DE3675413D1 - Vorrichtung und verfahren zur pruefung des spezifischen widerstandes. - Google Patents

Vorrichtung und verfahren zur pruefung des spezifischen widerstandes.

Info

Publication number
DE3675413D1
DE3675413D1 DE8686301044T DE3675413T DE3675413D1 DE 3675413 D1 DE3675413 D1 DE 3675413D1 DE 8686301044 T DE8686301044 T DE 8686301044T DE 3675413 T DE3675413 T DE 3675413T DE 3675413 D1 DE3675413 D1 DE 3675413D1
Authority
DE
Germany
Prior art keywords
testing
specific resistance
resistance
specific
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686301044T
Other languages
German (de)
English (en)
Inventor
David Steven Perloff
Chester Lawrence Mallory
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Prometrix Corp
Original Assignee
Prometrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Prometrix Corp filed Critical Prometrix Corp
Application granted granted Critical
Publication of DE3675413D1 publication Critical patent/DE3675413D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
DE8686301044T 1985-02-22 1986-02-14 Vorrichtung und verfahren zur pruefung des spezifischen widerstandes. Expired - Lifetime DE3675413D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/704,296 US4703252A (en) 1985-02-22 1985-02-22 Apparatus and methods for resistivity testing

Publications (1)

Publication Number Publication Date
DE3675413D1 true DE3675413D1 (de) 1990-12-13

Family

ID=24828889

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686301044T Expired - Lifetime DE3675413D1 (de) 1985-02-22 1986-02-14 Vorrichtung und verfahren zur pruefung des spezifischen widerstandes.

Country Status (4)

Country Link
US (1) US4703252A (enExample)
EP (1) EP0196158B1 (enExample)
JP (1) JPS61247046A (enExample)
DE (1) DE3675413D1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4764970A (en) * 1985-04-15 1988-08-16 Hitachi, Ltd. Method and apparatus for detecting cracks
US4755746A (en) * 1985-04-24 1988-07-05 Prometrix Corporation Apparatus and methods for semiconductor wafer testing
US4989154A (en) * 1987-07-13 1991-01-29 Mitsubishi Petrochemical Company Ltd. Method of measuring resistivity, and apparatus therefor
DE3910610A1 (de) * 1989-04-01 1990-10-04 Asea Brown Boveri Vorrichtung zur messung des oberflaechenwiderstandes
JP2575640Y2 (ja) * 1991-02-15 1998-07-02 株式会社 アイシーティ 半導体素子の検査装置
US5495178A (en) * 1992-11-10 1996-02-27 Cheng; David Method and apparatus for measuring film thickness
US5691648A (en) * 1992-11-10 1997-11-25 Cheng; David Method and apparatus for measuring sheet resistance and thickness of thin films and substrates
GB2276462B (en) * 1993-03-23 1997-01-22 Univ Sheffield Method and apparatus for mapping of semiconductor materials
US5642298A (en) * 1994-02-16 1997-06-24 Ade Corporation Wafer testing and self-calibration system
US6069326A (en) * 1997-03-10 2000-05-30 Dresser Industries, Inc. Hand held measurement instrument with touch screen display
US6215127B1 (en) * 1999-03-08 2001-04-10 Advanced Micro Devices, Inc. Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set
DE10061106B4 (de) * 2000-12-07 2004-11-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Überprüfung elektrischer Materialeigenschaften
US6552554B1 (en) 2001-12-06 2003-04-22 The United States Of America As Represented By The Secretary Of The Navy Testing current perpendicular to plane giant magnetoresistance multilayer devices
US6943571B2 (en) * 2003-03-18 2005-09-13 International Business Machines Corporation Reduction of positional errors in a four point probe resistance measurement
DE102004055181B3 (de) * 2004-11-16 2006-05-11 X-Fab Semiconductor Foundries Ag Verfahren und Anordnung zur elektrischen Messung der Dicke von Halbleiterschichten
US7218125B2 (en) * 2005-09-30 2007-05-15 Agere Systems Inc Apparatus and method for performing a four-point voltage measurement for an integrated circuit
EP1775594A1 (en) * 2005-10-17 2007-04-18 Capres A/S Eliminating in-line positional errors for four-point resistance measurement
EP1780550A1 (en) * 2005-10-31 2007-05-02 Capres A/S A probe for testing electrical properties of test samples
WO2007121752A1 (en) 2006-04-24 2007-11-01 Capres A/S Method for sheet resistance and leakage current density measurements on shallow semiconductor implants
DE102007005208A1 (de) * 2007-01-29 2008-07-31 Suss Microtec Test Systems Gmbh Verfahren zum Prüfen elektronischer Bauelemente und Prüfvorrichtung zur Durchführung des Verfahrens
US8907690B2 (en) * 2007-09-03 2014-12-09 Capres A/S Method of determining an electrical property of a test sample
US7759955B2 (en) * 2007-12-21 2010-07-20 Infineon Technologies Ag Method and device for position detection using connection pads
US10598477B2 (en) * 2016-02-04 2020-03-24 Kla-Tencor Corporation Dynamic determination of metal film thickness from sheet resistance and TCR value
EP3566062B1 (en) 2017-01-09 2020-11-04 Capres A/S A position correction method and a system for position correction in relation to four-point resistance measurements
CN113495190B (zh) 2020-04-01 2024-10-15 株式会社东芝 电阻映射装置、电阻测定装置、电阻测定方法、程序以及记录介质

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2987672A (en) * 1957-11-21 1961-06-06 Pure Oil Co Impedance test apparatus
NL7008274A (enExample) * 1970-06-06 1971-12-08
US4035722A (en) * 1975-03-17 1977-07-12 Anatoly Leonidovich Ryabov Multiprobe head for checking electrical parameters of semiconductor instruments and microcircuits
JPS5416975A (en) * 1977-07-08 1979-02-07 Shinetsu Handotai Kk Device for judging semiconductor wafer in conductive type
SU896581A1 (ru) * 1977-08-12 1982-01-07 Ордена Ленина физико-технический институт им.А.Ф.Иоффе Способ определени статистических параметров удельного сопротивлени полупроводникового материала
US4204155A (en) * 1978-07-28 1980-05-20 Advanced Semiconductor Materials/America Automatic four-point probe
US4383217A (en) * 1979-01-02 1983-05-10 Shiell Thomas J Collinear four-point probe head and mount for resistivity measurements
US4267506A (en) * 1979-01-02 1981-05-12 Shiell Thomas J Collinear four-point probe head and mount for resistivity measurements

Also Published As

Publication number Publication date
EP0196158B1 (en) 1990-11-07
EP0196158A1 (en) 1986-10-01
JPH0357620B2 (enExample) 1991-09-02
US4703252A (en) 1987-10-27
JPS61247046A (ja) 1986-11-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee