DE3641437C2 - - Google Patents
Info
- Publication number
- DE3641437C2 DE3641437C2 DE3641437A DE3641437A DE3641437C2 DE 3641437 C2 DE3641437 C2 DE 3641437C2 DE 3641437 A DE3641437 A DE 3641437A DE 3641437 A DE3641437 A DE 3641437A DE 3641437 C2 DE3641437 C2 DE 3641437C2
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- nozzle
- gas
- fine particles
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 51
- 239000010419 fine particle Substances 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 3
- 239000012808 vapor phase Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 36
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000011144 upstream manufacturing Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- -1 polytetrafluoroethylene Polymers 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 239000011882 ultra-fine particle Substances 0.000 description 5
- 238000003475 lamination Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000013517 stratification Methods 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 230000002631 hypothermal effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
- H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27132985A JPS62131511A (ja) | 1985-12-04 | 1985-12-04 | 微粒子の吹き付け装置 |
| JP27132885A JPS62131510A (ja) | 1985-12-04 | 1985-12-04 | 微粒子の吹き付け装置 |
| JP61164589A JPH0627338B2 (ja) | 1986-07-15 | 1986-07-15 | 超微粒子による多層膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3641437A1 DE3641437A1 (de) | 1987-06-11 |
| DE3641437C2 true DE3641437C2 (enrdf_load_stackoverflow) | 1990-04-05 |
Family
ID=27322355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863641437 Granted DE3641437A1 (de) | 1985-12-04 | 1986-12-04 | Feinteilchen-blasvorrichtung |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4957061A (enrdf_load_stackoverflow) |
| DE (1) | DE3641437A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2590808B1 (enrdf_load_stackoverflow) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3735787A1 (de) * | 1987-09-22 | 1989-03-30 | Stiftung Inst Fuer Werkstoffte | Verfahren und vorrichtung zum zerstaeuben mindestens eines strahls eines fluessigen stoffs, vorzugsweise geschmolzenen metalls |
| US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
| US5356672A (en) * | 1990-05-09 | 1994-10-18 | Jet Process Corporation | Method for microwave plasma assisted supersonic gas jet deposition of thin films |
| US5356673A (en) * | 1991-03-18 | 1994-10-18 | Jet Process Corporation | Evaporation system and method for gas jet deposition of thin film materials |
| JPH04305096A (ja) * | 1991-04-01 | 1992-10-28 | Sumitomo Electric Ind Ltd | 高品質気相合成ダイヤモンドの低温形成法 |
| CN1099188A (zh) * | 1993-04-01 | 1995-02-22 | 松下电器产业株式会社 | 激励原子束源 |
| JP3587884B2 (ja) * | 1994-07-21 | 2004-11-10 | 富士通株式会社 | 多層回路基板の製造方法 |
| US5571332A (en) * | 1995-02-10 | 1996-11-05 | Jet Process Corporation | Electron jet vapor deposition system |
| US5793013A (en) * | 1995-06-07 | 1998-08-11 | Physical Sciences, Inc. | Microwave-driven plasma spraying apparatus and method for spraying |
| US6205769B1 (en) * | 1995-06-07 | 2001-03-27 | John E. Brandenburg | Compact coupling for microwave-electro-thermal thruster |
| DE29600991U1 (de) * | 1996-01-20 | 1997-05-22 | Strämke, Siegfried, Dr.-Ing., 52538 Selfkant | Plasmareaktor |
| US5882468A (en) * | 1996-02-23 | 1999-03-16 | International Business Machines Corporation | Thickness control of semiconductor device layers in reactive ion etch processes |
| US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
| US7521653B2 (en) * | 2004-08-03 | 2009-04-21 | Exatec Llc | Plasma arc coating system |
| JP2007049128A (ja) * | 2005-07-12 | 2007-02-22 | Seiko Epson Corp | 製膜装置 |
| JP5291875B2 (ja) * | 2006-11-01 | 2013-09-18 | 富士フイルム株式会社 | プラズマ装置 |
| EP1919264A1 (en) * | 2006-11-02 | 2008-05-07 | Dow Corning Corporation | Device for forming a film by deposition from a plasma |
| EP2152931B1 (en) * | 2007-05-17 | 2013-08-14 | Exatec, LLC. | Method for depositing multiple coating materials in a common plasma coating zone |
| DE102008062619B8 (de) * | 2008-12-10 | 2012-03-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mikrowellenplasmaquelle und Verfahren zur Bildung eines linear langgestreckten Plasmas beiAtmosphärendruckbedingungen |
| DE102011111884B3 (de) | 2011-08-31 | 2012-08-30 | Martin Weisgerber | Verfahren und Vorrichtung zur Erzeugung von thermodynamisch kaltem Mikrowellenplasma |
| DE102019109195A1 (de) | 2019-04-08 | 2020-10-08 | Norma Germany Gmbh | Strahlpumpe |
| US10844483B1 (en) | 2019-12-16 | 2020-11-24 | Quantum Elements Development, Inc. | Quantum printing methods |
| US11623871B2 (en) | 2020-12-15 | 2023-04-11 | Quantum Elements Development Inc. | Rare earth metal instantiation |
| US11484941B2 (en) | 2020-12-15 | 2022-11-01 | Quantum Elements Development Inc. | Metal macrostructures |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL100168C (enrdf_load_stackoverflow) * | 1955-05-02 | 1900-01-01 | ||
| FR1349367A (fr) * | 1962-12-04 | 1964-01-17 | Martel Catala & Cie Ets | Perfectionnements apportés aux toiles d'égouttage à fils plastiques, notamment à celles pour machines à papier ou semblables |
| US3670400A (en) * | 1969-05-09 | 1972-06-20 | Nat Res Dev | Process and apparatus for fabricating a hot worked metal layer from atomized metal particles |
| US3914573A (en) * | 1971-05-17 | 1975-10-21 | Geotel Inc | Coating heat softened particles by projection in a plasma stream of Mach 1 to Mach 3 velocity |
| JPS513731B2 (enrdf_load_stackoverflow) * | 1971-08-09 | 1976-02-05 | ||
| CH603249A5 (enrdf_load_stackoverflow) * | 1976-02-20 | 1978-08-15 | Hero Conserven | |
| DE2848480C2 (de) * | 1978-11-08 | 1984-11-08 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zum Aufbringen von Schichten auf Träger unter Vakuum |
| AU531847B2 (en) * | 1979-02-23 | 1983-09-08 | Sekisui Kagaku Kogyo Kabushiki Kaisha | Magnetic recording medium + process for production thereof |
| DE2937652C2 (de) * | 1979-09-18 | 1981-12-10 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Düse zur Zuführung von Gasen |
| US4403002A (en) * | 1979-12-10 | 1983-09-06 | Fuji Photo Film Co., Ltd. | Vacuum evaporating apparatus |
| JPS56114387A (en) * | 1980-02-13 | 1981-09-08 | Sanyo Electric Co Ltd | Manufacture of photovoltaic force element |
| DE3014258A1 (de) * | 1980-04-14 | 1981-10-15 | Heinrich Dr. 6236 Eschborn Winter | Verfahren zum aufbringen von metallischen, metalloidischen oder keramischen schichten mit verbesserten strukturellen eigenschaften durch plasmaspruehen |
| CA1159012A (en) * | 1980-05-02 | 1983-12-20 | Seitaro Matsuo | Plasma deposition apparatus |
| FR2514033B1 (fr) * | 1981-10-02 | 1985-09-27 | Henaff Louis | Installation pour le depot de couches minces en grande surface en phase vapeur reactive par plasma |
| IT1139686B (it) * | 1981-11-09 | 1986-09-24 | Teresio Dessilani | Dispositivo di verniciatura a spruzzo,su materiale trasportato da tappeti,mediante pistole in linea |
| US4514250A (en) * | 1982-10-18 | 1985-04-30 | At&T Bell Laboratories | Method of substrate heating for deposition processes |
| EP0122092A3 (en) * | 1983-04-06 | 1985-07-10 | General Engineering Radcliffe Limited | Vacuum coating apparatus |
| US4504730A (en) * | 1983-10-04 | 1985-03-12 | Ushio Denki Kabushiki Kaisha | Method for heating semiconductor wafer by means of application of radiated light |
| FR2558850A1 (fr) * | 1984-01-26 | 1985-08-02 | Clecim Sa | Procede et dispositif de revetement d'un produit long par pulverisation d'un materiau de revetement liquide |
| US4566403A (en) * | 1985-01-30 | 1986-01-28 | Sovonics Solar Systems | Apparatus for microwave glow discharge deposition |
| CA1272662A (en) * | 1985-03-26 | 1990-08-14 | Canon Kabushiki Kaisha | Apparatus and process for controlling flow of fine particles |
| US4601260A (en) * | 1985-04-01 | 1986-07-22 | Sovonics Solar Systems | Vertical semiconductor processor |
| CA1272661A (en) * | 1985-05-11 | 1990-08-14 | Yuji Chiba | Reaction apparatus |
| US4664951A (en) * | 1985-07-31 | 1987-05-12 | Energy Conversion Devices, Inc. | Method provided for corrective lateral displacement of a longitudinally moving web held in a planar configuration |
| CH669830A5 (enrdf_load_stackoverflow) * | 1986-03-17 | 1989-04-14 | Peter A Balla |
-
1986
- 1986-12-04 FR FR868616981A patent/FR2590808B1/fr not_active Expired
- 1986-12-04 DE DE19863641437 patent/DE3641437A1/de active Granted
-
1989
- 1989-12-18 US US07/453,240 patent/US4957061A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| FR2590808B1 (fr) | 1989-09-15 |
| FR2590808A1 (fr) | 1987-06-05 |
| DE3641437A1 (de) | 1987-06-11 |
| US4957061A (en) | 1990-09-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: DRES. WESER UND MARTIN, 81245 MUENCHEN |
|
| 8328 | Change in the person/name/address of the agent |
Free format text: WESER & KOLLEGEN, 81245 MUENCHEN |