DE2707692A1 - Verfahren zur herstellung duenner magnetischer siliciumeisenschichten - Google Patents
Verfahren zur herstellung duenner magnetischer siliciumeisenschichtenInfo
- Publication number
- DE2707692A1 DE2707692A1 DE19772707692 DE2707692A DE2707692A1 DE 2707692 A1 DE2707692 A1 DE 2707692A1 DE 19772707692 DE19772707692 DE 19772707692 DE 2707692 A DE2707692 A DE 2707692A DE 2707692 A1 DE2707692 A1 DE 2707692A1
- Authority
- DE
- Germany
- Prior art keywords
- silicon
- coercive force
- substrate
- silicon iron
- volts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 title claims description 70
- 238000000034 method Methods 0.000 title claims description 34
- 239000000758 substrate Substances 0.000 claims description 85
- 239000010410 layer Substances 0.000 claims description 65
- 229910052710 silicon Inorganic materials 0.000 claims description 63
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 53
- 239000010703 silicon Substances 0.000 claims description 52
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 46
- 238000004544 sputter deposition Methods 0.000 claims description 31
- 239000007789 gas Substances 0.000 claims description 30
- 229910052786 argon Inorganic materials 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 description 105
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 28
- 239000000203 mixture Substances 0.000 description 19
- 235000012431 wafers Nutrition 0.000 description 14
- 230000006870 function Effects 0.000 description 13
- 230000035699 permeability Effects 0.000 description 11
- 229910005347 FeSi Inorganic materials 0.000 description 10
- 238000000889 atomisation Methods 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 230000001965 increasing effect Effects 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910000889 permalloy Inorganic materials 0.000 description 8
- 230000035882 stress Effects 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 6
- 229910000640 Fe alloy Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000004018 waxing Methods 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000008646 thermal stress Effects 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/928—Magnetic property
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
- Y10T428/12604—Film [e.g., glaze, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/662,198 US4049522A (en) | 1976-02-26 | 1976-02-26 | Low coercivity iron-silicon material, shields, and process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2707692A1 true DE2707692A1 (de) | 1977-09-01 |
Family
ID=24656780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19772707692 Withdrawn DE2707692A1 (de) | 1976-02-26 | 1977-02-23 | Verfahren zur herstellung duenner magnetischer siliciumeisenschichten |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4049522A (OSRAM) |
| JP (1) | JPS52112797A (OSRAM) |
| DE (1) | DE2707692A1 (OSRAM) |
| FR (1) | FR2342547A1 (OSRAM) |
| GB (1) | GB1513851A (OSRAM) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5472954A (en) * | 1977-11-23 | 1979-06-11 | Noboru Tsuya | Semiconductor thin film and method of fabricating same |
| US4244722A (en) * | 1977-12-09 | 1981-01-13 | Noboru Tsuya | Method for manufacturing thin and flexible ribbon of dielectric material having high dielectric constant |
| DE2856795C2 (de) * | 1977-12-30 | 1984-12-06 | Noboru Prof. Sendai Tsuya | Verwendung einer Stahlschmelze für ein Verfahren zum Stranggießen eines dünnen Bandes |
| US4525223A (en) * | 1978-09-19 | 1985-06-25 | Noboru Tsuya | Method of manufacturing a thin ribbon wafer of semiconductor material |
| SE448381B (sv) * | 1978-09-19 | 1987-02-16 | Tsuya Noboru | Sett att framstella ett tunt band av kiselstal, tunt kiselstalband och anvendning av dylikt |
| JPS57145963A (en) * | 1981-03-04 | 1982-09-09 | Hitachi Metals Ltd | Material for magnetic head and its manufacture |
| JPS57155346A (en) * | 1981-03-18 | 1982-09-25 | Daido Steel Co Ltd | Fe-si sintered alloy |
| JPH0652684B2 (ja) * | 1984-07-19 | 1994-07-06 | ソニー株式会社 | 磁性合金薄膜 |
| DE3628950A1 (de) * | 1986-08-26 | 1988-03-03 | Grundig Emv | Verfahren zur herstellung eines magnetkopfes |
| US4935311A (en) * | 1987-04-13 | 1990-06-19 | Hitachi, Ltd. | Magnetic multilayered film and magnetic head using the same |
| US5379172A (en) * | 1990-09-19 | 1995-01-03 | Seagate Technology, Inc. | Laminated leg for thin film magnetic transducer |
| JP3267046B2 (ja) * | 1994-04-21 | 2002-03-18 | 株式会社日立製作所 | 磁気記憶装置 |
| JP4142753B2 (ja) | 1996-12-26 | 2008-09-03 | 株式会社東芝 | スパッタターゲット、スパッタ装置、半導体装置およびその製造方法 |
| US20080102320A1 (en) * | 2004-04-15 | 2008-05-01 | Edelstein Alan S | Non-erasable magnetic identification media |
| CN110484696B (zh) * | 2019-09-26 | 2021-03-30 | 济宁学院 | 一种减摩抗磨液压泵零件的制备方法 |
| CN110468259B (zh) * | 2019-09-26 | 2021-03-23 | 济宁学院 | 一种抗磨液压泵零件的制备方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3271718A (en) * | 1962-08-06 | 1966-09-06 | Tyco Laboratories Inc | Magnetic cores for electrical devices and method of manufacture |
| US3670278A (en) * | 1966-06-09 | 1972-06-13 | Westinghouse Electric Corp | Bonded core structure comprising a plurality of glass coated electrical steel sheets |
| DE2106604A1 (en) * | 1971-02-12 | 1972-08-24 | Philips Patentverwaltung | Magnetic iron-silicon alloys - for switch or storage devices in electronic computers |
| BE789510A (fr) * | 1971-09-30 | 1973-03-29 | Siemens Ag | Noyau magnetique feuillete pour des tetes d'ecriture, de lecture et d'effacement dans des appareils a memoire a couche magnetique |
-
1976
- 1976-02-26 US US05/662,198 patent/US4049522A/en not_active Expired - Lifetime
-
1977
- 1977-01-05 FR FR7700649A patent/FR2342547A1/fr active Granted
- 1977-02-04 GB GB4600/77A patent/GB1513851A/en not_active Expired
- 1977-02-10 JP JP1315577A patent/JPS52112797A/ja active Granted
- 1977-02-23 DE DE19772707692 patent/DE2707692A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JPS618566B2 (OSRAM) | 1986-03-15 |
| JPS52112797A (en) | 1977-09-21 |
| FR2342547A1 (fr) | 1977-09-23 |
| GB1513851A (en) | 1978-06-14 |
| US4049522A (en) | 1977-09-20 |
| FR2342547B1 (OSRAM) | 1978-11-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |