DE3631758C2 - - Google Patents

Info

Publication number
DE3631758C2
DE3631758C2 DE3631758A DE3631758A DE3631758C2 DE 3631758 C2 DE3631758 C2 DE 3631758C2 DE 3631758 A DE3631758 A DE 3631758A DE 3631758 A DE3631758 A DE 3631758A DE 3631758 C2 DE3631758 C2 DE 3631758C2
Authority
DE
Germany
Prior art keywords
tungsten
layer
molybdenum
thickness
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3631758A
Other languages
German (de)
English (en)
Other versions
DE3631758A1 (de
Inventor
David Winfield Scotia N.Y. Us Woodruff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE3631758A1 publication Critical patent/DE3631758A1/de
Application granted granted Critical
Publication of DE3631758C2 publication Critical patent/DE3631758C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • H10P14/412—
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
DE19863631758 1985-10-07 1986-09-18 Verfahren zur herstellung von duennen wolframfilmen auf substraten Granted DE3631758A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78498585A 1985-10-07 1985-10-07

Publications (2)

Publication Number Publication Date
DE3631758A1 DE3631758A1 (de) 1987-04-09
DE3631758C2 true DE3631758C2 (show.php) 1988-05-19

Family

ID=25134142

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863631758 Granted DE3631758A1 (de) 1985-10-07 1986-09-18 Verfahren zur herstellung von duennen wolframfilmen auf substraten

Country Status (4)

Country Link
JP (1) JPS62109973A (show.php)
DE (1) DE3631758A1 (show.php)
FR (1) FR2588277B1 (show.php)
GB (1) GB2181456B (show.php)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0267730B1 (en) * 1986-11-10 1992-03-18 AT&T Corp. Tungsten metallization
DE3730644A1 (de) * 1987-09-11 1989-03-30 Baeuerle Dieter Verfahren zur vorgegeben strukturierten abscheidung von mikrostrukturen mit laserlicht
FR2621738B1 (fr) * 1987-10-08 1990-02-02 Mingam Herve Structure de transistor a effet de champ a grille metallique isolee et procede de fabrication
US4873152A (en) * 1988-02-17 1989-10-10 Air Products And Chemicals, Inc. Heat treated chemically vapor deposited products
US5149672A (en) * 1988-08-01 1992-09-22 Nadia Lifshitz Process for fabricating integrated circuits having shallow junctions
US4999317A (en) * 1989-09-29 1991-03-12 At&T Bell Laboratories Metallization processing
US5084415A (en) * 1989-10-23 1992-01-28 At&T Bell Laboratories Metallization processing
KR940010158B1 (ko) * 1991-07-09 1994-10-22 한국과학기술연구원 플라즈마 화학증착법에 의한 텅스텐 박막 증착방법
JP3491237B2 (ja) * 1993-09-24 2004-01-26 日本テキサス・インスツルメンツ株式会社 半導体装置の積層導電膜構造
US20090115060A1 (en) 2007-11-01 2009-05-07 Infineon Technologies Ag Integrated circuit device and method
CN110983249A (zh) * 2019-12-25 2020-04-10 中建材蚌埠玻璃工业设计研究院有限公司 一种大面积连续层状硫化钼的制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR793015A (fr) * 1934-10-16 1936-01-15 Dispersion Cathodique S A Perfectionnements apportés à la dispersion cathodique
US2387903A (en) * 1944-03-14 1945-10-30 Mallory & Co Inc P R Contacting element
US3477872A (en) * 1966-09-21 1969-11-11 Rca Corp Method of depositing refractory metals
DE2151127C3 (de) * 1970-12-16 1981-04-16 International Business Machines Corp., 10504 Armonk, N.Y. Verfahren zum Abscheiden eines Metallisierungsmusters und seine Anwendung
US3856647A (en) * 1973-05-15 1974-12-24 Ibm Multi-layer control or stress in thin films
US4234622A (en) * 1979-04-11 1980-11-18 The United States Of American As Represented By The Secretary Of The Army Vacuum deposition method
US4404235A (en) * 1981-02-23 1983-09-13 Rca Corporation Method for improving adhesion of metal film on a dielectric surface
US4404234A (en) * 1981-12-23 1983-09-13 Bell Telephone Laboratories, Incorporated Electrode coating process

Also Published As

Publication number Publication date
GB2181456B (en) 1989-10-25
FR2588277B1 (fr) 1991-08-16
DE3631758A1 (de) 1987-04-09
FR2588277A1 (fr) 1987-04-10
JPS6248752B2 (show.php) 1987-10-15
GB8622272D0 (en) 1986-10-22
JPS62109973A (ja) 1987-05-21
GB2181456A (en) 1987-04-23

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: SIEB, R., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 6947 LAUDENBACH

8339 Ceased/non-payment of the annual fee