DE3687902D1 - Verfahren und vorrichtung fuer photolackverarbeitung. - Google Patents

Verfahren und vorrichtung fuer photolackverarbeitung.

Info

Publication number
DE3687902D1
DE3687902D1 DE8686116309T DE3687902T DE3687902D1 DE 3687902 D1 DE3687902 D1 DE 3687902D1 DE 8686116309 T DE8686116309 T DE 8686116309T DE 3687902 T DE3687902 T DE 3687902T DE 3687902 D1 DE3687902 D1 DE 3687902D1
Authority
DE
Germany
Prior art keywords
paint processing
photo paint
photo
processing
paint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686116309T
Other languages
English (en)
Other versions
DE3687902T2 (de
Inventor
Shinji Suzuki
Tesuji Arai
Kuniharu Ohno
Kazuyoshi Ueki
Yoshiki Mimura
Kazuya Tanaka
Shinji Sugioka
Hiroko Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE3687902D1 publication Critical patent/DE3687902D1/de
Application granted granted Critical
Publication of DE3687902T2 publication Critical patent/DE3687902T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE86116309T 1986-03-13 1986-11-25 Verfahren und Vorrichtung für Photolackverarbeitung. Expired - Lifetime DE3687902T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61053626A JPH0721643B2 (ja) 1986-03-13 1986-03-13 レジスト処理方法

Publications (2)

Publication Number Publication Date
DE3687902D1 true DE3687902D1 (de) 1993-04-08
DE3687902T2 DE3687902T2 (de) 1993-10-14

Family

ID=12948115

Family Applications (1)

Application Number Title Priority Date Filing Date
DE86116309T Expired - Lifetime DE3687902T2 (de) 1986-03-13 1986-11-25 Verfahren und Vorrichtung für Photolackverarbeitung.

Country Status (4)

Country Link
US (1) US4841342A (de)
EP (1) EP0236559B1 (de)
JP (1) JPH0721643B2 (de)
DE (1) DE3687902T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232332A (ja) * 1987-03-20 1988-09-28 Ushio Inc レジスト処理方法
JP3070113B2 (ja) * 1991-03-07 2000-07-24 ソニー株式会社 フォトレジストの現像処理装置
DE4432315A1 (de) * 1994-09-12 1996-03-14 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Quecksilberdampf-Kurzbogenlampe
US6620574B2 (en) * 2001-09-12 2003-09-16 Ppg Industries Ohio, Inc. Method of treating photoresists using electrodeless UV lamps
US8986562B2 (en) 2013-08-07 2015-03-24 Ultratech, Inc. Methods of laser processing photoresist in a gaseous environment
CN111326408B (zh) * 2018-12-13 2022-09-20 中芯国际集成电路制造(上海)有限公司 半导体结构及其形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3573456A (en) * 1967-07-26 1971-04-06 Opto Mechanisms Inc High resolution projection means for printing micro circuits on photoresist material
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JPS6045252A (ja) * 1983-08-23 1985-03-11 Canon Inc 投影露光装置の照明系
JPS61189636A (ja) * 1985-02-19 1986-08-23 Ushio Inc キセノン・水銀放電灯による半導体ウエハ−の露光方法

Also Published As

Publication number Publication date
US4841342A (en) 1989-06-20
JPS62211646A (ja) 1987-09-17
EP0236559A2 (de) 1987-09-16
EP0236559B1 (de) 1993-03-03
DE3687902T2 (de) 1993-10-14
EP0236559A3 (en) 1988-03-02
JPH0721643B2 (ja) 1995-03-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition