DE3279255D1 - Developer composition - Google Patents

Developer composition

Info

Publication number
DE3279255D1
DE3279255D1 DE8282302646T DE3279255T DE3279255D1 DE 3279255 D1 DE3279255 D1 DE 3279255D1 DE 8282302646 T DE8282302646 T DE 8282302646T DE 3279255 T DE3279255 T DE 3279255T DE 3279255 D1 DE3279255 D1 DE 3279255D1
Authority
DE
Germany
Prior art keywords
developer composition
developer
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282302646T
Other languages
German (de)
Inventor
Takeshi Yamamoto
Kiyoshi Goto
Yoshio Kurita
Noriyasu Kita
Naoshi Kunieda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Application granted granted Critical
Publication of DE3279255D1 publication Critical patent/DE3279255D1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
DE8282302646T 1981-05-25 1982-05-24 Developer composition Expired DE3279255D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56079056A JPS57192952A (en) 1981-05-25 1981-05-25 Composition of developing solution

Publications (1)

Publication Number Publication Date
DE3279255D1 true DE3279255D1 (en) 1989-01-05

Family

ID=13679231

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282302646T Expired DE3279255D1 (en) 1981-05-25 1982-05-24 Developer composition

Country Status (4)

Country Link
US (1) US4467027A (en)
EP (1) EP0067001B1 (en)
JP (1) JPS57192952A (en)
DE (1) DE3279255D1 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101651A (en) * 1982-12-02 1984-06-12 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
JPS59222842A (en) * 1983-06-01 1984-12-14 Fuji Photo Film Co Ltd Photosensitive composition for lithographic plate
JPS603632A (en) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd Photosensitive lithographic plate
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
US4824769A (en) * 1984-10-15 1989-04-25 Allied Corporation High contrast photoresist developer
US4741985A (en) * 1985-06-07 1988-05-03 Fuji Photo Film Co., Ltd. Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer.
US4822722A (en) * 1985-07-18 1989-04-18 Petrarch Systems, Inc. Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image
DE3528929A1 (en) * 1985-08-13 1987-02-26 Hoechst Ag RADIATION-SENSITIVE MIXTURE, THIS CONTAINING RADIATION-SENSITIVE RECORDING MATERIAL AND METHOD FOR THE PRODUCTION OF RELIEF IMAGES
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
JPH0693116B2 (en) * 1986-01-21 1994-11-16 富士写真フイルム株式会社 Photosensitive composition
EP0265387B1 (en) * 1986-10-23 1995-11-15 Ciba-Geigy Ag Method of forming images
JPH07120039B2 (en) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 Photosensitive composition
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
US5240807A (en) * 1987-08-20 1993-08-31 Hoechst Celanese Corporation Photoresist article having a portable, conformable, built-on mask
JP2542903B2 (en) * 1988-04-22 1996-10-09 富士写真フイルム株式会社 Developer composition
JP2626992B2 (en) * 1988-05-10 1997-07-02 富士写真フイルム株式会社 Developer composition for photosensitive lithographic printing plate and developing method
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
JPH02179644A (en) * 1988-12-29 1990-07-12 Konica Corp Development of photosensitive material containing diazo resin
JP2598993B2 (en) * 1989-03-29 1997-04-09 富士写真フイルム株式会社 Developer composition for photosensitive lithographic printing plate and plate making method
US5260161A (en) * 1989-05-06 1993-11-09 Konica Corporation Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin
US4894127A (en) * 1989-05-24 1990-01-16 The Boeing Company Method for anodizing aluminum
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JPH04217256A (en) * 1990-12-19 1992-08-07 Fuji Photo Film Co Ltd Developing method for diazo resin-contained photosensitive material
JP3442176B2 (en) 1995-02-10 2003-09-02 富士写真フイルム株式会社 Photopolymerizable composition
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
DE69901642T3 (en) 1998-03-14 2019-03-21 Agfa Nv A process for producing a positive-working printing plate from a thermosensitive image-recording material
JP4458389B2 (en) 2000-05-01 2010-04-28 コダック株式会社 Photosensitive composition and photosensitive lithographic printing plate
EP1649322A4 (en) 2003-07-17 2007-09-19 Honeywell Int Inc Planarization films for advanced microelectronic applications and devices and methods of production thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE509125A (en) * 1951-02-09
US3549370A (en) * 1966-11-23 1970-12-22 Hunt Chem Corp Philip A Quaternary ammonium bisulfites,sulfites or pyrosulfites as developer preservatives
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure
US3713826A (en) * 1970-11-16 1973-01-30 Hunt P Chem Corp Sulfite esters as preservatives for black and white developing agents
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
US4105450A (en) * 1973-07-27 1978-08-08 Fuji Photo Film Co., Ltd. Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
JPS5156631A (en) * 1974-11-13 1976-05-18 Fuji Photo Film Co Ltd GAZOKEISEIHO
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
US4259434A (en) * 1977-10-24 1981-03-31 Fuji Photo Film Co., Ltd. Method for developing positive acting light-sensitive planographic printing plate
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer

Also Published As

Publication number Publication date
EP0067001B1 (en) 1988-11-30
US4467027A (en) 1984-08-21
JPS64690B2 (en) 1989-01-09
EP0067001A3 (en) 1983-03-16
JPS57192952A (en) 1982-11-27
EP0067001A2 (en) 1982-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee