweissgeraete G Hochfrequenzplasma- und ionenquelle fuer einen kontinuierlichen betrieb
JPH02215038A (ja) * 1989-02-15 1990-08-28 Hitachi Ltd マイクロ波プラズマ極微量元素分析装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2147497A5 (ja) * 1971-07-29 1973-03-09 Commissariat Energie Atomique
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof

Also Published As

Publication number Publication date
DE3703207A1 (de) 1988-08-18

Similar Documents

Publication Publication Date Title
EP0349555B1 (de) Hochfrequenz-ionenquelle
EP0593924B1 (de) Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung
EP0205028B1 (de) Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
DE102006037144B4 (de) ECR-Plasmaquelle
DE2148933A1 (de) HF-Zerstaeubungsvorrichtung
DE2026321A1 (de) Kathodenaufstäubungsverfahren und Vorrichtung zur Durchführung des Verfahrens
DE4042289A1 (de) Verfahren und vorrichtung zum reaktiven beschichten eines substrats
DE1521321C2 (de) Apparat zum Zerstäuben von dielektrischen Material
EP0462377A2 (de) Ionenquelle
DE3703207C2 (ja)
DE3134337A1 (de) Ionenstrahlkanone
DE4136655A1 (de) Verfahren und vorrichtung zum reaktiven beschichten eines substrats
DE2314284A1 (de) Ionenzerstaeuber-vakuumpumpe
EP0277341A2 (de) Anordnung zur Anwendung eines Lichtbogens
EP0607787A2 (de) Vorrichtung zum Beschichten oder Ätzen von Substraten
DE1934328A1 (de) Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode
EP1401249A2 (de) Plasmaquelle
DE2624005A1 (de) Verfahren zum aufbringen von duennen schichten nach dem ion-plating- verfahren und vorrichtung dazu
DE2025987C3 (de) Ionenquelle
DE1690684A1 (de) Verfahren und Vorrichtung zum Spruehen mit Hochfrequenz
DE1440665C (de) Kathodenzerstaubungsvorrichtung zur Herstellung metallischer Schichten
DD146625A1 (de) Vorrichtung zum ionengestuetzten beschichten und ionenaetzen von substraten
DE3908480C1 (ja)
DE2838676C2 (ja)
DE1765609C (de) Hochfrequenz-Sprühvorrichtung

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
AG Has addition no.

Ref country code: DE

Ref document number: 3826432

Format of ref document f/p: P

AG Has addition no.

Ref country code: DE

Ref document number: 3826432

Format of ref document f/p: P

D2 Grant after examination
8364 No opposition during term of opposition
AG Has addition no.

Ref country code: DE

Ref document number: 3826432

Format of ref document f/p: P

8339 Ceased/non-payment of the annual fee
8370 Indication of lapse of patent is to be deleted
8339 Ceased/non-payment of the annual fee