DE3586903D1 - Photolithographisches material mit sperrschichtkombination. - Google Patents

Photolithographisches material mit sperrschichtkombination.

Info

Publication number
DE3586903D1
DE3586903D1 DE8585110019T DE3586903T DE3586903D1 DE 3586903 D1 DE3586903 D1 DE 3586903D1 DE 8585110019 T DE8585110019 T DE 8585110019T DE 3586903 T DE3586903 T DE 3586903T DE 3586903 D1 DE3586903 D1 DE 3586903D1
Authority
DE
Germany
Prior art keywords
photolithographic material
barrier combination
barrier
combination
photolithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585110019T
Other languages
English (en)
Other versions
DE3586903T2 (de
Inventor
Paul Richard West
Gary Charles Davis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu MicroSi Inc
Original Assignee
MicroSi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MicroSi Inc filed Critical MicroSi Inc
Application granted granted Critical
Publication of DE3586903D1 publication Critical patent/DE3586903D1/de
Publication of DE3586903T2 publication Critical patent/DE3586903T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/06—Smoothing; Renovating; Roughening; Matting; Cleaning; Lubricating; Flame-retardant treatments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8585110019T 1984-09-04 1985-08-08 Photolithographisches material mit sperrschichtkombination. Expired - Fee Related DE3586903T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/647,295 US4663275A (en) 1984-09-04 1984-09-04 Photolithographic method and combination including barrier layer

Publications (2)

Publication Number Publication Date
DE3586903D1 true DE3586903D1 (de) 1993-01-28
DE3586903T2 DE3586903T2 (de) 1993-07-08

Family

ID=24596387

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585110019T Expired - Fee Related DE3586903T2 (de) 1984-09-04 1985-08-08 Photolithographisches material mit sperrschichtkombination.

Country Status (6)

Country Link
US (1) US4663275A (de)
EP (1) EP0173881B1 (de)
JP (1) JPS6184644A (de)
KR (1) KR930010219B1 (de)
DE (1) DE3586903T2 (de)
MX (1) MX166536B (de)

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US4804614A (en) * 1984-10-01 1989-02-14 The Aerospace Corporation Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer
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US4784936A (en) * 1985-10-24 1988-11-15 General Electric Company Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
JPS62133444A (ja) * 1985-12-04 1987-06-16 Matsushita Electric Ind Co Ltd パタ−ン形成有機材料
CA1325354C (en) * 1985-12-09 1993-12-21 Yasushi Umeda Photosensitive resin base printing material
EP0239376A3 (de) * 1986-03-27 1988-05-11 Gec-Marconi Limited Photolithographie mit erhöhtem Kontrast
JPH0697341B2 (ja) * 1986-06-06 1994-11-30 松下電器産業株式会社 パタ−ン形成方法
US4816380A (en) * 1986-06-27 1989-03-28 Texas Instruments Incorporated Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
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EP0293704A3 (de) * 1987-06-01 1989-02-15 Hoechst Celanese Corporation Aufzeichnungsmaterial mit einer wasserlöslichen Kontrastverstärkungsschicht
JP2602511B2 (ja) * 1987-10-30 1997-04-23 株式会社日立製作所 パターン形成方法
JPH01129417A (ja) * 1987-11-16 1989-05-22 Oki Electric Ind Co Ltd 半導体素子における微細パターンの形成方法
CA2011927C (en) * 1989-06-02 1996-12-24 Alan Lee Sidman Microlithographic method for producing thick, vertically-walled photoresist patterns
US5240812A (en) * 1990-09-18 1993-08-31 International Business Machines Corporation Top coat for acid catalyzed resists
US5275927A (en) * 1992-07-16 1994-01-04 Minnesota Mining And Manufacturing Company Photothermographic articles containing novel barrier layers
JPH0697065A (ja) * 1992-09-17 1994-04-08 Mitsubishi Electric Corp 微細レジストパターンの形成方法
US5364742A (en) * 1992-09-21 1994-11-15 International Business Machines Corporation Micro-miniature structures and method of fabrication thereof
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
SK160497A3 (en) 1995-06-05 1998-06-03 Kimberly Clark Co Novel pre-dyes
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
AU5535296A (en) 1995-06-28 1997-01-30 Kimberly-Clark Worldwide, Inc. Novel colorants and colorant modifiers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
KR19980701718A (ko) 1995-11-28 1998-06-25 바바라 에이취. 폴 개량된 착색제 안정화제
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
WO1999063006A2 (en) 1998-06-03 1999-12-09 Kimberly-Clark Worldwide, Inc. Neonanoplasts produced by microemulsion technology and inks for ink jet printing
EP1000090A1 (de) 1998-06-03 2000-05-17 Kimberly-Clark Worldwide, Inc. Neue photoinitiatoren und deren anwendung
JP2002520470A (ja) 1998-07-20 2002-07-09 キンバリー クラーク ワールドワイド インコーポレイテッド 改良されたインクジェットインク組成物
EP1117698B1 (de) 1998-09-28 2006-04-19 Kimberly-Clark Worldwide, Inc. Chelate mit chinoiden gruppen als photoinitiatoren
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
US6294317B1 (en) 1999-07-14 2001-09-25 Xerox Corporation Patterned photoresist structures having features with high aspect ratios and method of forming such structures
MXPA02012011A (es) 2000-06-19 2003-04-22 Kimberly Clark Co Fotoiniciaodres novedosos y aplicaciones para los mismos.
US6555234B1 (en) * 2001-02-01 2003-04-29 Advanced Micro Devices, Inc. Barrier for and a method of reducing outgassing from a photoresist material
US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US7667819B2 (en) * 2005-02-17 2010-02-23 Massachusetts Institute Of Technology System and method for contrast enhanced zone plate array lithography
US7432197B2 (en) * 2006-01-27 2008-10-07 Micron Technology, Inc. Methods of patterning photoresist, and methods of forming semiconductor constructions
US9454086B2 (en) * 2011-10-14 2016-09-27 University Of Utah Research Foundation Programmable photolithography
US9017934B2 (en) 2013-03-08 2015-04-28 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist defect reduction system and method
US9110376B2 (en) 2013-03-12 2015-08-18 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist system and method
US9175173B2 (en) 2013-03-12 2015-11-03 Taiwan Semiconductor Manufacturing Company, Ltd. Unlocking layer and method
US9245751B2 (en) 2013-03-12 2016-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Anti-reflective layer and method
US8932799B2 (en) 2013-03-12 2015-01-13 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist system and method
US9543147B2 (en) 2013-03-12 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and method of manufacture
US9354521B2 (en) 2013-03-12 2016-05-31 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist system and method
US9256128B2 (en) 2013-03-12 2016-02-09 Taiwan Semiconductor Manufacturing Company, Ltd. Method for manufacturing semiconductor device
US9502231B2 (en) 2013-03-12 2016-11-22 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist layer and method
US9117881B2 (en) 2013-03-15 2015-08-25 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive line system and process
US9341945B2 (en) 2013-08-22 2016-05-17 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and method of formation and use
US10036953B2 (en) 2013-11-08 2018-07-31 Taiwan Semiconductor Manufacturing Company Photoresist system and method
US10095113B2 (en) 2013-12-06 2018-10-09 Taiwan Semiconductor Manufacturing Company Photoresist and method
US9761449B2 (en) 2013-12-30 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Gap filling materials and methods
US9599896B2 (en) 2014-03-14 2017-03-21 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist system and method
US9581908B2 (en) 2014-05-16 2017-02-28 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and method

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GB1187980A (en) * 1966-10-28 1970-04-15 Ilford Ltd Presensitised Lithographic Plates.
US3652273A (en) * 1967-09-11 1972-03-28 Ibm Process using polyvinyl butral topcoat on photoresist layer
NL7216227A (de) * 1972-11-30 1974-06-04
JPS6052579B2 (ja) * 1978-02-28 1985-11-20 超エル・エス・アイ技術研究組合 ポジ型フオトレジストの密着露光方法
JPS5515155A (en) * 1978-07-19 1980-02-02 Kansai Paint Co Ltd Production of screen printing plate
IE56083B1 (en) * 1982-11-01 1991-04-10 Microsi Inc Aryl nitrones
JPS59104642A (ja) * 1982-11-01 1984-06-16 ハルズ　アメリカ　インコーポレイテッド 集積回路の製法
JPH061373B2 (ja) * 1984-05-14 1994-01-05 株式会社東芝 パタ−ン形成方法
JPS6169130A (ja) * 1984-09-13 1986-04-09 Toshiba Corp パタ−ン形成方法

Also Published As

Publication number Publication date
JPS6184644A (ja) 1986-04-30
KR860002740A (ko) 1986-04-28
US4663275A (en) 1987-05-05
MX166536B (es) 1993-01-14
EP0173881B1 (de) 1992-12-16
EP0173881A2 (de) 1986-03-12
EP0173881A3 (en) 1987-01-07
KR930010219B1 (ko) 1993-10-15
DE3586903T2 (de) 1993-07-08
JPH0543103B2 (de) 1993-06-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee