DE2939204C2 - - Google Patents

Info

Publication number
DE2939204C2
DE2939204C2 DE2939204A DE2939204A DE2939204C2 DE 2939204 C2 DE2939204 C2 DE 2939204C2 DE 2939204 A DE2939204 A DE 2939204A DE 2939204 A DE2939204 A DE 2939204A DE 2939204 C2 DE2939204 C2 DE 2939204C2
Authority
DE
Germany
Prior art keywords
refractive
layers
layer
group
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE2939204A
Other languages
German (de)
English (en)
Other versions
DE2939204A1 (de
Inventor
Mitsuharu Yokohama Kanagawa Jp Sawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE2939204A1 publication Critical patent/DE2939204A1/de
Application granted granted Critical
Publication of DE2939204C2 publication Critical patent/DE2939204C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
DE19792939204 1978-09-27 1979-09-27 Mehrschichtiger uv-belag Granted DE2939204A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53118757A JPS6038681B2 (ja) 1978-09-27 1978-09-27 紫外用多層膜

Publications (2)

Publication Number Publication Date
DE2939204A1 DE2939204A1 (de) 1980-04-24
DE2939204C2 true DE2939204C2 (US07413550-20080819-C00001.png) 1990-06-28

Family

ID=14744296

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19792939204 Granted DE2939204A1 (de) 1978-09-27 1979-09-27 Mehrschichtiger uv-belag

Country Status (3)

Country Link
US (1) US4320936A (US07413550-20080819-C00001.png)
JP (1) JPS6038681B2 (US07413550-20080819-C00001.png)
DE (1) DE2939204A1 (US07413550-20080819-C00001.png)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5257140A (en) * 1982-05-03 1993-10-26 Hughes Aircraft Company Mirror for infrared and visible wavelength radiation
JPS60181704A (ja) * 1984-02-29 1985-09-17 Canon Inc 真空紫外用反射ミラー
JPS6199330A (ja) * 1984-10-22 1986-05-17 Hitachi Ltd パタ−ン形成方法
JPS61222128A (ja) * 1985-03-27 1986-10-02 Fujitsu Ltd 投影露光方法
JPS61253763A (ja) * 1985-05-02 1986-11-11 松下電子工業株式会社 白熱電球
DE3525892C1 (de) * 1985-07-19 1986-10-02 Optische Werke G. Rodenstock, 8000 München Reflexionsvermindernder Belag fuer ein optisches Element aus organischem Material
US4909254A (en) * 1985-10-09 1990-03-20 Commonwealth Scientific And Industrial Research Organization Phototherapy of skin wounds
DE3772467D1 (de) * 1986-06-13 1991-10-02 Dainippon Screen Mfg Belichtungssystem.
EP0267599B1 (en) * 1986-07-24 1992-04-15 Dainippon Screen Mfg. Co., Ltd. Fly eye lens unit for illumination
DE3902144A1 (de) * 1989-01-25 1990-08-02 Heraeus Gmbh W C Deuterium-lampe fuer spektralanalyse-vorrichtungen
US5400179A (en) * 1992-02-18 1995-03-21 Asahi Kogaku Kogyo Kabushiki Kaisha Optical multilayer thin film and beam splitter
DE69412358T2 (de) * 1993-05-10 1999-02-25 Optical Coating Laboratory Inc., Santa Rosa, Calif. Selbstheilende UV-undurchlässige Beschichtung mit flexiblem Polymersubstrat
US5513039A (en) * 1993-05-26 1996-04-30 Litton Systems, Inc. Ultraviolet resistive coated mirror and method of fabrication
US5648653A (en) * 1993-10-22 1997-07-15 Canon Kabushiki Kaisha Optical filter having alternately laminated thin layers provided on a light receiving surface of an image sensor
WO1995021137A1 (fr) * 1994-02-07 1995-08-10 Nikon Corporation Verre optique pour systemes optiques polarisants, procede de fabrication correspondant et dispositif de fractionnement du faisceau polarisant
US5600487A (en) * 1994-04-14 1997-02-04 Omron Corporation Dichroic mirror for separating/synthesizing light with a plurality of wavelengths and optical apparatus and detecting method using the same
DE69702641T2 (de) * 1996-03-07 2001-04-05 Koninkl Philips Electronics Nv Belichtungssystem und belichtungsgerät für uv-lithographie
US6501188B1 (en) 1997-07-03 2002-12-31 Micron Technology, Inc. Method for improving a stepper signal in a planarized surface over alignment topography
US5933743A (en) 1997-07-03 1999-08-03 Micron Technology, Inc. Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors
TWI257530B (en) * 1999-12-01 2006-07-01 Asml Netherlands Bv Method of manufacturing a device using a lithographic projection apparatus and apparatus therefor
JP3678120B2 (ja) * 2000-06-06 2005-08-03 ウシオ電機株式会社 偏光光照射装置
JP2002071946A (ja) * 2000-08-30 2002-03-12 Nippon Sheet Glass Co Ltd 偏光フィルタおよびそれを用いた光学装置
DE10064143A1 (de) * 2000-12-15 2002-06-20 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht bei großen Einfallswinkeln
DE10213088B4 (de) * 2002-03-18 2005-03-10 Fraunhofer Ges Forschung Optisches Element, Verfahren zu seiner Herstellung und zur Bestimmung seiner optischen Eigenschaften
WO2008031576A1 (en) * 2006-09-12 2008-03-20 Carl Zeiss Smt Ag Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same
DE102006062480A1 (de) * 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element mit hydrophober Beschichtung, Projektionsobjektiv und Projektionsbelichtungsanlage damit
US7826009B2 (en) 2006-12-21 2010-11-02 3M Innovative Properties Company Hybrid polarizer
US7791687B2 (en) * 2006-12-21 2010-09-07 3M Innovative Properties Company Display including reflective polarizer
US8817371B1 (en) * 2008-08-01 2014-08-26 Simon Andrew Boothroyd Polarizing beam splitters
US9459386B2 (en) 2009-11-18 2016-10-04 3M Innovative Properties Company Multi-layer optical films
DE102011054837A1 (de) * 2011-10-26 2013-05-02 Carl Zeiss Laser Optics Gmbh Optisches Element
DE102015218763A1 (de) 2015-09-29 2017-03-30 Carl Zeiss Smt Gmbh Reflektives optisches Element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1135199B (de) * 1959-10-06 1962-08-23 Karl Krebs Dr Interferenzfilter mit nichtmetallischen Spiegelschichtensystemen fuer das ultra-violette Gebiet von 310 bis 240 mª–
US3247392A (en) * 1961-05-17 1966-04-19 Optical Coating Laboratory Inc Optical coating and assembly used as a band pass interference filter reflecting in the ultraviolet and infrared
CH523509A (de) * 1970-09-18 1972-05-31 Balzers Patent Beteilig Ag Interferenzfilter, bestehend aus einer Mehrzahl von abwechselnd hoch- und niedrigbrechenden lichtdurchlässigen Schichten auf einem lichtdurchlässigen Träger, welches innerhalb eines bestimmten Wellenlängenbereichs ein bestimmtes Wellenlängenband reflektiert, die Strahlung der übrigen Teile des genannten Bereiches jedoch hindurchlässt
CH556548A (de) * 1972-09-19 1974-11-29 Balzers Patent Beteilig Ag Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem.

Also Published As

Publication number Publication date
JPS6038681B2 (ja) 1985-09-02
US4320936A (en) 1982-03-23
DE2939204A1 (de) 1980-04-24
JPS5545061A (en) 1980-03-29

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: DRES. WESER UND MARTIN, 81245 MUENCHEN

8328 Change in the person/name/address of the agent

Free format text: WESER & KOLLEGEN, 81245 MUENCHEN