DE3174308D1 - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- DE3174308D1 DE3174308D1 DE8181105841T DE3174308T DE3174308D1 DE 3174308 D1 DE3174308 D1 DE 3174308D1 DE 8181105841 T DE8181105841 T DE 8181105841T DE 3174308 T DE3174308 T DE 3174308T DE 3174308 D1 DE3174308 D1 DE 3174308D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser device
- semiconductor
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9991880A JPS5726487A (en) | 1980-07-23 | 1980-07-23 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3174308D1 true DE3174308D1 (en) | 1986-05-15 |
Family
ID=14260153
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8181105841T Expired DE3174308D1 (en) | 1980-07-23 | 1981-07-23 | Semiconductor laser device |
Country Status (5)
Country | Link |
---|---|
US (1) | US4426702A (de) |
EP (1) | EP0044571B1 (de) |
JP (1) | JPS5726487A (de) |
CA (1) | CA1150810A (de) |
DE (1) | DE3174308D1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4536940A (en) * | 1981-06-12 | 1985-08-27 | At&T Bell Laboratories | Method of making a loss stabilized buried heterostructure laser |
JPS5858788A (ja) * | 1981-10-05 | 1983-04-07 | Fujitsu Ltd | 半導体発光装置の製造方法 |
GB2115608B (en) * | 1982-02-24 | 1985-10-30 | Plessey Co Plc | Semi-conductor lasers |
US4661961A (en) * | 1983-06-20 | 1987-04-28 | American Telephone And Telegraph Company, At&T Bell Laboratories | Buried heterostructure devices with unique contact-facilitating layers |
US4566171A (en) * | 1983-06-20 | 1986-01-28 | At&T Bell Laboratories | Elimination of mask undercutting in the fabrication of InP/InGaAsP BH devices |
JPS6085585A (ja) * | 1983-10-17 | 1985-05-15 | Nec Corp | 埋め込み型半導体レ−ザ |
JPS60154689A (ja) * | 1984-01-25 | 1985-08-14 | Hitachi Ltd | 発光素子およびこれを用いた光通信装置 |
GB2154059B (en) * | 1984-01-25 | 1987-10-28 | Hitachi Ltd | Light emitting chip and communication apparatus using the same |
JPS6197189A (ja) * | 1984-10-16 | 1986-05-15 | Matsushita Electric Ind Co Ltd | 液相成長方法 |
US4652333A (en) * | 1985-06-19 | 1987-03-24 | Honeywell Inc. | Etch process monitors for buried heterostructures |
US4868838A (en) * | 1986-07-10 | 1989-09-19 | Sharp Kabushiki Kaisha | Semiconductor laser device |
US4818722A (en) * | 1986-09-29 | 1989-04-04 | Siemens Aktiengesellschaft | Method for generating a strip waveguide |
JPS63150985A (ja) * | 1986-12-15 | 1988-06-23 | Sharp Corp | 半導体レ−ザ |
JPS63150986A (ja) * | 1986-12-15 | 1988-06-23 | Sharp Corp | 半導体レ−ザ |
JPS63177495A (ja) * | 1987-01-16 | 1988-07-21 | Sharp Corp | 半導体レ−ザ素子 |
JPS63208296A (ja) * | 1987-02-24 | 1988-08-29 | Sharp Corp | 半導体装置 |
JPS63271992A (ja) * | 1987-04-28 | 1988-11-09 | Sharp Corp | 半導体レ−ザ素子 |
JPS63287082A (ja) * | 1987-05-19 | 1988-11-24 | Sharp Corp | 半導体レ−ザ素子 |
US4972238A (en) * | 1987-12-08 | 1990-11-20 | Kabushiki Kaisha Toshiba | Semiconductor laser device |
WO1989006451A1 (en) * | 1988-01-06 | 1989-07-13 | Australian Telecommunications Corporation | Current injection laser |
JP2763008B2 (ja) * | 1988-11-28 | 1998-06-11 | 三菱化学株式会社 | ダブルヘテロ型エピタキシャル・ウエハおよび発光ダイオード |
JP3444610B2 (ja) * | 1992-09-29 | 2003-09-08 | 三菱化学株式会社 | 半導体レーザ装置 |
JPH07335981A (ja) * | 1994-06-07 | 1995-12-22 | Mitsubishi Electric Corp | 半導体発光素子,レーザアンプ,及び増幅機能を有する波長可変フィルタ |
-
1980
- 1980-07-23 JP JP9991880A patent/JPS5726487A/ja active Granted
-
1981
- 1981-07-15 US US06/283,791 patent/US4426702A/en not_active Expired - Lifetime
- 1981-07-16 CA CA000381881A patent/CA1150810A/en not_active Expired
- 1981-07-23 DE DE8181105841T patent/DE3174308D1/de not_active Expired
- 1981-07-23 EP EP81105841A patent/EP0044571B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0044571A3 (en) | 1983-01-05 |
EP0044571B1 (de) | 1986-04-09 |
US4426702A (en) | 1984-01-17 |
EP0044571A2 (de) | 1982-01-27 |
CA1150810A (en) | 1983-07-26 |
JPS5726487A (en) | 1982-02-12 |
JPS6124838B2 (de) | 1986-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT. GROENING, H., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |