DE3066051D1 - Photoimaging composition comprising a 2,4,5-triphenylimidazolyl dimer and at least one compound selected from the group consisting of a leuco dye and a polymerizable ethylenically unsaturated monomer - Google Patents

Photoimaging composition comprising a 2,4,5-triphenylimidazolyl dimer and at least one compound selected from the group consisting of a leuco dye and a polymerizable ethylenically unsaturated monomer

Info

Publication number
DE3066051D1
DE3066051D1 DE8080104770T DE3066051T DE3066051D1 DE 3066051 D1 DE3066051 D1 DE 3066051D1 DE 8080104770 T DE8080104770 T DE 8080104770T DE 3066051 T DE3066051 T DE 3066051T DE 3066051 D1 DE3066051 D1 DE 3066051D1
Authority
DE
Germany
Prior art keywords
group
ethylenically unsaturated
compound selected
unsaturated monomer
leuco dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080104770T
Other languages
German (de)
English (en)
Inventor
Rolf Dessauer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3066051D1 publication Critical patent/DE3066051D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
DE8080104770T 1979-08-14 1980-08-12 Photoimaging composition comprising a 2,4,5-triphenylimidazolyl dimer and at least one compound selected from the group consisting of a leuco dye and a polymerizable ethylenically unsaturated monomer Expired DE3066051D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/066,373 US4252887A (en) 1979-08-14 1979-08-14 Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators

Publications (1)

Publication Number Publication Date
DE3066051D1 true DE3066051D1 (en) 1984-02-09

Family

ID=22069099

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080104770T Expired DE3066051D1 (en) 1979-08-14 1980-08-12 Photoimaging composition comprising a 2,4,5-triphenylimidazolyl dimer and at least one compound selected from the group consisting of a leuco dye and a polymerizable ethylenically unsaturated monomer

Country Status (5)

Country Link
US (1) US4252887A (https=)
EP (1) EP0024629B1 (https=)
JP (1) JPS5635134A (https=)
CA (1) CA1137348A (https=)
DE (1) DE3066051D1 (https=)

Families Citing this family (92)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
EP0065326B1 (en) * 1981-05-15 1985-06-19 Agfa-Gevaert N.V. A photosensitive recording material and photographic processes wherein said material is used
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPS59140447A (ja) * 1983-02-01 1984-08-11 Hodogaya Chem Co Ltd 感光性組成物
US4517215A (en) * 1983-05-26 1985-05-14 Nestec, S.A. Preparation of vegetable pastas
EP0243934A3 (en) * 1986-05-01 1990-04-18 E.I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
JPS6355539A (ja) * 1986-05-30 1988-03-10 Toyobo Co Ltd 画像形成材料および画像形成方法
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
US4818660A (en) * 1987-11-04 1989-04-04 E. I. Du Pont De Nemours And Company Photohardenable electrostatic master having improved backtransfer and charge decay
JPH02101065A (ja) * 1988-10-06 1990-04-12 Tanabe Seiyaku Co Ltd イミダゾリン誘導体及びその製法
US5922751A (en) * 1994-06-24 1999-07-13 Euro-Celtique, S.A. Aryl pyrazole compound for inhibiting phosphodiesterase IV and methods of using same
JP3400586B2 (ja) * 1995-02-10 2003-04-28 富士写真フイルム株式会社 光重合性組成物
JP3564836B2 (ja) * 1995-11-22 2004-09-15 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
EP0779536B1 (en) 1995-12-04 2005-10-19 Konica Corporation Light-and heat-sensitive recording material and recording method by use thereof
MY120763A (en) 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
US6627309B2 (en) * 2001-05-08 2003-09-30 3M Innovative Properties Company Adhesive detackification
US7462443B2 (en) * 2003-09-05 2008-12-09 Hewlett-Packard Development Company, L.P. Leuco dye-containing coating compositions
EP1668417B1 (en) 2003-09-22 2009-05-13 Agfa Graphics N.V. Photopolymerizable composition.
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US20060093958A1 (en) * 2004-10-28 2006-05-04 Vladek Kasperchik Color forming compositions and associated methods
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
JP4547308B2 (ja) * 2005-06-30 2010-09-22 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
ES2333442T3 (es) 2005-08-26 2010-02-22 Agfa Graphics N.V. Precursor de placa de impresion fotopolimerico.
EP1788442B1 (en) 2005-11-18 2010-07-28 Agfa Graphics N.V. Method of making a lithographic printing plate
ES2358120T3 (es) 2005-11-18 2011-05-05 Agfa Graphics N.V. Método de elaboración de una plancha de impresión litográfica.
DE602005013399D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer lithographischen Druckplatte
EP1788434B2 (en) 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
DE602005013398D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
ATE422253T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788443B1 (en) 2005-11-18 2014-07-02 Agfa Graphics N.V. Method of making a lithographic printing plate
ATE422066T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2324542T3 (es) 2005-11-21 2009-08-10 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
PL1788435T3 (pl) 2005-11-21 2013-09-30 Agfa Nv Sposób wytwarzania litograficznej płyty drukowej
EP1788449A1 (en) 2005-11-21 2007-05-23 Agfa Graphics N.V. Method for making a lithographic printing plate
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8283100B2 (en) * 2006-05-16 2012-10-09 Hewlett-Packard Development Company, L.P. Color forming compositions and associated methods
DE602006009919D1 (de) 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
WO2008025508A1 (en) * 2006-08-30 2008-03-06 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
WO2008145528A1 (en) 2007-05-25 2008-12-04 Agfa Graphics Nv A lithographic printing plate precursor
ES2344668T3 (es) 2007-11-30 2010-09-02 Agfa Graphics N.V. Metodo para tratar una plancha de impresion litografica.
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
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ES2365885T3 (es) 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
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JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
BRPI0917509A2 (pt) 2008-08-22 2015-11-17 Fujifilm Corp método de preparação de chapa de impressão litográfica
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CN102224460B (zh) 2008-10-15 2015-01-21 国际纸业公司 成像颗粒组合物、纸张和方法以及使用双波长光对纸张成像的方法
ES2552855T3 (es) 2008-10-15 2015-12-02 International Paper Company Composición, proceso de preparación y método de aplicación y exposición para papel de formación de imágenes mediante luz
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
EP2339402A1 (en) 2009-12-28 2011-06-29 Fujifilm Corporation Lithographic printing plate precursor and method of preparing lithographic printing plate
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JP5346845B2 (ja) 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
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EP2682815A4 (en) 2011-02-28 2015-04-29 Fujifilm Corp LITHOGRAPHIC ORIGINAL PRESSURE PLATE AND METHOD FOR PRODUCING A LITHOGRAPHIC FLAT PRESSURE PLATE
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EP2693270B1 (en) 2011-03-28 2015-12-09 FUJIFILM Corporation Method for producing lithographic printing plate
JP5301015B2 (ja) 2011-07-25 2013-09-25 富士フイルム株式会社 感光性平版印刷版原版及び平版印刷版の作製方法
JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
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EP2855152B1 (en) 2012-06-05 2016-03-16 AGFA Graphics NV A lithographic printing plate precursor
CN102854748B (zh) * 2012-09-27 2014-05-21 浙江荣泰科技企业有限公司 感光性组合物及其用途
BR112015030811A2 (pt) 2013-06-14 2017-07-25 Agfa Graphics Nv precursor de placa de impressão litográfica
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
EP2916171B1 (en) 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
ES2655798T3 (es) 2014-12-08 2018-02-21 Agfa Nv Sistema para reducir los residuos de ablación
US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
US20170176856A1 (en) 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
EP3430474A1 (en) 2016-03-16 2019-01-23 Agfa Nv Method and apparatus for processing a lithographic printing plate
US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
GB2564956B (en) 2017-05-15 2020-04-29 Holo Inc Viscous film three-dimensional printing systems and methods
US10245785B2 (en) 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
CN117067579A (zh) 2018-12-26 2023-11-17 霍洛公司 用于三维打印系统和方法的传感器
WO2022225854A1 (en) 2021-04-19 2022-10-27 Holo, Inc. Systems and methods for stereolithography three-dimensional printing

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL296772A (https=) * 1962-03-21
US3445234A (en) * 1962-10-31 1969-05-20 Du Pont Leuco dye/hexaarylbiimidazole imageforming composition
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3390994A (en) * 1966-02-17 1968-07-02 Du Pont Photodeactivatable light-sensitive color-forming composition
US3615481A (en) * 1969-05-19 1971-10-26 Du Pont Leuco dye/hexaarylbiimidazole thermally activated imaging process
US3661461A (en) * 1969-11-26 1972-05-09 Du Pont Co-irradiation system for producing positive images
FR2089284A5 (https=) * 1970-04-09 1972-01-07 Agfa Gevaert Nv
US3658543A (en) * 1970-12-18 1972-04-25 Du Pont Dual response photosensitive composition containing acyl ester of triethanolamine

Also Published As

Publication number Publication date
EP0024629A3 (en) 1982-02-03
JPS5635134A (en) 1981-04-07
JPS632099B2 (https=) 1988-01-16
EP0024629A2 (en) 1981-03-11
EP0024629B1 (en) 1984-01-04
CA1137348A (en) 1982-12-14
US4252887A (en) 1981-02-24

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