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Publication of DE273710CpublicationCriticalpatent/DE273710C/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F5/00—Screening processes; Screens therefor
G03F5/20—Screening processes; Screens therefor using screens for gravure printing
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)
Photopolymerizable compositions containing a fluoroborate of paradiazodiphenyl amine and a liquid epoxy resin, and photosensitive materials containing them
Verfahren zur Herstellung von Offsetdruckplatten, bei welchem von einer geaetzten, mit Schwaerze versehenen Halbtonkupferplatte (Autotypie) auf ein Abdruckmedium ein Abdruck gemacht und dieser auf eine Zinkplatte reproduziert wird
Verfahren zur Herstellung von Tiefdruckformen unter Anwendung lichtempfindlicher Schichten aus Kautschuk und ähnlichen Stoffen einesteils und Asphalt und ähnlichen Stoffen andernteils.