DE3371838D1 - Method of making a display comprising thin-film transistors and capacitors - Google Patents
Method of making a display comprising thin-film transistors and capacitorsInfo
- Publication number
- DE3371838D1 DE3371838D1 DE8383401775T DE3371838T DE3371838D1 DE 3371838 D1 DE3371838 D1 DE 3371838D1 DE 8383401775 T DE8383401775 T DE 8383401775T DE 3371838 T DE3371838 T DE 3371838T DE 3371838 D1 DE3371838 D1 DE 3371838D1
- Authority
- DE
- Germany
- Prior art keywords
- capacitors
- thin
- display
- making
- film transistors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003990 capacitor Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/13—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body combined with thin-film or thick-film passive components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/7866—Non-monocrystalline silicon transistors
- H01L29/78663—Amorphous silicon transistors
- H01L29/78666—Amorphous silicon transistors with normal-type structure, e.g. with top gate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/10—Materials and properties semiconductor
- G02F2202/103—Materials and properties semiconductor a-Si
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8215499A FR2533072B1 (fr) | 1982-09-14 | 1982-09-14 | Procede de fabrication de circuits electroniques a base de transistors en couches minces et de condensateurs |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3371838D1 true DE3371838D1 (en) | 1987-07-02 |
Family
ID=9277431
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383401775T Expired DE3371838D1 (en) | 1982-09-14 | 1983-09-12 | Method of making a display comprising thin-film transistors and capacitors |
Country Status (7)
Country | Link |
---|---|
US (1) | US4563806A (de) |
EP (1) | EP0103523B1 (de) |
JP (1) | JPS59501562A (de) |
CA (1) | CA1224262A (de) |
DE (1) | DE3371838D1 (de) |
FR (1) | FR2533072B1 (de) |
WO (1) | WO1984001239A1 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5123847A (en) * | 1983-05-11 | 1992-06-23 | Holmberg Scott H | Method of manufacturing flat panel backplanes, display transistors |
FR2571913B1 (fr) * | 1984-10-17 | 1986-12-26 | Richard Joseph | Ecran d'affichage a matrice active a double transistor d'adressage |
DE3567770D1 (en) * | 1984-10-17 | 1989-02-23 | France Etat | Method for producing electronic circuits based on thin layers transistors and capacitors |
JPS61138285A (ja) * | 1984-12-10 | 1986-06-25 | ホシデン株式会社 | 液晶表示素子 |
FR2579806B1 (fr) * | 1985-03-26 | 1987-05-07 | Morin Francois | Procede de fabrication d'un ecran d'affichage a cristaux liquides et a reseau de diodes |
JPH0740101B2 (ja) * | 1985-04-23 | 1995-05-01 | 旭硝子株式会社 | 薄膜トランジスタ |
FR2586859B1 (fr) * | 1985-08-27 | 1987-11-20 | Thomson Csf | Procede de fabrication d'un transistor de commande pour ecran plat de visualisation et element de commande realise selon ce procede |
JPS61160428U (de) * | 1985-10-28 | 1986-10-04 | ||
FR2590406B1 (fr) * | 1985-11-15 | 1988-10-28 | Commissariat Energie Atomique | Procede de fabrication d'un transistor en couches minces a grille auto-alignee par rapport au drain et a la source de celui-ci |
FR2593327B1 (fr) * | 1986-01-23 | 1988-10-28 | Commissariat Energie Atomique | Procede de fabrication d'un transistor en couches minces utilisant deux ou trois niveaux de masquage |
FR2593632B1 (fr) * | 1986-01-27 | 1988-03-18 | Maurice Francois | Ecran d'affichage a matrice active et procedes de realisation de cet ecran |
FR2593631B1 (fr) * | 1986-01-27 | 1989-02-17 | Maurice Francois | Ecran d'affichage a matrice active a resistance de grille et procedes de fabrication de cet ecran |
FR2593629B1 (fr) * | 1986-01-27 | 1988-03-18 | Maurice Francois | Ecran d'affichage a matrice active et a redondance lignes et colonnes |
FR2593630B1 (fr) * | 1986-01-27 | 1988-03-18 | Maurice Francois | Ecran d'affichage a matrice active a resistance de drain et procedes de fabrication de cet ecran |
FR2602361B1 (fr) * | 1986-01-27 | 1989-05-19 | Maurice Francois | Ecran d'affichage a matrice active sans transistor parasite et procede de fabrication de cet ecran |
US4704783A (en) * | 1986-05-05 | 1987-11-10 | General Electric Company | Method for passivating the back channel of amorphous silicon field effect transistors |
FR2601801B1 (fr) * | 1986-07-16 | 1988-09-16 | Morin Francois | Ecran d'affichage a matrice active utilisant du carbure de silicium amorphe hydrogene et procede de fabrication de cet ecran |
FR2605442B1 (fr) * | 1986-10-17 | 1988-12-09 | Thomson Csf | Ecran de visualisation electrooptique a transistors de commande et procede de realisation |
FR2605438B1 (fr) * | 1986-10-17 | 1989-12-15 | Maurice Francois | Ecran d'affichage a cristaux liquides concu pour eliminer les defauts dus aux espaceurs |
US4803536A (en) * | 1986-10-24 | 1989-02-07 | Xerox Corporation | Electrostatic discharge protection network for large area transducer arrays |
JP2501118B2 (ja) * | 1988-06-17 | 1996-05-29 | 忠弘 大見 | 半導体装置の製造方法 |
FR2640809B1 (fr) * | 1988-12-19 | 1993-10-22 | Chouan Yannick | Procede de gravure d'une couche d'oxyde metallique et depot simultane d'un film de polymere, application de ce procede a la fabrication d'un transistor |
US5148333A (en) * | 1988-12-21 | 1992-09-15 | Sony Corp. | Method for recording and/or reproducing a signal |
DE68921591T2 (de) * | 1988-12-28 | 1995-11-09 | Sony Corp | Flüssigkristall-Anzeigevorrichtung. |
US4968119A (en) * | 1989-01-10 | 1990-11-06 | David Sarnoff Research Center, Inc. | High-density liquid-crystal active dot-matrix display structure |
FR2662290B1 (fr) * | 1990-05-15 | 1992-07-24 | France Telecom | Procede de realisation d'un ecran d'affichage a matrice active et a condensateurs de stockage et ecran obtenu par ce procede. |
JPH0772510A (ja) * | 1993-09-07 | 1995-03-17 | Hitachi Ltd | アクティブマトリクス型液晶表示装置 |
US5546204A (en) * | 1994-05-26 | 1996-08-13 | Honeywell Inc. | TFT matrix liquid crystal device having data source lines and drain means of etched and doped single crystal silicon |
FR2721428B1 (fr) | 1994-06-17 | 1996-09-13 | France Telecom | Ecran d'affichage à matrice active à commande multiplexée. |
US5691782A (en) * | 1994-07-08 | 1997-11-25 | Sanyo Electric Co., Ltd. | Liquid-crystal display with inter-line short-circuit preventive function and process for producing same |
TW347477B (en) * | 1994-09-30 | 1998-12-11 | Sanyo Electric Co | Liquid crystal display with storage capacitors for holding electric charges |
US5777703A (en) * | 1994-09-30 | 1998-07-07 | Sanyo Electric Co., Ltd. | Active matrix type liquid crystal display apparatus with a projection part in the drain line |
JP3081474B2 (ja) * | 1994-11-11 | 2000-08-28 | 三洋電機株式会社 | 液晶表示装置 |
FR2732781B1 (fr) * | 1995-04-07 | 1997-06-20 | Thomson Lcd | Procede de fabrication de matrice active tft pour ecran de systeme de projection |
JPH09318975A (ja) * | 1996-05-30 | 1997-12-12 | Nec Corp | 薄膜電界効果型トランジスタ素子アレイおよびその製造 方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4024626A (en) * | 1974-12-09 | 1977-05-24 | Hughes Aircraft Company | Method of making integrated transistor matrix for flat panel liquid crystal display |
US4188095A (en) * | 1975-07-29 | 1980-02-12 | Citizen Watch Co., Ltd. | Liquid type display cells and method of manufacturing the same |
US4167806A (en) * | 1976-09-28 | 1979-09-18 | Commissariat A L'energie Atomique | Method of fabrication of an amorphous semiconductor device on a substrate |
JPS54154289A (en) * | 1978-05-26 | 1979-12-05 | Matsushita Electric Ind Co Ltd | Manufacture of thin-film transistor array |
FR2478879A1 (fr) * | 1980-03-24 | 1981-09-25 | Commissariat Energie Atomique | Procede de realisation de dispositifs a effet memoire a semi-conducteurs amorphes |
JPS56162793A (en) * | 1980-05-19 | 1981-12-14 | Canon Kk | Display unit |
JPS56161676A (en) * | 1980-05-16 | 1981-12-12 | Japan Electronic Ind Dev Assoc<Jeida> | Electrode structure for thin film transistor |
US4335161A (en) * | 1980-11-03 | 1982-06-15 | Xerox Corporation | Thin film transistors, thin film transistor arrays, and a process for preparing the same |
FR2518810A1 (fr) * | 1981-12-23 | 1983-06-24 | Morin Francois | Procede de fabrication de transistors en couches minces en silicium sur substrat isolant |
-
1982
- 1982-09-14 FR FR8215499A patent/FR2533072B1/fr not_active Expired
-
1983
- 1983-09-12 EP EP83401775A patent/EP0103523B1/de not_active Expired
- 1983-09-12 US US06/610,490 patent/US4563806A/en not_active Expired - Lifetime
- 1983-09-12 WO PCT/FR1983/000177 patent/WO1984001239A1/fr unknown
- 1983-09-12 DE DE8383401775T patent/DE3371838D1/de not_active Expired
- 1983-09-12 JP JP58502888A patent/JPS59501562A/ja active Pending
- 1983-09-14 CA CA000436727A patent/CA1224262A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS59501562A (ja) | 1984-08-30 |
WO1984001239A1 (fr) | 1984-03-29 |
EP0103523A1 (de) | 1984-03-21 |
CA1224262A (fr) | 1987-07-14 |
FR2533072A1 (fr) | 1984-03-16 |
FR2533072B1 (fr) | 1986-07-18 |
EP0103523B1 (de) | 1987-05-27 |
US4563806A (en) | 1986-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FRANCE TELECOM, PARIS, FR |
|
8328 | Change in the person/name/address of the agent |
Free format text: GRUENECKER, A., DIPL.-ING. KINKELDEY, H., DIPL.-ING. DR.-ING. STOCKMAIR, W., DIPL.-ING. DR.-ING. AE.E. CAL TECH SCHUMANN, K., DIPL.-PHYS. DR.RER.NAT. JAKOB, P., DIPL.-ING. BEZOLD, G., DIPL.-CHEM. DR.RER.NAT. MEISTER, W., DIPL.-ING. HILGERS, H., DIPL.-ING. MEYER-PLATH, H., DIPL.-ING. DR.-ING. EHNOLD, A., DIPL.-ING. SCHUSTER, T., DIPL.-PHYS. GOLDBACH, K., DIPL.-ING.DR.-ING. AUFENANGER, M., DIPL.-ING. KLITZSCH, G., DIPL.-ING. VOGELSANG-WENKE, H., DIPL.-CHEM. DIPL.-BIOL.UNIV. DR.RER.NAT., PAT.-ANWAE |
|
8381 | Inventor (new situation) |
Free format text: COISSARD, PIERRE, LANNION, FR RICHARD, JOSEPH, LANNION, FR MORIN, FRANCOIS, LANNION, FR |