DE3274156D1 - Photosensitive polymer composition - Google Patents
Photosensitive polymer compositionInfo
- Publication number
- DE3274156D1 DE3274156D1 DE8282306513T DE3274156T DE3274156D1 DE 3274156 D1 DE3274156 D1 DE 3274156D1 DE 8282306513 T DE8282306513 T DE 8282306513T DE 3274156 T DE3274156 T DE 3274156T DE 3274156 D1 DE3274156 D1 DE 3274156D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer composition
- photosensitive polymer
- photosensitive
- composition
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19886981A JPS58100126A (ja) | 1981-12-10 | 1981-12-10 | 感光性樹脂組成物 |
JP953982A JPS58127922A (ja) | 1982-01-26 | 1982-01-26 | 感光性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3274156D1 true DE3274156D1 (en) | 1986-12-11 |
Family
ID=26344287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282306513T Expired DE3274156D1 (en) | 1981-12-10 | 1982-12-07 | Photosensitive polymer composition |
Country Status (3)
Country | Link |
---|---|
US (3) | US4621044A (de) |
EP (1) | EP0081964B2 (de) |
DE (1) | DE3274156D1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0081964B2 (de) * | 1981-12-10 | 1993-08-04 | Toray Industries, Inc. | Photoempfindliche Polymerzusammensetzung |
JPS6051833A (ja) * | 1983-07-01 | 1985-03-23 | Toray Ind Inc | 感光性樹脂組成物 |
JPS62121445A (ja) * | 1985-11-21 | 1987-06-02 | Kuraray Co Ltd | 感光性組成物 |
JPH0687171B2 (ja) * | 1985-11-29 | 1994-11-02 | 株式会社クラレ | 感光性組成物 |
JPS63154713A (ja) * | 1986-12-17 | 1988-06-28 | Shin Etsu Chem Co Ltd | 塩化ビニル系共重合体の製造方法 |
NZ223177A (en) * | 1987-01-17 | 1990-01-29 | Nippon Paint Co Ltd | Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom |
NZ223178A (en) * | 1987-01-17 | 1990-01-29 | Nippon Paint Co Ltd | Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation |
DE3808951A1 (de) * | 1988-03-17 | 1989-10-05 | Basf Ag | Photopolymerisierbare, zur herstellung von druckformen geeignete druckplatte |
DE3821583A1 (de) * | 1988-06-25 | 1989-12-28 | Hoechst Ag | Durch strahlung polymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
US5204222A (en) * | 1988-07-16 | 1993-04-20 | Hoechst Aktiengesellschaft | Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates |
EP0430992A4 (en) * | 1988-08-08 | 1992-10-07 | Desoto, Inc. | Photocurable compositions and method of investment casting |
GB2263699B (en) * | 1992-02-03 | 1995-11-29 | Sericol Ltd | Photopolymerizable alcohols and compositions containing them |
AT401960B (de) * | 1992-04-08 | 1997-01-27 | Martin Dietmar Ing | Pumpaggregat zur gewinnung eines hochgespannten mediums |
DE4239660A1 (de) * | 1992-11-26 | 1994-06-01 | Basf Lacke & Farben | Lichtempfindliches Aufzeichnungsmaterial |
US5362806A (en) * | 1993-01-07 | 1994-11-08 | W. R. Grace & Co.-Conn. | Toughened photocurable polymer composition for processible flexographic printing plates |
US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
DE19811330A1 (de) | 1998-03-16 | 1999-09-23 | Du Pont Deutschland | Entwickler und Verfahren zur Herstellung von flexographischen Druckformen |
US6506542B1 (en) | 1999-03-16 | 2003-01-14 | E.I. Du Pont De Nemours And Company | Developer and process for preparing flexographic printing forms |
EP1355859A2 (de) * | 2001-02-01 | 2003-10-29 | Yale University | Vefahren zum entsalzen durch osmose |
DE10140597A1 (de) * | 2001-08-18 | 2003-03-06 | Kuraray Specialities Europe | Teilvernetzter Polyvinylalkohol |
GB0318115D0 (en) * | 2003-08-01 | 2003-09-03 | Sericol Ltd | A printing ink |
JP4647444B2 (ja) * | 2005-09-16 | 2011-03-09 | 東京応化工業株式会社 | フレキソ印刷版用水溶性感光性樹脂組成物および水溶性感光性フレキソ印刷原版 |
CN101410755B (zh) * | 2006-03-31 | 2011-08-17 | 日立化成工业株式会社 | 感光性树脂组合物、使用其的感光性元件、抗蚀图案的形成方法及印刷电路板的制造方法 |
US20100021844A1 (en) * | 2008-07-22 | 2010-01-28 | Jianfei Yu | Negative-working imageable elements and method of use |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL103565C (de) * | 1956-08-27 | |||
US3261686A (en) * | 1963-04-23 | 1966-07-19 | Du Pont | Photopolymerizable compositions and elements |
US3485733A (en) * | 1966-03-02 | 1969-12-23 | Ppg Industries Inc | Highly radiation-sensitive telomerized polyesters |
GB1233883A (de) * | 1968-01-22 | 1971-06-03 | ||
JPS503041B1 (de) * | 1970-03-27 | 1975-01-31 | ||
JPS5223281B2 (de) * | 1972-12-15 | 1977-06-23 | ||
JPS6049892B2 (ja) * | 1976-04-26 | 1985-11-05 | 富士写真フイルム株式会社 | 光重合性組成物 |
US4042386A (en) * | 1976-06-07 | 1977-08-16 | Napp Systems | Photosensitive compositions |
JPS5823616B2 (ja) * | 1976-11-08 | 1983-05-16 | 東レ株式会社 | 感光性ポリマ組成物 |
DE2846647A1 (de) * | 1978-10-26 | 1980-05-08 | Basf Ag | Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen |
US4247624A (en) * | 1979-05-29 | 1981-01-27 | E. I. Du Pont De Nemours And Company | Photopolymerizable elastomeric compositions with carbamated poly(vinyl alcohol) binder |
IE49128B1 (en) * | 1979-12-17 | 1985-08-07 | Nippon Paint Co Ltd | Process for the preparation of a photosensitive printing plate and use of the printing plate thereby obtained for the preparation of relief printing blocks |
JPS56129212A (en) * | 1980-03-13 | 1981-10-09 | Toray Ind Inc | Photosensitive polyamide resin composition |
EP0081964B2 (de) * | 1981-12-10 | 1993-08-04 | Toray Industries, Inc. | Photoempfindliche Polymerzusammensetzung |
-
1982
- 1982-12-07 EP EP82306513A patent/EP0081964B2/de not_active Expired - Lifetime
- 1982-12-07 DE DE8282306513T patent/DE3274156D1/de not_active Expired
-
1985
- 1985-04-04 US US06/719,636 patent/US4621044A/en not_active Expired - Lifetime
-
1987
- 1987-12-17 US US07/135,530 patent/US4828963A/en not_active Expired - Lifetime
-
1989
- 1989-02-27 US US07/316,410 patent/US5023165A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0081964A3 (en) | 1983-11-16 |
EP0081964B2 (de) | 1993-08-04 |
EP0081964A2 (de) | 1983-06-22 |
US4621044A (en) | 1986-11-04 |
US5023165A (en) | 1991-06-11 |
US4828963A (en) | 1989-05-09 |
EP0081964B1 (de) | 1986-11-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8366 | Restricted maintained after opposition proceedings |