DE3573139D1 - Electroless copper plating bath and plating method using such bath - Google Patents
Electroless copper plating bath and plating method using such bathInfo
- Publication number
- DE3573139D1 DE3573139D1 DE8585105723T DE3573139T DE3573139D1 DE 3573139 D1 DE3573139 D1 DE 3573139D1 DE 8585105723 T DE8585105723 T DE 8585105723T DE 3573139 T DE3573139 T DE 3573139T DE 3573139 D1 DE3573139 D1 DE 3573139D1
- Authority
- DE
- Germany
- Prior art keywords
- bath
- plating
- electroless copper
- copper plating
- plating method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 title 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title 1
- 229910052802 copper Inorganic materials 0.000 title 1
- 239000010949 copper Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61127884A | 1984-05-17 | 1984-05-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3573139D1 true DE3573139D1 (en) | 1989-10-26 |
Family
ID=24448389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8585105723T Expired DE3573139D1 (en) | 1984-05-17 | 1985-05-10 | Electroless copper plating bath and plating method using such bath |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0164580B1 (enrdf_load_html_response) |
| JP (1) | JPS60245783A (enrdf_load_html_response) |
| DE (1) | DE3573139D1 (enrdf_load_html_response) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4654126A (en) * | 1985-10-07 | 1987-03-31 | International Business Machines Corporation | Process for determining the plating activity of an electroless plating bath |
| AU579776B2 (en) * | 1986-11-06 | 1988-12-08 | Nippondenso Co. Ltd. | Electroless copper plating solution and process for electrolessly plating copper |
| JPH0723539B2 (ja) * | 1986-11-06 | 1995-03-15 | 日本電装株式会社 | 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法 |
| US4814009A (en) * | 1986-11-14 | 1989-03-21 | Nippondenso Co., Ltd. | Electroless copper plating solution |
| JP2595319B2 (ja) * | 1988-07-20 | 1997-04-02 | 日本電装株式会社 | 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法 |
| JPH02161130A (ja) * | 1988-12-15 | 1990-06-21 | Hino Motors Ltd | ターボチャージャーの制御装置 |
| US5965211A (en) * | 1989-12-29 | 1999-10-12 | Nippondenso Co., Ltd. | Electroless copper plating solution and process for formation of copper film |
| WO2005038086A1 (ja) * | 2003-10-17 | 2005-04-28 | Nikko Materials Co., Ltd. | 無電解銅めっき液 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1530167A (fr) * | 1967-07-03 | 1968-06-21 | Shipley Co | Composition et procédé pour le dépôt chimique non électrolytique de cuivre sur des objets à surface catalytique |
-
1985
- 1985-01-14 JP JP340985A patent/JPS60245783A/ja active Granted
- 1985-05-10 DE DE8585105723T patent/DE3573139D1/de not_active Expired
- 1985-05-10 EP EP19850105723 patent/EP0164580B1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0164580A3 (en) | 1986-12-30 |
| JPH0214430B2 (enrdf_load_html_response) | 1990-04-09 |
| EP0164580A2 (en) | 1985-12-18 |
| JPS60245783A (ja) | 1985-12-05 |
| EP0164580B1 (en) | 1989-09-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |