DE3686161D1 - Vorrichtung zur laserunterstuetzten, elektrolytischen metallabscheidung. - Google Patents

Vorrichtung zur laserunterstuetzten, elektrolytischen metallabscheidung.

Info

Publication number
DE3686161D1
DE3686161D1 DE8686870135T DE3686161T DE3686161D1 DE 3686161 D1 DE3686161 D1 DE 3686161D1 DE 8686870135 T DE8686870135 T DE 8686870135T DE 3686161 T DE3686161 T DE 3686161T DE 3686161 D1 DE3686161 D1 DE 3686161D1
Authority
DE
Germany
Prior art keywords
electrolyte
recovery
capillary tube
source
metal deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686870135T
Other languages
English (en)
Inventor
Alain Biernaux
Lucien Diego Laude
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE3686161D1 publication Critical patent/DE3686161D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laser Beam Processing (AREA)
DE8686870135T 1986-09-25 1986-09-25 Vorrichtung zur laserunterstuetzten, elektrolytischen metallabscheidung. Expired - Lifetime DE3686161D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP86870135A EP0261296B1 (de) 1986-09-25 1986-09-25 Vorrichtung zur laserunterstützten, elektrolytischen Metallabscheidung

Publications (1)

Publication Number Publication Date
DE3686161D1 true DE3686161D1 (de) 1992-08-27

Family

ID=8196548

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686870135T Expired - Lifetime DE3686161D1 (de) 1986-09-25 1986-09-25 Vorrichtung zur laserunterstuetzten, elektrolytischen metallabscheidung.

Country Status (3)

Country Link
US (1) US4826583A (de)
EP (1) EP0261296B1 (de)
DE (1) DE3686161D1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292418A (en) * 1991-03-08 1994-03-08 Mitsubishi Denki Kabushiki Kaisha Local laser plating apparatus
WO1993017321A1 (en) * 1992-02-25 1993-09-02 Unisearch Limited Electrothermal atomic absorption and preconcentration device
JP2896726B2 (ja) * 1992-03-30 1999-05-31 セイコーインスツルメンツ株式会社 微細加工装置
US8110247B2 (en) * 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US7938079B2 (en) * 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US7294366B2 (en) * 1998-09-30 2007-11-13 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
US7108894B2 (en) 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US6636676B1 (en) * 1998-09-30 2003-10-21 Optomec Design Company Particle guidance system
US20050156991A1 (en) * 1998-09-30 2005-07-21 Optomec Design Company Maskless direct write of copper using an annular aerosol jet
US20030020768A1 (en) * 1998-09-30 2003-01-30 Renn Michael J. Direct write TM system
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
EP1292414B1 (de) * 2000-06-13 2005-12-14 Element Six (PTY) Ltd Verbunddiamantkörper
US7938341B2 (en) * 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US20080013299A1 (en) * 2004-12-13 2008-01-17 Optomec, Inc. Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array
US7674671B2 (en) * 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US20070154634A1 (en) * 2005-12-15 2007-07-05 Optomec Design Company Method and Apparatus for Low-Temperature Plasma Sintering
US9185810B2 (en) * 2006-06-06 2015-11-10 Second Sight Medical Products, Inc. Molded polymer comprising silicone and at least one metal trace and a process of manufacturing the same
US7750076B2 (en) * 2006-06-07 2010-07-06 Second Sight Medical Products, Inc. Polymer comprising silicone and at least one metal trace
US20100310630A1 (en) * 2007-04-27 2010-12-09 Technische Universitat Braunschweig Coated surface for cell culture
TWI482662B (zh) 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) * 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
TW200918325A (en) * 2007-08-31 2009-05-01 Optomec Inc AEROSOL JET® printing system for photovoltaic applications
US8887658B2 (en) * 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
CN103572341B (zh) * 2013-09-23 2016-01-20 江苏大学 激光光管电极的电化学复合沉积制造方法与装置
WO2016130709A1 (en) 2015-02-10 2016-08-18 Optomec, Inc. Fabrication of three-dimensional structures by in-flight curing of aerosols
CN105081576A (zh) * 2015-08-25 2015-11-25 江苏大学 一种利用激光空化提高水泵叶轮强度的装置及方法
US10632746B2 (en) 2017-11-13 2020-04-28 Optomec, Inc. Shuttering of aerosol streams
CN109732199B (zh) * 2019-02-25 2020-11-20 江苏大学 一种半导体材料激光电化学背向协同微加工方法及装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0048514B1 (de) * 1980-09-18 1984-07-18 L'Etat belge, représenté par le Secrétaire Général des Services de la Programmation de la Politique Scientifique Verfahren zum Kristallisieren von Filmen und so erhaltene Filme
JPS5864368A (ja) * 1981-10-12 1983-04-16 Inoue Japax Res Inc 化学メツキ方法
JPS59129780A (ja) * 1983-01-14 1984-07-26 Hitachi Ltd 選択的加工装置
US4497692A (en) * 1983-06-13 1985-02-05 International Business Machines Corporation Laser-enhanced jet-plating and jet-etching: high-speed maskless patterning method
GB2154017B (en) * 1984-02-03 1987-09-30 Gen Electric Laser material processing through a fiber optic

Also Published As

Publication number Publication date
EP0261296B1 (de) 1992-07-22
EP0261296A1 (de) 1988-03-30
US4826583A (en) 1989-05-02

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