DE3672822D1 - Herstellung von ueberzuegen aus titannitrid oder zirconnitrid. - Google Patents

Herstellung von ueberzuegen aus titannitrid oder zirconnitrid.

Info

Publication number
DE3672822D1
DE3672822D1 DE8686906178T DE3672822T DE3672822D1 DE 3672822 D1 DE3672822 D1 DE 3672822D1 DE 8686906178 T DE8686906178 T DE 8686906178T DE 3672822 T DE3672822 T DE 3672822T DE 3672822 D1 DE3672822 D1 DE 3672822D1
Authority
DE
Germany
Prior art keywords
zirconnitride
coats
production
titan nitride
titan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686906178T
Other languages
English (en)
Inventor
Albert Sue
Henry Troue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27119859&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3672822(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Application granted granted Critical
Publication of DE3672822D1 publication Critical patent/DE3672822D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12576—Boride, carbide or nitride component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
DE8686906178T 1985-09-30 1986-09-30 Herstellung von ueberzuegen aus titannitrid oder zirconnitrid. Expired - Lifetime DE3672822D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US78145985A 1985-09-30 1985-09-30
US06/905,510 US4895765A (en) 1985-09-30 1986-09-10 Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
PCT/US1986/002031 WO1987002071A1 (en) 1985-09-30 1986-09-30 Formation of titanium nitride or zirconium nitride coatings

Publications (1)

Publication Number Publication Date
DE3672822D1 true DE3672822D1 (de) 1990-08-23

Family

ID=27119859

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686906178T Expired - Lifetime DE3672822D1 (de) 1985-09-30 1986-09-30 Herstellung von ueberzuegen aus titannitrid oder zirconnitrid.

Country Status (7)

Country Link
US (1) US4895765A (de)
EP (1) EP0241517B1 (de)
JP (2) JPH08968B2 (de)
KR (1) KR910009164B1 (de)
AU (1) AU593292B2 (de)
DE (1) DE3672822D1 (de)
WO (1) WO1987002071A1 (de)

Families Citing this family (37)

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AU594979B2 (en) * 1985-09-30 1990-03-22 Union Carbide Corporation Arc vapor depositing a coating in an evacuated chamber
US4904528A (en) * 1987-12-24 1990-02-27 United Technologies Corporation Coated gas turbine engine compressor components
JPH0774445B2 (ja) * 1989-11-30 1995-08-09 アプライド マテリアルズ インコーポレーテッド 閉ループ制御反応スパッタリングにより所定成分比の金属化合物層を形成するプロセス及び装置
US5215706A (en) * 1991-06-05 1993-06-01 Siemens Power Corporation Method and apparatus for ultrasonic testing of nuclear fuel rods employing an alignment guide
US5242753A (en) * 1991-07-11 1993-09-07 Praxair S.T. Technology, Inc. Substoichiometric zirconium nitride coating
US5242860A (en) * 1991-07-24 1993-09-07 Applied Materials, Inc. Method for the formation of tin barrier layer with preferential (111) crystallographic orientation
US5290368A (en) * 1992-02-28 1994-03-01 Ingersoll-Rand Company Process for producing crack-free nitride-hardened surface on titanium by laser beams
JPH0649645A (ja) * 1992-07-31 1994-02-22 Yoshida Kogyo Kk <Ykk> 硬質多層膜形成体およびその製造方法
US5274686A (en) * 1992-09-25 1993-12-28 Combustion Engineering, Inc. Anodic vacuum arc deposition
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
US5662770A (en) * 1993-04-16 1997-09-02 Micron Technology, Inc. Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks
US5455197A (en) * 1993-07-16 1995-10-03 Materials Research Corporation Control of the crystal orientation dependent properties of a film deposited on a semiconductor wafer
JP2689931B2 (ja) * 1994-12-29 1997-12-10 日本電気株式会社 スパッタ方法
US5762726A (en) * 1995-03-24 1998-06-09 Berkenhoff Gmbh Wire electrode and process for producing a wire electrode, particular for a spark erosion process
WO1997038149A1 (en) * 1996-04-08 1997-10-16 Ronald Christy Cathodic arc cathode
CZ301516B6 (cs) * 1997-09-12 2010-03-31 Oerlikon Trading Ag, Truebbach Nástroj s ochranným vrstvovým systémem a zpusob jeho výroby
US6360423B1 (en) 1997-12-16 2002-03-26 Clad Metals Llc Stick resistant coating for cookware
US7093340B2 (en) 1997-12-16 2006-08-22 All-Clad Metalcrafters Llc Stick resistant ceramic coating for cookware
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
US6326685B1 (en) * 1998-05-04 2001-12-04 Agere Systems Guardian Corp. Low thermal expansion composite comprising bodies of negative CTE material disposed within a positive CTE matrix
US6452314B1 (en) 2000-01-05 2002-09-17 Honeywell International Inc. Spark plug having a protective titanium thereon, and methods of making the same
US7232556B2 (en) * 2003-09-26 2007-06-19 Nanoproducts Corporation Titanium comprising nanoparticles and related nanotechnology
US20080166561A1 (en) * 2005-08-16 2008-07-10 Honeywell International, Inc. Multilayered erosion resistant coating for gas turbines
US8229570B2 (en) * 2006-01-30 2012-07-24 Medtronic, Inc. Implantable electrodes having zirconium nitride coatings
CA2600097A1 (en) * 2007-08-31 2009-02-28 Mds-Prad Technologies Corporation Physical vapour deposition process for depositing erosion resistant coatings on a substrate
JP2009059882A (ja) * 2007-08-31 2009-03-19 Nec Electronics Corp 半導体装置
SE0702411L (sv) * 2007-11-01 2009-05-02 Seco Tools Ab Belagt skär för bearbetning av aluminiumbaserade legeringar
JP2011146507A (ja) * 2010-01-14 2011-07-28 Renesas Electronics Corp 半導体装置および半導体装置の製造方法
JP5692635B2 (ja) * 2010-11-16 2015-04-01 三菱マテリアル株式会社 表面被覆切削工具
JP5865015B2 (ja) * 2011-06-24 2016-02-17 株式会社リケン ピストンリング
US20130000552A1 (en) * 2011-06-28 2013-01-03 Nitride Solutions Inc. Device and method for producing bulk single crystals
JP2013021012A (ja) 2011-07-07 2013-01-31 Renesas Electronics Corp 半導体装置の製造方法
EP3041798A4 (de) 2013-09-04 2017-04-26 Nitride Solutions Inc. Kristallzüchtungsverfahren mit massendiffusion
RU2585565C1 (ru) * 2014-12-01 2016-05-27 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" Способ получения многослойного покрытия для режущего инструмента
KR102457549B1 (ko) * 2015-12-22 2022-10-20 산드빅 인터렉츄얼 프로퍼티 에이비 Pvd 층을 제조하는 방법 및 코팅된 절삭 공구
JP6643207B2 (ja) * 2016-08-30 2020-02-12 京セラ株式会社 サーマルヘッドおよびサーマルプリンタ
JP6954769B2 (ja) * 2017-06-09 2021-10-27 三菱マテリアル電子化成株式会社 窒化ジルコニウム粉末及びその製造方法

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US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4132624A (en) * 1971-02-05 1979-01-02 Triplex Safety Glass Company Limited Apparatus for producing metal oxide films
US3772174A (en) * 1971-04-21 1973-11-13 Nasa Deposition of alloy films
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
US3961103A (en) * 1972-07-12 1976-06-01 Space Sciences, Inc. Film deposition
GB1356769A (en) * 1973-03-27 1974-06-12 Cit Alcatel Apparatus and method for depositing thin layers on a substrate
US4022872A (en) * 1975-11-12 1977-05-10 Ppg Industries, Inc. Process for preparing finely-divided refractory powders
JPS52149163A (en) * 1976-06-07 1977-12-12 Tsuneo Nishida Stainless outer accessory for watch
JPS52149161A (en) * 1976-06-07 1977-12-12 Tsuneo Nishida Outer accessory for watch
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
US4169913A (en) * 1978-03-01 1979-10-02 Sumitomo Electric Industries, Ltd. Coated tool steel and machining tool formed therefrom
EP0008634B1 (de) * 1978-07-08 1983-03-30 Wolfgang Kieferle Verfahren zum Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück und Vorrichtung zur Durchführung desselben
JPS56156767A (en) * 1980-05-02 1981-12-03 Sumitomo Electric Ind Ltd Highly hard substance covering material
IL63802A (en) * 1981-09-11 1984-10-31 Iscar Ltd Sintered hard metal products having a multi-layer wear-resistant coating
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
US4428812A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
US4540596A (en) * 1983-05-06 1985-09-10 Smith International, Inc. Method of producing thin, hard coating
JPS59299A (ja) * 1983-05-19 1984-01-05 Mitsubishi Electric Corp 同軸型スピ−カのスピ−カ規制装置
DE3463641D1 (en) * 1983-11-11 1987-06-19 Japan Res Dev Corp Boron nitride containing titanium nitride, method of producing the same and composite ceramics produced therefrom
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4774151A (en) * 1986-05-23 1988-09-27 International Business Machines Corporation Low contact electrical resistant composition, substrates coated therewith, and process for preparing such

Also Published As

Publication number Publication date
EP0241517B1 (de) 1990-07-18
EP0241517A1 (de) 1987-10-21
US4895765A (en) 1990-01-23
AU6408486A (en) 1987-04-24
KR910009164B1 (ko) 1991-10-31
JPS63502123A (ja) 1988-08-18
JPH08968B2 (ja) 1996-01-10
WO1987002071A1 (en) 1987-04-09
JPH08170168A (ja) 1996-07-02
JP2742896B2 (ja) 1998-04-22
AU593292B2 (en) 1990-02-08
KR880700098A (ko) 1988-02-15

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
8339 Ceased/non-payment of the annual fee