DE3375028D1 - Apparatus for plasma chemical vapour deposition - Google Patents

Apparatus for plasma chemical vapour deposition

Info

Publication number
DE3375028D1
DE3375028D1 DE8383302990T DE3375028T DE3375028D1 DE 3375028 D1 DE3375028 D1 DE 3375028D1 DE 8383302990 T DE8383302990 T DE 8383302990T DE 3375028 T DE3375028 T DE 3375028T DE 3375028 D1 DE3375028 D1 DE 3375028D1
Authority
DE
Germany
Prior art keywords
vapour deposition
chemical vapour
plasma chemical
plasma
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383302990T
Other languages
English (en)
Inventor
Yoshimi Shioya
Mikio Takagi
Mamoru Maeda
Yasushi Ohyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3375028D1 publication Critical patent/DE3375028D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
DE8383302990T 1982-05-28 1983-05-24 Apparatus for plasma chemical vapour deposition Expired DE3375028D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57090678A JPS591671A (ja) 1982-05-28 1982-05-28 プラズマｃｖｄ装置

Publications (1)

Publication Number Publication Date
DE3375028D1 true DE3375028D1 (en) 1988-02-04

Family

ID=14005190

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383302990T Expired DE3375028D1 (en) 1982-05-28 1983-05-24 Apparatus for plasma chemical vapour deposition

Country Status (4)

Country Link
US (1) US4625678A (de)
EP (1) EP0095887B2 (de)
JP (1) JPS591671A (de)
DE (1) DE3375028D1 (de)

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EP0095887A1 (de) 1983-12-07
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EP0095887B2 (de) 1991-08-28
US4625678A (en) 1986-12-02

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