DE3688481T2 - Hochkontrast-photolackentwickler mit verbesserter empfindlichkeit. - Google Patents

Hochkontrast-photolackentwickler mit verbesserter empfindlichkeit.

Info

Publication number
DE3688481T2
DE3688481T2 DE8686109898T DE3688481T DE3688481T2 DE 3688481 T2 DE3688481 T2 DE 3688481T2 DE 8686109898 T DE8686109898 T DE 8686109898T DE 3688481 T DE3688481 T DE 3688481T DE 3688481 T2 DE3688481 T2 DE 3688481T2
Authority
DE
Germany
Prior art keywords
high contrast
improved sensitivity
contrast photo
photo paint
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686109898T
Other languages
English (en)
Other versions
DE3688481D1 (de
Inventor
Valentine Theodore Zuba
Robert Austin Owens
Susan Antoinette Ferguson
Roland Lee Chin
James Marvin Lewis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu MicroSi Inc
Original Assignee
MicroSi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MicroSi Inc filed Critical MicroSi Inc
Publication of DE3688481D1 publication Critical patent/DE3688481D1/de
Application granted granted Critical
Publication of DE3688481T2 publication Critical patent/DE3688481T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
    • G03C5/29—Development processes or agents therefor
    • G03C5/30—Developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8686109898T 1985-07-18 1986-07-18 Hochkontrast-photolackentwickler mit verbesserter empfindlichkeit. Expired - Fee Related DE3688481T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75620685A 1985-07-18 1985-07-18

Publications (2)

Publication Number Publication Date
DE3688481D1 DE3688481D1 (de) 1993-07-01
DE3688481T2 true DE3688481T2 (de) 1993-09-16

Family

ID=25042466

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686109898T Expired - Fee Related DE3688481T2 (de) 1985-07-18 1986-07-18 Hochkontrast-photolackentwickler mit verbesserter empfindlichkeit.

Country Status (5)

Country Link
EP (1) EP0209153B1 (de)
JP (1) JPS6278549A (de)
KR (1) KR900002227B1 (de)
CA (1) CA1281578C (de)
DE (1) DE3688481T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4027299A1 (de) * 1990-08-29 1992-03-05 Hoechst Ag Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten
GB9404301D0 (en) * 1994-03-04 1994-04-20 Atotech Uk Limited Stripper compositions and their use
KR101432446B1 (ko) * 2013-06-13 2014-08-20 삼성전기주식회사 포토레지스트 현상용 조성물 및 이를 이용한 포토레지스트의 현상방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL77573C (de) * 1951-06-30
BE528604A (de) * 1953-05-06
US3819538A (en) * 1972-05-15 1974-06-25 Dow Chemical Co Environmentally compatible laundry detergent
JPS5743892B2 (de) * 1973-09-04 1982-09-17
JPS5614970B2 (de) * 1974-02-01 1981-04-07
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
NL8301168A (nl) * 1983-03-31 1984-10-16 Chem Y Reinigingsmiddel op basis van actief chloor en alkali.
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
EP0148787A3 (de) * 1984-01-10 1987-05-06 Japan Synthetic Rubber Co., Ltd. Positive lichtempfindliche Kunststoffzusammensetzung
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
JP2582491B2 (ja) * 1991-09-04 1997-02-19 富士通株式会社 半導体結晶の熱処理方法

Also Published As

Publication number Publication date
KR870001495A (ko) 1987-03-14
DE3688481D1 (de) 1993-07-01
EP0209153A3 (en) 1987-09-30
EP0209153A2 (de) 1987-01-21
CA1281578C (en) 1991-03-19
JPS6278549A (ja) 1987-04-10
EP0209153B1 (de) 1993-05-26
KR900002227B1 (ko) 1990-04-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee