DE3263763D1 - Semiconductor laser and method of making same - Google Patents
Semiconductor laser and method of making sameInfo
- Publication number
- DE3263763D1 DE3263763D1 DE8282201063T DE3263763T DE3263763D1 DE 3263763 D1 DE3263763 D1 DE 3263763D1 DE 8282201063 T DE8282201063 T DE 8282201063T DE 3263763 T DE3263763 T DE 3263763T DE 3263763 D1 DE3263763 D1 DE 3263763D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- making same
- making
- same
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/162—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions made by diffusion or disordening of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2202—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure by making a groove in the upper laser structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8104068A NL8104068A (nl) | 1981-09-02 | 1981-09-02 | Halfgeleiderlaser. |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3263763D1 true DE3263763D1 (en) | 1985-06-27 |
Family
ID=19838001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282201063T Expired DE3263763D1 (en) | 1981-09-02 | 1982-08-30 | Semiconductor laser and method of making same |
Country Status (6)
Country | Link |
---|---|
US (2) | US4558448A (de) |
EP (1) | EP0073548B1 (de) |
JP (1) | JPS5852894A (de) |
CA (1) | CA1181514A (de) |
DE (1) | DE3263763D1 (de) |
NL (1) | NL8104068A (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2562339B1 (fr) * | 1984-04-03 | 1986-06-20 | Bouadma Noureddine | Procede de realisation d'un miroir de laser a semi-conducteur, par usinage ionique |
JPH0712099B2 (ja) * | 1984-12-24 | 1995-02-08 | 株式会社日立製作所 | 半導体レ−ザ素子の製造方法 |
JPS62130581A (ja) * | 1985-11-30 | 1987-06-12 | Fujitsu Ltd | 半導体レーザの製造方法 |
JPS63124486A (ja) * | 1986-11-13 | 1988-05-27 | Mitsubishi Electric Corp | 半導体レ−ザの製造方法 |
JPH0614575B2 (ja) * | 1987-07-10 | 1994-02-23 | シャープ株式会社 | 半導体レーザ素子 |
JPH0671121B2 (ja) * | 1987-09-04 | 1994-09-07 | シャープ株式会社 | 半導体レーザ装置 |
DE3834929A1 (de) * | 1988-10-13 | 1990-04-19 | Siemens Ag | Wellenleiterreflektor fuer optoelektronische anwendungen und laser |
US5593815A (en) * | 1989-07-31 | 1997-01-14 | Goldstar Co., Ltd. | Cleaving process in manufacturing a semiconductor laser |
JPH0635160U (ja) * | 1992-10-14 | 1994-05-10 | 株式会社吉野工業所 | シール材 |
US5463647A (en) * | 1993-02-25 | 1995-10-31 | The United States Of America As Represented By The Secretary Of The Air Force | Broadband multi-wavelength narrow linewidth laser source using an electro-optic modulator |
JP3360105B2 (ja) * | 1994-03-04 | 2002-12-24 | 富士通株式会社 | 半導体装置の製造方法 |
KR0141057B1 (ko) * | 1994-11-19 | 1998-07-15 | 이헌조 | 반도체 레이저 제조방법 |
JPH10223992A (ja) * | 1997-01-31 | 1998-08-21 | Oki Electric Ind Co Ltd | 半導体素子製造方法 |
CN101501816A (zh) * | 2005-03-25 | 2009-08-05 | 通快光子学公司 | 激光器腔面钝化 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4994292A (de) * | 1973-01-11 | 1974-09-06 | ||
US3838359A (en) * | 1973-11-23 | 1974-09-24 | Bell Telephone Labor Inc | Gain asymmetry in heterostructure junction lasers operating in a fundamental transverse mode |
JPS516491A (en) * | 1974-07-04 | 1976-01-20 | Nippon Electric Co | Handotaireezano seizohoho |
US3969686A (en) * | 1975-03-26 | 1976-07-13 | Xerox Corporation | Beam collimation using multiple coupled elements |
JPS5231691A (en) * | 1975-09-04 | 1977-03-10 | Fujitsu Ltd | Semiconductor luminous device |
JPS5382281A (en) * | 1976-12-28 | 1978-07-20 | Nippon Telegr & Teleph Corp <Ntt> | Production of high liminance semiconductor device and its apparatus |
US4309668A (en) * | 1978-02-20 | 1982-01-05 | Nippon Electric Co., Ltd. | Stripe-geometry double heterojunction laser device |
DE2822146C2 (de) * | 1978-05-20 | 1982-11-25 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Heterostruktur-Halbleiterlaserdiode und Verfahren zur Herstellung einer Heterostruktur-Halbleiterdiode |
US4236296A (en) * | 1978-10-13 | 1980-12-02 | Exxon Research & Engineering Co. | Etch method of cleaving semiconductor diode laser wafers |
US4237601A (en) * | 1978-10-13 | 1980-12-09 | Exxon Research & Engineering Co. | Method of cleaving semiconductor diode laser wafers |
JPS6041478B2 (ja) * | 1979-09-10 | 1985-09-17 | 富士通株式会社 | 半導体レ−ザ素子の製造方法 |
NL8101409A (nl) * | 1981-03-23 | 1982-10-18 | Philips Nv | Halfgeleiderlaser met tenminste twee stralingsbundels, en werkwijze ter vervaardiging daarvan. |
US4352835A (en) * | 1981-07-01 | 1982-10-05 | Western Electric Co., Inc. | Masking portions of a substrate |
US4539743A (en) * | 1983-11-28 | 1985-09-10 | At&T Bell Laboratories | Production of semiconductor structures with buried resistive or conductive regions by controlled ion bombardment and heat treatment |
-
1981
- 1981-09-02 NL NL8104068A patent/NL8104068A/nl not_active Application Discontinuation
-
1982
- 1982-08-26 CA CA000410176A patent/CA1181514A/en not_active Expired
- 1982-08-27 US US06/412,052 patent/US4558448A/en not_active Expired - Lifetime
- 1982-08-30 DE DE8282201063T patent/DE3263763D1/de not_active Expired
- 1982-08-30 EP EP82201063A patent/EP0073548B1/de not_active Expired
- 1982-09-01 JP JP57152475A patent/JPS5852894A/ja active Granted
-
1985
- 1985-09-23 US US06/779,172 patent/US4670966A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS5852894A (ja) | 1983-03-29 |
JPH0231868B2 (de) | 1990-07-17 |
EP0073548B1 (de) | 1985-05-22 |
NL8104068A (nl) | 1983-04-05 |
EP0073548A1 (de) | 1983-03-09 |
US4558448A (en) | 1985-12-10 |
US4670966A (en) | 1987-06-09 |
CA1181514A (en) | 1985-01-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N |
|
8339 | Ceased/non-payment of the annual fee |