GB8622272D0 - Depositing metal films on dielectric substrates - Google Patents
Depositing metal films on dielectric substratesInfo
- Publication number
- GB8622272D0 GB8622272D0 GB868622272A GB8622272A GB8622272D0 GB 8622272 D0 GB8622272 D0 GB 8622272D0 GB 868622272 A GB868622272 A GB 868622272A GB 8622272 A GB8622272 A GB 8622272A GB 8622272 D0 GB8622272 D0 GB 8622272D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- metal films
- depositing metal
- dielectric substrates
- dielectric
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/32051—Deposition of metallic or metal-silicide layers
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78498585A | 1985-10-07 | 1985-10-07 |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8622272D0 true GB8622272D0 (en) | 1986-10-22 |
GB2181456A GB2181456A (en) | 1987-04-23 |
GB2181456B GB2181456B (en) | 1989-10-25 |
Family
ID=25134142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8622272A Expired GB2181456B (en) | 1985-10-07 | 1986-09-16 | Depositing metal films on dielectric substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS62109973A (en) |
DE (1) | DE3631758A1 (en) |
FR (1) | FR2588277B1 (en) |
GB (1) | GB2181456B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0267730B1 (en) * | 1986-11-10 | 1992-03-18 | AT&T Corp. | Tungsten metallization |
DE3730644A1 (en) * | 1987-09-11 | 1989-03-30 | Baeuerle Dieter | METHOD FOR THE PRESENTED STRUCTURED DEPOSITION OF MICROSTRUCTURES WITH LASER LIGHT |
FR2621738B1 (en) * | 1987-10-08 | 1990-02-02 | Mingam Herve | INSULATED METAL GRID FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD |
US4873152A (en) * | 1988-02-17 | 1989-10-10 | Air Products And Chemicals, Inc. | Heat treated chemically vapor deposited products |
US5149672A (en) * | 1988-08-01 | 1992-09-22 | Nadia Lifshitz | Process for fabricating integrated circuits having shallow junctions |
US4999317A (en) * | 1989-09-29 | 1991-03-12 | At&T Bell Laboratories | Metallization processing |
US5084415A (en) * | 1989-10-23 | 1992-01-28 | At&T Bell Laboratories | Metallization processing |
KR940010158B1 (en) * | 1991-07-09 | 1994-10-22 | 한국과학기술연구원 | Tungsten film depositing method using pecvd |
JP3491237B2 (en) * | 1993-09-24 | 2004-01-26 | 日本テキサス・インスツルメンツ株式会社 | Stacked conductive film structure of semiconductor device |
US20090115060A1 (en) | 2007-11-01 | 2009-05-07 | Infineon Technologies Ag | Integrated circuit device and method |
CN110983249A (en) * | 2019-12-25 | 2020-04-10 | 中建材蚌埠玻璃工业设计研究院有限公司 | Preparation method of large-area continuous layered molybdenum sulfide |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR793015A (en) * | 1934-10-16 | 1936-01-15 | Dispersion Cathodique S A | Improvements in cathodic dispersion |
US2387903A (en) * | 1944-03-14 | 1945-10-30 | Mallory & Co Inc P R | Contacting element |
US3477872A (en) * | 1966-09-21 | 1969-11-11 | Rca Corp | Method of depositing refractory metals |
DE2151127C3 (en) * | 1970-12-16 | 1981-04-16 | International Business Machines Corp., 10504 Armonk, N.Y. | Process for depositing a metallization pattern and its application |
US3856647A (en) * | 1973-05-15 | 1974-12-24 | Ibm | Multi-layer control or stress in thin films |
US4234622A (en) * | 1979-04-11 | 1980-11-18 | The United States Of American As Represented By The Secretary Of The Army | Vacuum deposition method |
US4404235A (en) * | 1981-02-23 | 1983-09-13 | Rca Corporation | Method for improving adhesion of metal film on a dielectric surface |
US4404234A (en) * | 1981-12-23 | 1983-09-13 | Bell Telephone Laboratories, Incorporated | Electrode coating process |
-
1986
- 1986-09-16 GB GB8622272A patent/GB2181456B/en not_active Expired
- 1986-09-18 DE DE19863631758 patent/DE3631758A1/en active Granted
- 1986-10-03 FR FR8613803A patent/FR2588277B1/en not_active Expired - Fee Related
- 1986-10-06 JP JP23639386A patent/JPS62109973A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2588277B1 (en) | 1991-08-16 |
JPS62109973A (en) | 1987-05-21 |
GB2181456B (en) | 1989-10-25 |
FR2588277A1 (en) | 1987-04-10 |
DE3631758C2 (en) | 1988-05-19 |
DE3631758A1 (en) | 1987-04-09 |
JPS6248752B2 (en) | 1987-10-15 |
GB2181456A (en) | 1987-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19970916 |