DE3331175C2 - Verfahren und Vorrichtung zur interferometrischen Bestimmung der Dicke eines transparenten Gegenstandes - Google Patents
Verfahren und Vorrichtung zur interferometrischen Bestimmung der Dicke eines transparenten GegenstandesInfo
- Publication number
- DE3331175C2 DE3331175C2 DE3331175A DE3331175A DE3331175C2 DE 3331175 C2 DE3331175 C2 DE 3331175C2 DE 3331175 A DE3331175 A DE 3331175A DE 3331175 A DE3331175 A DE 3331175A DE 3331175 C2 DE3331175 C2 DE 3331175C2
- Authority
- DE
- Germany
- Prior art keywords
- interference
- mirror
- film
- measuring
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 10
- 238000005259 measurement Methods 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 11
- 239000012528 membrane Substances 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 2
- 230000002452 interceptive effect Effects 0.000 claims 2
- 238000006073 displacement reaction Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 43
- 239000002985 plastic film Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 229920006255 plastic film Polymers 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000011326 mechanical measurement Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI823028A FI823028A0 (fi) | 1982-09-01 | 1982-09-01 | Foerfarande foer maetning av korta straeckor med en interferometer som utnyttjar icke-koherent ljus, samt foer utfoerande av foerfarandet avsedd interferometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3331175A1 DE3331175A1 (de) | 1984-03-01 |
| DE3331175C2 true DE3331175C2 (de) | 1995-11-30 |
Family
ID=8515980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3331175A Expired - Fee Related DE3331175C2 (de) | 1982-09-01 | 1983-08-30 | Verfahren und Vorrichtung zur interferometrischen Bestimmung der Dicke eines transparenten Gegenstandes |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4647205A (enExample) |
| JP (1) | JPS59131106A (enExample) |
| DE (1) | DE3331175C2 (enExample) |
| FI (1) | FI823028A0 (enExample) |
| FR (1) | FR2532415B1 (enExample) |
| GB (1) | GB2126338B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6176902A (ja) * | 1984-09-25 | 1986-04-19 | Yamazaki Mazak Corp | 非接触形プロ−ブ |
| US4958931A (en) * | 1989-04-14 | 1990-09-25 | Litton Systems, Inc. | System utilizing an achromatic null lens for correcting aberrations in a spherical wavefront |
| DE3917556A1 (de) * | 1989-05-30 | 1990-12-06 | Oskar Hubert Richt | Sensor zur erfassung der membranbewegung eines lautsprechers |
| DE68925212T2 (de) * | 1989-06-30 | 1996-05-15 | Renishaw Plc | Verfahren und vorrichtung zur determination des oberflächenprofils von diffus-reflektierenden objekten |
| EP0480027A4 (en) * | 1989-06-30 | 1993-06-09 | Nauchno-Proizvodstvenny Kooperativ "Fokon" | Method and device for determining the thickness of a glass tube |
| DE4110230A1 (de) * | 1991-03-28 | 1992-10-01 | Zeiss Carl Fa | Vorrichtung zur interferometrischen messung der dicke einer transparenten schicht |
| US5418612A (en) * | 1992-02-27 | 1995-05-23 | Renishaw, Plc | Method of and apparatus for determining surface contour of diffusely reflecting objects |
| US5633712A (en) * | 1995-08-28 | 1997-05-27 | Hewlett-Packard Company | Method and apparatus for determining the thickness and index of refraction of a film using low coherence reflectometry and a reference surfaces |
| DE10148919A1 (de) * | 2001-10-04 | 2003-04-10 | Philips Corp Intellectual Pty | Verfahren und Vorrichtung zur Ortung bewegter Gegenstände |
| US20060091294A1 (en) * | 2004-10-29 | 2006-05-04 | Michael Frank | Apparatus and method for interference suppression in optical or radiation sensors |
| RU2313066C1 (ru) * | 2006-03-24 | 2007-12-20 | Петр Витальевич Волков | Интерферометрический способ измерения толщины и показателя преломления прозрачных объектов |
| JP4939304B2 (ja) * | 2007-05-24 | 2012-05-23 | 東レエンジニアリング株式会社 | 透明膜の膜厚測定方法およびその装置 |
| EP2571655B1 (en) * | 2010-05-18 | 2014-04-23 | Marposs Societa' Per Azioni | Method and apparatus for optically measuring by interferometry the thickness of an object |
| DE102020133404A1 (de) | 2020-12-14 | 2022-06-15 | NoKra Optische Prüftechnik und Automation GmbH | Abstandsmessung |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3319515A (en) * | 1963-08-27 | 1967-05-16 | Du Pont | Interferometric optical phase discrimination apparatus |
| US3563663A (en) * | 1966-07-13 | 1971-02-16 | Barringer Research Ltd | Analysis of spectra by correlation of interference patterns |
| US3768910A (en) * | 1972-05-25 | 1973-10-30 | Zygo Corp | Detecting the position of a surface by focus modulating the illuminating beam |
| JPS5413133B2 (enExample) * | 1973-05-24 | 1979-05-29 | ||
| DE2851750B1 (de) * | 1978-11-30 | 1980-03-06 | Ibm Deutschland | Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche |
| US4293224A (en) * | 1978-12-04 | 1981-10-06 | International Business Machines Corporation | Optical system and technique for unambiguous film thickness monitoring |
| US4355903A (en) * | 1980-02-08 | 1982-10-26 | Rca Corporation | Thin film thickness monitor |
-
1982
- 1982-09-01 FI FI823028A patent/FI823028A0/fi not_active Application Discontinuation
-
1983
- 1983-08-30 GB GB08323179A patent/GB2126338B/en not_active Expired
- 1983-08-30 DE DE3331175A patent/DE3331175C2/de not_active Expired - Fee Related
- 1983-08-31 FR FR8313954A patent/FR2532415B1/fr not_active Expired
- 1983-08-31 US US06/527,958 patent/US4647205A/en not_active Expired - Lifetime
- 1983-09-01 JP JP58161175A patent/JPS59131106A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| US4647205A (en) | 1987-03-03 |
| GB2126338B (en) | 1986-02-05 |
| GB2126338A (en) | 1984-03-21 |
| FR2532415B1 (fr) | 1987-03-27 |
| DE3331175A1 (de) | 1984-03-01 |
| GB8323179D0 (en) | 1983-09-28 |
| FI823028A0 (fi) | 1982-09-01 |
| FR2532415A1 (fr) | 1984-03-02 |
| JPS59131106A (ja) | 1984-07-27 |
| JPH0423202B2 (enExample) | 1992-04-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3331175C2 (de) | Verfahren und Vorrichtung zur interferometrischen Bestimmung der Dicke eines transparenten Gegenstandes | |
| EP0011708B1 (de) | Verfahren und Vorrichtung zur Messung der Ebenheit, der Rauhigkeit oder des Krümmungsradius einer Messfläche | |
| EP0011723B1 (de) | Verfahren und Einrichtung zur interferometrischen Messung von sich ändernden Schichtdicken | |
| DE102008029459B4 (de) | Verfahren und Vorrichtung zur berührungslosen Abstandsmessung | |
| DE60103482T2 (de) | Lichtinterferenz | |
| DE1447253B2 (de) | Verfahren und vorrichtung zur kontinuierlichen interferometriscverfahren und vorrichtung zur kontinuierlichen interferometrisc | |
| EP0561015A1 (de) | Interferometrische Phasenmessung | |
| DE2533906A1 (de) | Beruehrungslose oberflaechen-pruefvorrichtung | |
| AT390325B (de) | Interferometrische einrichtung zur messung von lageaenderungen eines beweglichen bauteiles | |
| EP0623801B1 (de) | Interferometrisches Messverfahren für Absolutmessungen sowie dafür geeignete Laserinterferometeranordnung | |
| DE102012001754A1 (de) | Mehrskalige Distanzmessung mit Frequenzkämmen | |
| EP0075032B1 (de) | Verfahren zur interferometrischen Oberflächentopographie | |
| DE2904836C2 (enExample) | ||
| DE4403021C2 (de) | Luftrefraktometer hoher Genauigkeit | |
| DE3606090C2 (de) | Meßvorrichtung zum Messen kleinster Verschiebebeträge | |
| WO2011095145A1 (de) | Messgerät zum messen zumindest einer positionsänderung und/oder zumindest einer winkeländerung und ein verfahren zum dynamischen messen zumindest einer positionsänderung und/oder einer winkeländerung | |
| DE3751180T2 (de) | Abbildender Kohärenzmesser. | |
| DE4233336C2 (de) | Verfahren und Vorrichtung zur Detektion von Fokusablagen | |
| DE102010062842B4 (de) | Verfahren und Vorrichtung zur Bestimmung der absoluten Position eines Objekts | |
| DE2701858A1 (de) | Messverfahren und -vorrichtung fuer abstandsaenderungen | |
| WO2006039820A1 (de) | Verfahren und messgerät zur messung eines absolutdistanzwertes | |
| EP4048978A1 (de) | Vorrichtung und verfahren zur profilmessung von flachen objekten mit unbekannten materialien | |
| DE69126918T2 (de) | Messverfahren des Einfallwinkels eines Lichtstrahls, Vorrichtung zur Durchführung des Verfahrens sowie deren Verwendung zur Entfernungsmessung | |
| DE10204943A1 (de) | Verfahren zur Bestimmung von Schichtdicken | |
| DE10119072C1 (de) | Reflektometeranordnung und Verfahren zur Bestimmung des Reflexionsvermögens ausgewählter Messorte von spektral abhängig reflektierenden Messobjekten |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |