DE2715089B2 - - Google Patents

Info

Publication number
DE2715089B2
DE2715089B2 DE2715089A DE2715089A DE2715089B2 DE 2715089 B2 DE2715089 B2 DE 2715089B2 DE 2715089 A DE2715089 A DE 2715089A DE 2715089 A DE2715089 A DE 2715089A DE 2715089 B2 DE2715089 B2 DE 2715089B2
Authority
DE
Germany
Prior art keywords
substrate
areas
exposed
photoresist
white
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE2715089A
Other languages
German (de)
English (en)
Other versions
DE2715089A1 (de
DE2715089C3 (de
Inventor
Michael Thomas Gattikon Gale
James Zumikon Kane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of DE2715089A1 publication Critical patent/DE2715089A1/de
Publication of DE2715089B2 publication Critical patent/DE2715089B2/de
Application granted granted Critical
Publication of DE2715089C3 publication Critical patent/DE2715089C3/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • ing And Chemical Polishing (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE2715089A 1976-04-07 1977-04-04 Verfahren zum Herstellen einer Mater zum Einprägen eines Bildinformationsmusters in eine thermoplastische Schicht Expired DE2715089C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB14163/76A GB1574910A (en) 1976-04-07 1976-04-07 Fabrication of diffractive subtractive filter embossing master

Publications (3)

Publication Number Publication Date
DE2715089A1 DE2715089A1 (de) 1977-10-13
DE2715089B2 true DE2715089B2 (US20100268047A1-20101021-C00003.png) 1980-05-22
DE2715089C3 DE2715089C3 (de) 1981-02-05

Family

ID=10036148

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2715089A Expired DE2715089C3 (de) 1976-04-07 1977-04-04 Verfahren zum Herstellen einer Mater zum Einprägen eines Bildinformationsmusters in eine thermoplastische Schicht

Country Status (12)

Country Link
US (1) US4108660A (US20100268047A1-20101021-C00003.png)
JP (1) JPS52123643A (US20100268047A1-20101021-C00003.png)
AU (1) AU504864B2 (US20100268047A1-20101021-C00003.png)
BE (1) BE853282A (US20100268047A1-20101021-C00003.png)
CA (1) CA1095311A (US20100268047A1-20101021-C00003.png)
CH (1) CH613530A5 (US20100268047A1-20101021-C00003.png)
DE (1) DE2715089C3 (US20100268047A1-20101021-C00003.png)
FR (1) FR2347708A1 (US20100268047A1-20101021-C00003.png)
GB (1) GB1574910A (US20100268047A1-20101021-C00003.png)
IT (1) IT1084963B (US20100268047A1-20101021-C00003.png)
NL (1) NL174189C (US20100268047A1-20101021-C00003.png)
SE (1) SE424925B (US20100268047A1-20101021-C00003.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110184A1 (en) * 1982-11-04 1984-06-13 Sumitomo Electric Industries Limited Process for fabricating integrated optics

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4372649A (en) * 1978-05-22 1983-02-08 Minnesota Mining And Manufacturing Company Extended area diffractive subtractive color filters
JPS5532250A (en) * 1978-08-25 1980-03-06 Matsushita Electric Ind Co Ltd Duplicating method for fine pattern
US4255514A (en) * 1979-04-27 1981-03-10 Rca Corporation Method for fabricating a diffractive subtractive filter embossing master
US4353622A (en) * 1979-06-25 1982-10-12 Rca Corporation Recording blank and method for fabricating therefrom diffractive subtractive filter metal embossing master
US5843626A (en) * 1995-04-19 1998-12-01 Pioneer Video Corporation Method for manufacturing a master disc for optical discs
DE938597T1 (de) * 1996-09-06 2000-03-09 Obducat Ab Verfahren für das anisotrope ätzen von strukturen in leitende materialien
US20040137376A1 (en) * 2003-01-15 2004-07-15 Bishop John L. Method and system for replicating film data to a metal substrate and article of manufacture
CH697447B1 (de) * 2003-12-23 2008-10-15 3D Ag Verfahren zur Erzeugung eines Substrats mit unterschiedlichen optischen Eigenschaften.
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs
CZ2004234A3 (cs) * 2004-02-12 2005-03-16 Optaglio S. R. O. Kovová identifikační šupina a způsob její výroby
KR20120055754A (ko) * 2010-11-22 2012-06-01 한국전자통신연구원 클리세 및 그의 제조방법
EP2918707B1 (en) * 2014-03-12 2019-05-22 Rolls-Royce North American Technologies, Inc. Anisotropic etching of metallic substrates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669673A (en) * 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3732363A (en) * 1971-08-16 1973-05-08 Columbia Broadcasting Syst Inc Information record utilizing diffraction grating and methods of recording and reproducing the information thereof
NL7212045A (US20100268047A1-20101021-C00003.png) * 1972-09-05 1974-03-07
US3832176A (en) * 1973-04-06 1974-08-27 Eastman Kodak Co Novel photoresist article and process for its use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110184A1 (en) * 1982-11-04 1984-06-13 Sumitomo Electric Industries Limited Process for fabricating integrated optics

Also Published As

Publication number Publication date
DE2715089A1 (de) 1977-10-13
NL7703780A (nl) 1977-10-11
IT1084963B (it) 1985-05-28
NL174189C (nl) 1984-05-01
AU504864B2 (en) 1979-11-01
JPS5615484B2 (US20100268047A1-20101021-C00003.png) 1981-04-10
FR2347708A1 (fr) 1977-11-04
FR2347708B1 (US20100268047A1-20101021-C00003.png) 1981-09-11
DE2715089C3 (de) 1981-02-05
BE853282A (fr) 1977-10-05
JPS52123643A (en) 1977-10-18
AU2382177A (en) 1978-10-05
GB1574910A (en) 1980-09-10
CA1095311A (en) 1981-02-10
SE7703844L (sv) 1977-10-08
CH613530A5 (US20100268047A1-20101021-C00003.png) 1979-09-28
NL174189B (nl) 1983-12-01
SE424925B (sv) 1982-08-16
US4108660A (en) 1978-08-22

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee