DE3411208C2 - Haltevorrichtung für Substrate, insbesondere in Vakuum-Beschichtungsanlagen - Google Patents
Haltevorrichtung für Substrate, insbesondere in Vakuum-BeschichtungsanlagenInfo
- Publication number
- DE3411208C2 DE3411208C2 DE3411208A DE3411208A DE3411208C2 DE 3411208 C2 DE3411208 C2 DE 3411208C2 DE 3411208 A DE3411208 A DE 3411208A DE 3411208 A DE3411208 A DE 3411208A DE 3411208 C2 DE3411208 C2 DE 3411208C2
- Authority
- DE
- Germany
- Prior art keywords
- recess
- plate
- substrate
- groove
- radius
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 55
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 5
- 238000003780 insertion Methods 0.000 claims abstract description 10
- 230000037431 insertion Effects 0.000 claims abstract description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000005291 magnetic effect Effects 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Classifications
- 
        - C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
 
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| DE3411208A DE3411208C2 (de) | 1984-03-27 | 1984-03-27 | Haltevorrichtung für Substrate, insbesondere in Vakuum-Beschichtungsanlagen | 
| GB08506702A GB2156861B (en) | 1984-03-27 | 1985-03-15 | Holder device for substrates in vaccum deposition apparatus | 
| US06/714,098 US4589369A (en) | 1984-03-27 | 1985-03-20 | Device for holding a substrate | 
| FR8504564A FR2562094B1 (fr) | 1984-03-27 | 1985-03-27 | Dispositif de fixation de substrats, en particulier dans des equipements de depot par evaporation sous vide | 
| JP60061064A JPS616274A (ja) | 1984-03-27 | 1985-03-27 | 基板用の保持装置 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| DE3411208A DE3411208C2 (de) | 1984-03-27 | 1984-03-27 | Haltevorrichtung für Substrate, insbesondere in Vakuum-Beschichtungsanlagen | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| DE3411208A1 DE3411208A1 (de) | 1985-10-10 | 
| DE3411208C2 true DE3411208C2 (de) | 1987-01-29 | 
Family
ID=6231725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| DE3411208A Expired DE3411208C2 (de) | 1984-03-27 | 1984-03-27 | Haltevorrichtung für Substrate, insbesondere in Vakuum-Beschichtungsanlagen | 
Country Status (5)
| Country | Link | 
|---|---|
| US (1) | US4589369A (OSRAM) | 
| JP (1) | JPS616274A (OSRAM) | 
| DE (1) | DE3411208C2 (OSRAM) | 
| FR (1) | FR2562094B1 (OSRAM) | 
| GB (1) | GB2156861B (OSRAM) | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| DE20116824U1 (de) | 2001-09-21 | 2002-01-31 | Henrich, Dieter, 63329 Egelsbach | Vorrichtung zur Handhabung von Gegenständen, wie Linsen | 
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS55156262A (en) * | 1979-05-25 | 1980-12-05 | Nissan Motor Co Ltd | Ignition lead angle controller | 
| JPS5677557A (en) * | 1979-11-30 | 1981-06-25 | Hitachi Ltd | Ignition device | 
| US4595481A (en) * | 1984-08-21 | 1986-06-17 | Komag, Inc. | Disk carrier | 
| DE3606152A1 (de) * | 1986-02-26 | 1987-08-27 | Basf Ag | Halterung fuer substratplatten auf traegerplatten | 
| JPS63127972U (OSRAM) * | 1987-02-16 | 1988-08-22 | ||
| JPH0198165U (OSRAM) * | 1987-12-18 | 1989-06-30 | ||
| US4944860A (en) * | 1988-11-04 | 1990-07-31 | Eaton Corporation | Platen assembly for a vacuum processing system | 
| US5074736A (en) * | 1988-12-20 | 1991-12-24 | Texas Instruments Incorporated | Semiconductor wafer carrier design | 
| US5042423A (en) * | 1988-12-20 | 1991-08-27 | Texas Instruments Incorporated | Semiconductor wafer carrier design | 
| US5169453A (en) * | 1989-03-20 | 1992-12-08 | Toyoko Kagaku Co., Ltd. | Wafer supporting jig and a decompressed gas phase growth method using such a jig | 
| US4880518A (en) * | 1989-03-27 | 1989-11-14 | Intelmatec Corporation | Disk carrier | 
| US5089110A (en) * | 1990-07-30 | 1992-02-18 | Komag, Incorporated | Data storage disk and plug | 
| CA2076701C (en) * | 1991-08-26 | 1997-12-23 | Sunghee Yoon | Flow-inducing panels for electroless copper plating of complex assemblies | 
| US5244555A (en) * | 1991-11-27 | 1993-09-14 | Komag, Inc. | Floating pocket memory disk carrier, memory disk and method | 
| JP3433760B2 (ja) * | 1993-05-14 | 2003-08-04 | ソニー株式会社 | 光ディスクの保護膜機 | 
| JP4059549B2 (ja) * | 1997-09-20 | 2008-03-12 | キヤノンアネルバ株式会社 | 基板支持装置 | 
| JP2005215216A (ja) * | 2004-01-28 | 2005-08-11 | Kyocera Kinseki Corp | 光学用部品の基板の蒸着ジグ | 
| US8211230B2 (en) * | 2005-01-18 | 2012-07-03 | Asm America, Inc. | Reaction system for growing a thin film | 
| KR102353238B1 (ko) * | 2017-01-23 | 2022-01-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판들을 위한 홀더 | 
| US10872803B2 (en) | 2017-11-03 | 2020-12-22 | Asm Ip Holding B.V. | Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination | 
| US10872804B2 (en) | 2017-11-03 | 2020-12-22 | Asm Ip Holding B.V. | Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination | 
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US4247781A (en) * | 1979-06-29 | 1981-01-27 | International Business Machines Corporation | Cooled target disc for high current ion implantation method and apparatus | 
| CH652754A5 (de) * | 1981-03-13 | 1985-11-29 | Balzers Hochvakuum | Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage. | 
- 
        1984
        - 1984-03-27 DE DE3411208A patent/DE3411208C2/de not_active Expired
 
- 
        1985
        - 1985-03-15 GB GB08506702A patent/GB2156861B/en not_active Expired
- 1985-03-20 US US06/714,098 patent/US4589369A/en not_active Expired - Fee Related
- 1985-03-27 JP JP60061064A patent/JPS616274A/ja active Granted
- 1985-03-27 FR FR8504564A patent/FR2562094B1/fr not_active Expired
 
Non-Patent Citations (1)
| Title | 
|---|
| NICHTS-ERMITTELT | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| DE20116824U1 (de) | 2001-09-21 | 2002-01-31 | Henrich, Dieter, 63329 Egelsbach | Vorrichtung zur Handhabung von Gegenständen, wie Linsen | 
Also Published As
| Publication number | Publication date | 
|---|---|
| GB2156861B (en) | 1987-10-14 | 
| FR2562094B1 (fr) | 1988-08-05 | 
| GB8506702D0 (en) | 1985-04-17 | 
| US4589369A (en) | 1986-05-20 | 
| DE3411208A1 (de) | 1985-10-10 | 
| JPS616274A (ja) | 1986-01-11 | 
| GB2156861A (en) | 1985-10-16 | 
| FR2562094A1 (fr) | 1985-10-04 | 
| JPH033744B2 (OSRAM) | 1991-01-21 | 
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Legal Events
| Date | Code | Title | Description | 
|---|---|---|---|
| OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner | Owner name: LEYBOLD AG, 6450 HANAU, DE | |
| 8339 | Ceased/non-payment of the annual fee |