DE3483201D1 - Positiv-photolackentschichtungsmittel. - Google Patents
Positiv-photolackentschichtungsmittel.Info
- Publication number
- DE3483201D1 DE3483201D1 DE8484113854T DE3483201T DE3483201D1 DE 3483201 D1 DE3483201 D1 DE 3483201D1 DE 8484113854 T DE8484113854 T DE 8484113854T DE 3483201 T DE3483201 T DE 3483201T DE 3483201 D1 DE3483201 D1 DE 3483201D1
- Authority
- DE
- Germany
- Prior art keywords
- chem
- formula
- cycloalkyl
- piperazine
- photocolour
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
- Saccharide Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56333683A | 1983-12-20 | 1983-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3483201D1 true DE3483201D1 (de) | 1990-10-18 |
Family
ID=24250099
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484113854T Expired - Fee Related DE3483201D1 (de) | 1983-12-20 | 1984-11-16 | Positiv-photolackentschichtungsmittel. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0145973B1 (de) |
JP (1) | JPS60131535A (de) |
KR (1) | KR860001841B1 (de) |
AT (1) | ATE56546T1 (de) |
CA (1) | CA1240907A (de) |
DE (1) | DE3483201D1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6250831A (ja) * | 1985-08-30 | 1987-03-05 | Japan Synthetic Rubber Co Ltd | レジスト用剥離液組成物 |
DE3537441A1 (de) * | 1985-10-22 | 1987-04-23 | Hoechst Ag | Loesemittel zum entfernen von photoresists |
IE59971B1 (en) * | 1986-11-10 | 1994-05-04 | Baker J T Inc | Stripping compositions and their use for stripping resists from substrates |
US4824763A (en) * | 1987-07-30 | 1989-04-25 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and prebaking process |
JP2759462B2 (ja) * | 1988-11-11 | 1998-05-28 | ナガセ電子化学株式会社 | 水性剥離剤組成物 |
US6127101A (en) * | 1999-10-12 | 2000-10-03 | Air Products And Chemicals, Inc. | Alkylated aminoalkylpiperazine surfactants and their use in photoresist developers |
JP2002244310A (ja) * | 2001-02-21 | 2002-08-30 | Tosoh Corp | レジスト剥離剤 |
CN1950755B (zh) * | 2004-05-07 | 2011-05-11 | 株式会社东进世美肯 | 用于去除光刻胶的组合物 |
KR101082018B1 (ko) * | 2004-05-07 | 2011-11-10 | 주식회사 동진쎄미켐 | 레지스트 제거용 조성물 |
KR101136026B1 (ko) | 2004-09-24 | 2012-04-18 | 주식회사 동진쎄미켐 | 포토레지스트용 박리제 및 상기 박리제를 이용한 박막트랜지스터 표시판의 제조 방법 |
WO2011065603A1 (ko) * | 2009-11-26 | 2011-06-03 | 주식회사 엘지화학 | 포토레지스트 스트리퍼 조성물 및 이를 이용한 포토레지스트 박리방법 |
TWI405053B (zh) * | 2009-11-27 | 2013-08-11 | Lg Chemical Ltd | 光阻剝離組成物及剝離光阻之方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4090879A (en) * | 1976-11-15 | 1978-05-23 | Gaf Corporation | Developing solutions for 2-component diazo-type materials |
US4395479A (en) * | 1981-09-23 | 1983-07-26 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
US4428871A (en) * | 1981-09-23 | 1984-01-31 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
-
1984
- 1984-05-02 JP JP59089197A patent/JPS60131535A/ja active Granted
- 1984-11-16 DE DE8484113854T patent/DE3483201D1/de not_active Expired - Fee Related
- 1984-11-16 EP EP84113854A patent/EP0145973B1/de not_active Expired - Lifetime
- 1984-11-16 AT AT84113854T patent/ATE56546T1/de not_active IP Right Cessation
- 1984-12-10 CA CA000469694A patent/CA1240907A/en not_active Expired
- 1984-12-20 KR KR1019840008148A patent/KR860001841B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR850004806A (ko) | 1985-07-27 |
EP0145973B1 (de) | 1990-09-12 |
CA1240907A (en) | 1988-08-23 |
ATE56546T1 (de) | 1990-09-15 |
EP0145973A2 (de) | 1985-06-26 |
EP0145973A3 (en) | 1986-09-17 |
JPS60131535A (ja) | 1985-07-13 |
JPH0413706B2 (de) | 1992-03-10 |
KR860001841B1 (ko) | 1986-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |