DE2740366A1 - Verfahren und einrichtung zur herstellung sehr kleiner integrierter stromkreise - Google Patents

Verfahren und einrichtung zur herstellung sehr kleiner integrierter stromkreise

Info

Publication number
DE2740366A1
DE2740366A1 DE19772740366 DE2740366A DE2740366A1 DE 2740366 A1 DE2740366 A1 DE 2740366A1 DE 19772740366 DE19772740366 DE 19772740366 DE 2740366 A DE2740366 A DE 2740366A DE 2740366 A1 DE2740366 A1 DE 2740366A1
Authority
DE
Germany
Prior art keywords
mask
ray
rays
carrier
supply source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19772740366
Other languages
German (de)
English (en)
Inventor
Keith Allan Brueckner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xonics Inc
Original Assignee
Xonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xonics Inc filed Critical Xonics Inc
Publication of DE2740366A1 publication Critical patent/DE2740366A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0278—Röntgenlithographic or X-ray lithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE19772740366 1976-09-29 1977-09-08 Verfahren und einrichtung zur herstellung sehr kleiner integrierter stromkreise Pending DE2740366A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72794976A 1976-09-29 1976-09-29

Publications (1)

Publication Number Publication Date
DE2740366A1 true DE2740366A1 (de) 1978-03-30

Family

ID=24924778

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772740366 Pending DE2740366A1 (de) 1976-09-29 1977-09-08 Verfahren und einrichtung zur herstellung sehr kleiner integrierter stromkreise

Country Status (7)

Country Link
JP (1) JPS5342679A (ja)
BE (1) BE857362A (ja)
DE (1) DE2740366A1 (ja)
FR (1) FR2366694A1 (ja)
GB (1) GB1522568A (ja)
IT (1) IT1089816B (ja)
NL (1) NL7707485A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127861A2 (en) * 1983-06-06 1984-12-12 The University Of Rochester X-ray lithography

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS62208631A (ja) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd 縮小型ｘ線リソグラフイ装置
JP2628165B2 (ja) * 1987-06-15 1997-07-09 キヤノン株式会社 Ｘ線露光装置
JP2603225B2 (ja) * 1986-07-11 1997-04-23 キヤノン株式会社 Ｘ線投影露光装置及び半導体製造方法
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127861A2 (en) * 1983-06-06 1984-12-12 The University Of Rochester X-ray lithography
EP0127861A3 (en) * 1983-06-06 1987-02-25 The University Of Rochester X-ray lithography

Also Published As

Publication number Publication date
JPS5342679A (en) 1978-04-18
FR2366694A1 (fr) 1978-04-28
IT1089816B (it) 1985-06-18
BE857362A (fr) 1977-12-01
NL7707485A (nl) 1978-03-31
GB1522568A (en) 1978-08-23

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Legal Events

Date Code Title Description
OHJ Non-payment of the annual fee